1-乙基-4,5-二甲氧基-2-甲基-苯 | 31465-72-2

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 中文名称: 1-乙基-4,5-二甲氧基-2-甲基-苯
• 英文名称: 3,4-Dimethoxi-6-ethyl-toluol
• 英文别名: 4-Methyl-5-ethyl-1,2-dimethoxybenzol；1-ethyl-4,5-dimethoxy-2-methyl-benzene；4-Methyl-5-aethyl-veratrol；1-Aethyl-4,5-dimethoxy-2-methyl-benzol；1-Ethyl-4,5-dimethoxy-2-methylbenzene
• CAS: 31465-72-2
• 化学式: C₁₁H₁₆O₂
• 分子量: 180.247
• InChiKey: HCCLCOUVGYSPQP-UHFFFAOYSA-N

物化性质

• 沸点：
  105 °C(Press: 5 Torr)
• 密度：
  0.966±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  3
• 重原子数：
  13
• 可旋转键数：
  3
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.45
• 拓扑面积：
  18.5
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  1-乙基-4,5-二甲氧基-2-甲基-苯 在 氢碘酸 作用下， 生成 4-Methyl-5-ethyl-pyrocatechol
  参考文献：
  名称：

  92.α-和β-羟基月桂肌苷。第二部分 彻底甲基化的产物

  摘要：

  DOI：

  10.1039/jr9370000427
• 作为产物：
  描述：

  3,4-二甲氧基甲苯 在 盐酸 、 三氯化铝 、 汞 、 锌 作用下， 以 二硫化碳 为溶剂， 生成 1-乙基-4,5-二甲氧基-2-甲基-苯
  参考文献：
  名称：

  Aliphatic semidiones. XV. 2,3-Semidiones derived from the bicyclo[n.1.0]alkanes

  摘要：

  DOI：

  10.1021/ja00735a022

文献信息

• DNA-PK INHIBITORS
  申请人：Martin Morrison Barr Niall

  公开号：US20070238729A1

  公开（公告）日：2007-10-11

  The invention relates to the use of compounds of formula (I) and isomers, salts, solvates, chemically protected forms, and prodrugs thereof, in the preparation of a medicament for inhibiting the activity of DNA-PK, wherein R 1 and R 2 are independently hydrogen, an optionally substituted C 1-7 alkyl group, C 3-20 heterocyclyl group, or C 5-20 aryl group, or may together form, along with the nitrogen atom to which they are attached, an optionally substituted heterocyclic ring having from 4 to 8 ring atoms; X and Y are selected from CR 4 and O, O and CR′ 4 and NR″ 4 and N, where the unsaturation is in the appropriate place in the ring, and where one of R 3 and R 4 or R′ 4 is an optionally substituted C 3-20 heteroaryl or C 5-20 aryl group, and the other of R 3 and R 4 or R′ 4 is H, or R 3 and R 4 or R″ 4 together are -A-B—, which collectively represent a fused optionally substituted aromatic ring. The compounds also selectively inhibit the activity of DNA-PK compared to PI 3-kinase and/or ATM.

  本发明涉及使用式(I)的化合物及其异构体、盐、溶剂合物、化学保护形式和前药，在制备抑制DNA-PK活性的药物方面有用。其中，R1和R2独立地表示氢、可选取代的C1-7烷基、C3-20杂环基或C5-20芳基，或者与它们连接的氮原子一起形成可选取代的含有4到8个环原子的杂环环；X和Y选自CR4和O，O和CR'4以及NR"4和N，其中不饱和度在环中适当位置，其中R3和R4或R'4中的一个为可选取代的C3-20杂芳基或C5-20芳基，而另一个为H，或者R3和R4或R"4在一起为-A-B-，代表一种融合的可选取代芳香环。这些化合物与PI 3-激酶和/或ATM相比，具有选择性地抑制DNA-PK的活性。
• 92. α- and β-Hydroxylaudanosines. Part II. The products of exhaustive methylation
  作者：F. E. King、Philibert L'Ecuyer

  DOI：10.1039/jr9370000427

  日期：——
• Composition for forming a silicon-containing antireflection film, substrate having the silicon-containing antireflection film from the composition and patterning process using the same
  申请人：Ogihara Tsutomu

  公开号：US20100285407A1

  公开（公告）日：2010-11-11

  There is disclosed a thermosetting silicon-containing antireflection film-forming composition, to form a silicon-containing antireflection film in a multilayer resist process used in a lithography, wherein the composition is at least capable of forming—on an organic film that is an underlayer film having a naphthalene skeleton—a silicon-containing antireflection film whose refractive index “n” and extinction coefficient “k” at 193 nm satisfy the following relationship: 2n−3.08≦k≦20n−29.4 and 0.01≦k≦0.5. There can be provided, in a multilayer resist process used in a lithography, a thermosetting silicon-containing antireflection film-forming composition to form a silicon-containing antireflection film which can form an excellent pattern having depressed reflection of an exposing light at the time when a photoresist film is formed on the silicon-containing antireflection film formed on an organic film having a naphthalene skeleton as a resist underlayer film and subsequently a resist pattern is formed; has excellent dry etching properties between the photoresist film—which is the upperlayer of the silicon-containing antireflection film—and the organic film—which is the underlayer—; and has an excellent storage stability, and a substrate having the silicon-containing antireflection film from the composition for forming the silicon-containing antireflection film, and a patterning process using the same.
• US7226918B2
  申请人：——

  公开号：US7226918B2

  公开（公告）日：2007-06-05
• US7674823B2
  申请人：——

  公开号：US7674823B2

  公开（公告）日：2010-03-09