1-异丙基-4-苯基乙二醇 | 100057-19-0

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯酚醚
• 中文名称: 1-异丙基-4-苯基乙二醇
• 英文名称: 1-isopropyl-4-phenylethylene glycol
• 英文别名: 1-isopropoxy-2-phenoxy-ethane；1-Isopropoxy-2-phenoxy-aethan；2-Phenoxyethanol, isopropyl ether；2-propan-2-yloxyethoxybenzene
• CAS: 100057-19-0
• 化学式: C₁₁H₁₆O₂
• mdl: MFCD20390325
• 分子量: 180.247
• InChiKey: YLJCURPHKLCGSK-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.5
• 重原子数：
  13
• 可旋转键数：
  5
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.454
• 拓扑面积：
  18.5
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  1-异丙基-4-苯基乙二醇 在 Rh/Al₂O₃ 氢气 作用下， 以 甲醇 为溶剂， 40.0 ℃ 、4.14 MPa 条件下， 生成 2-Propan-2-yloxyethoxycyclohexane
  参考文献：
  名称：

  Buchanan, G. W.; Moghimi, A.; Reynolds, V. M., Canadian Journal of Chemistry, 1995, vol. 73, # 4, p. 566 - 572

  摘要：

  DOI：
• 作为产物：
  描述：

  2-苯氧乙基溴 、 异丙醇 在 sodium hydride 作用下， 生成 1-异丙基-4-苯基乙二醇
  参考文献：
  名称：

  Buchanan, G. W.; Moghimi, A.; Reynolds, V. M., Canadian Journal of Chemistry, 1995, vol. 73, # 4, p. 566 - 572

  摘要：

  DOI：

文献信息

• COMPOUND, RESIN AND PHOTORESIST COMPOSITION
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20160244400A1

  公开（公告）日：2016-08-25

  A compound represented by formula (I): wherein R 1 represents a hydrogen atom, a halogen atom or a C1-C6 alkyl group where a hydrogen atom can be replaced by a halogen atom, L 1 represents a C1-C8 fluorinated alkanediyl group, X 1 represents *—CO—O—, *—O—CO—, *—O—CO—O— or *—O— where * represents a binding site to L 1 , and R 2 represents a C1-C18 hydrocarbon group in which a methylene group can be replaced by an oxygen atom, a carbonyl group or a sulfonyl group and in which a hydrogen atom can be replaced by a hydroxy group, or in which two hydrogen atoms can be each replaced by an oxygen atom forming one ketal structure together with a C1-C8 alkanediyl group bonded to the oxygen atom and a hydrogen atom in said ketal structure can be replaced by a fluorine atom.

  化合物的化学式（I）表示如下： 其中，R1代表氢原子、卤素原子或C1-C6烷基，其中氢原子可以被卤素原子取代，L1代表C1-C8氟代烷二基基团，X1代表*—CO—O—、*—O—CO—、*—O—CO—O—或*—O—，其中*代表与L1结合位点，R2代表C1-C18烃基团，其中亚甲基基团可以被氧原子、羰基团或磺酰基团取代，其中氢原子可以被羟基取代，或其中两个氢原子可以分别被氧原子取代，与氧原子结合形成一个与氧原子结合的C1-C8烷二基基团一起形成一个缩醛结构，所述缩醛结构中的氢原子可以被氟原子取代。
• SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20210371376A1

  公开（公告）日：2021-12-02

  A salt represented by formula (I): wherein R 1 and R 2 each independently represent a hydroxy group, —O—R 10 , —O—CO—O—R 10 or —O-L 1 -CO—O—R 10 ; L 1 represents an alkanediyl group having 1 to 6 carbon atoms; R 4 , R 5 , R 7 and R 8 each independently represent a halogen atom, an alkyl fluoride group having 1 to 12 carbon atoms or a hydrocarbon group having 1 to 18 carbon atoms, the hydrocarbon group may have a substituent, and —CH 2 — included in the hydrocarbon group may be replaced by —O—, —CO—, —S— or —SO 2 —; R 10 represents an acid-labile group; X 1 and X 2 each independently represent an oxygen atom or a sulfur atom; m1 represents an integer of 1 to 5, m2 and m8 represent an integer of 0 to 5, m4, m5 and m7 represent an integer of 0 to 4; and AI − represents an organic anion.

