A New Three-Component Photoresist Based on Calix[4]resorcinarene Derivative, a Cross-linker, and a Photo-acid Generator
作者:Tomonari Nakayama、Masayoshi Nomura、Kohji Haga、Mitsuru Ueda
DOI:10.1246/bcsj.71.2979
日期:1998.12
Calix[4]resorcinarene (2,8,14,20-tetramethylcalix[4]arene-4,6,10,12,16,18,22,24-octol, abbrev. to C4-RA) derivative (4) having p-hydroxybenzyl groups on its exterior was prepared by the condensation of C4-RA and p-(allyloxy)benzyl bromide, followed by the cleavage of allyl groups with palladium catalyst and ammonium formate. Compound 4 having high transparency to UV-light above 300 nm was considered for a new resist matrix. A three-component photoresist consisting of 4, 2,6-bis(hydroxymethyl)-4-methylphenol (BHMP), and diphenyliodonium 9,10-dimethoxyanthracene-2-sulfonate (DIAS) showed a sensitivity of 19 mJ cm−2 (D1/2) and a contrast of 3.0 (γ1/2) when it was exposed to 365 nm light and post-exposure baked (PEB) at 110 °C for 5 min, followed by developing with a 0.2 wt% aqueous tetramethylammonium hydroxide (TMAH) solution. A fine negative image featuring 1 μm of minimum line and space patterns was observed on film of the photoresist exposed to 40 mJ cm−2 of UV-light at 365 nm with a scanning electron microscope.
钙并[4]间苯二酚(2,8,14,20-四甲基钙并[4]烯-4,6,10,12,16,18,22,24-辛醇,简称 C4-RA)衍生物 (4) 的制备方法是:C4-RA 与对(烯丙氧基)溴化苄缩合,然后用钯催化剂和甲酸铵裂解烯丙基。化合物 4 对 300 纳米以上的紫外线具有很高的透明度,因此被认为是一种新的光刻胶基质。由 4、2,6-双(羟甲基)-4-甲基苯酚(BHMP)和 9,10-二甲氧基蒽-2-磺酸二苯基碘铵(DIAS)组成的三组分光刻胶的灵敏度为 19 mJ cm-2(D1/2),对比度为 3.0 (γ1/2),将其置于 365 nm 的光下,在 110 °C 下进行曝光后烘烤 (PEB) 5 分钟,然后用 0.2 wt% 的四甲基氢氧化铵 (TMAH) 水溶液显影。用扫描电子显微镜观察光刻胶在 40 mJ cm-2 波长的 365 纳米紫外光照射下的胶片,可观察到具有 1 μm 最小线条和空间图案的精细底片图像。