  一种由化学式（I）表示的盐：其中R1和R2分别代表一个羟基，-O-R10，-O-CO-O-R10或-O-L1-CO-O-R10；L1代表具有1至6个碳原子的烷二基基团；R4、R5、R7和R8分别独立地表示卤素原子，具有1至12个碳原子的烷基氟基团或具有1至18个碳原子的碳氢基团，碳氢基团可能有取代基，并且碳氢基团中包含的-CH2-可被-O-，-CO-，-S-或-SO2-取代；R10代表一个酸敏感基团；X1和X2分别独立地表示一个氧原子或一个硫原子；m1表示1至5的整数，m2和m8表示0至5的整数，m4、m5和m7表示0至4的整数；AI-代表一个有机阴离子。
• RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20210286261A1

  公开（公告）日：2021-09-16

  Disclosed is a resist composition including a compound represented by formula (I), a resin having an acid-labile group and an acid generator, the resin having an acid-labile group including at least one selected from the group consisting of a structural unit represented by formula (a1-1) and a structural unit represented by formula (a1-2):

  揭示了一种耐受组合物，包括由式（I）表示的化合物、具有酸敏基团和酸发生剂的树脂，其中具有酸敏基团的树脂包括至少从以下组中选择的一种：由式（a1-1）表示的结构单元和由式（a1-2）表示的结构单元。
• COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20210389669A1

  公开（公告）日：2021-12-16

  Disclosed are a compound represented by formula (I), a resin and a resist composition: wherein R 1 represents an alkyl group having 1 to 6 carbon atoms which may have a halogen, hydrogen or halogen atom, R 2 and R 3 each independently represent a hydrogen atom or a hydrocarbon group having 1 to 12 carbon atoms, R 4 represents a fluorine atom, an alkyl fluoride group having 1 to 6 carbon atoms or an alkyl group having 1 to 12 carbon atoms, and —CH 2 — included in the alkyl fluoride group and the alkyl group may be replaced by —O— or —CO—, R 5 represents a hydrogen atom, an alkylcarbonyl group having 2 to 6 carbon atoms or an acid-labile group, m2 represents an integer of 1 to 4, m4 represents an integer of 0 to 3, and m5 represents 1 or 2, in which 2≤m2+m4+m5≤5.

  揭示了一种由公式（I）表示的化合物，树脂和抗蚀组合物： 其中R1代表具有1至6个碳原子的烷基基团，其可以具有卤素，氢或卤素原子，R2和R3各自独立地表示氢原子或具有1至12个碳原子的碳氢基团，R4表示氟原子，具有1至6个碳原子的烷基氟化物基团或具有1至12个碳原子的烷基基团，且包括在烷基氟化物基团和烷基基团中的-CH2-可以被- O-或-CO-所取代，R5表示氢原子，具有2至6个碳原子的烷基羰基基团或酸敏感基团，m2表示1至4的整数，m4表示0至3的整数，m5表示1或2，在其中2≤m2+m4+m5≤5。
• PHOTOSENSITIVE COMPOUND AND PHOTORESIST COMPOSITION INCLUDING THE SAME
  申请人：LEE Jae-Woo

  公开号：US20090155714A1

  公开（公告）日：2009-06-18

  A photosensitive compound whose size is smaller than conventional polymer for photoresist, and which has well-defined (uniform) structure, and a photoresist composition including the same are disclosed. The photosensitive compound represented by the following formula. Also, the present invention provides a photoresist composition comprising 1 to 85 wt % (weight %) of the photosensitive compound; 0.05 to weight parts of a photo-acid generator with respect to 100 weight parts of the photosensitive compound; and 10 to 5000 weight parts of an organic solvent. In the formula, n is 0 or 1, x is 1, 2, 3, 4 or 5, y is 2, 3, 4, 5 or 6, z is 0, 1, 2, 3 or 4, R, R′ and R″ are independently hydrocarbon group of 1 to 30 carbon atoms, preferably 2 to 20 carbon atoms, and R′″ is a hydrogen atom or hydrocarbon group of 1 to 30 carbon atoms, preferably 2 to 20 carbon atoms.

  本发明揭示了一种比传统光刻胶更小的大小，具有明确定义（均匀）结构的光敏化合物，以及包括该光敏化合物的光刻胶组合物。该光敏化合物由以下公式表示。此外，本发明提供了一种光刻胶组合物，包括1至85重量％（重量％）的光敏化合物；相对于100重量部的光敏化合物0.05至重量份的光酸发生剂；以及10至5000重量部的有机溶剂。在公式中，n为0或1，x为1、2、3、4或5，y为2、3、4、5或6，z为0、1、2、3或4，R、R'和R"分别为1至30碳原子的烃基，优选为2至20碳原子，R'"为氢原子或1至30碳原子的烃基，优选为2至20碳原子。