2,2'-[氧基二(亚甲基)]二[2-甲基环氧乙烷] | 7487-28-7

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 环氧化物
• 中文名称: 2,2'-[氧基二(亚甲基)]二[2-甲基环氧乙烷]
• 英文名称: Bis(2,3-epoxy-2-methylpropyl) ether
• 英文别名: 2-methyl-2-[(2-methyloxiran-2-yl)methoxymethyl]oxirane
• CAS: 7487-28-7
• 化学式: C₈H₁₄O₃
• 分子量: 158.19
• InChiKey: FPFZKFZYQYTAHO-UHFFFAOYSA-N

物化性质

• 沸点：
  223.28°C (rough estimate)
• 密度：
  1.0543 (rough estimate)

计算性质

• 辛醇/水分配系数(LogP)：
  -0.2
• 重原子数：
  11
• 可旋转键数：
  4
• 环数：
  2.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  34.3
• 氢给体数：
  0
• 氢受体数：
  3

制备方法与用途

类别：有毒物品

• 毒性分级：中毒
• 急性毒性：
  • 口服（大鼠）LD50：1680毫克/公斤
  • 皮肤接触（兔子）LD50：1250毫克/公斤

刺激数据：

• 皮肤接触（兔子）500毫克，表现为轻度刺激

可燃性危险特性：

• 可燃
• 受热分解并产生刺激性烟雾

储运特性：

• 应存放在通风、低温和干燥的库房内

灭火剂：

• 干粉、泡沫、砂土、二氧化碳或雾状水

文献信息

• High purity monoalkyltin compounds and uses thereof
  申请人：ARKEMA FRANCE

  公开号：EP2123659A1

  公开（公告）日：2009-11-25

  The present invention relates to high purity monoalkyltin compounds, more specifically to alkyltin compound compositions containing monoalkyltin as major compound, and minor quantities of di- and/or trialkyltin compounds. The present invention also relates to the preparation processes of such high purity monoalkyltin compounds, as well as to the uses of said monoalkyltin compounds as chlorine-containing polymer-stabilisers, glass coating chemicals and catalysts, as well as articles comprising at least one polymer matrix and a high purity monoalkyltin compound.

  本发明涉及高纯度的单烷基锡化合物，更具体地是含有单烷基锡作为主要化合物的烷基锡化合物组合物，以及少量的二烷基锡和/或三烷基锡化合物。本发明还涉及制备这种高纯度单烷基锡化合物的过程，以及将所述单烷基锡化合物用作含氯聚合物稳定剂、玻璃涂层化学品和催化剂的用途，以及包含至少一个聚合物基质和高纯度单烷基锡化合物的制品。
• [EN] SULFONIUM DERIVATIVES AND THE USE THEROF AS LATENT ACIDS<br/>[FR] DÉRIVÉS DE SULFONIUM ET LEUR UTILISATION EN TANT QU'ACIDES LATENTS
  申请人：BASF SE

  公开号：WO2010046240A1

  公开（公告）日：2010-04-29

  Compounds of the formula (I), wherein Ar1 is for example phenylene or biphenylene both unsubstituted or substituted; Ar2 and Ar3 are for example independently of each other phenyl, naphthyl, biphenylylyl or heteroaryl, all optionally substituted; or Ar1 and Ar2 for example together with a direct bond, O, S or (CO), form a fused ring system; R is for example hydrogen, C3-C30cycloalkyl or C1-C18alkyl; and R1, R2 and R3 independently of each other are for example C1-C10haloalkyl; are effective photoacid generators (PAG).

  化合物的公式（I），其中Ar1例如是未取代或取代的苯基或联苯基; Ar2和Ar3例如是独立的苯基，萘基，联苯基或杂环基，均可选取代; 或者例如Ar1和Ar2与直接键，O，S或（CO）一起形成融合的环系统; R例如是氢，C3-C30环烷基或C1-C18烷基; R1，R2和R3独立地例如是C1-C10卤代烷基; 是有效的光酸发生剂（PAG）。
• [EN] SULPHONIUM SALT INITIATORS<br/>[FR] INITIATEURS À BASE DE SELS DE SULFONIUM
  申请人：CIBA HOLDING INC

  公开号：WO2009047151A1

  公开（公告）日：2009-04-16

  Compounds of the formula (I), wherein X is a single bond, CRaRb O, S, NRC, NCORC, CO, SO or SO2; L, L1, L2, L3, L4, L5, L6, L7 and L8 are for example hydrogen, R1 or COT; T denotes T1 or O-T2; T1 and T2 for example are hydrogen, C1-C20alkyl, C3-C12cycloalkyl, C2-C20alkenyl, C5- C12cycloalkenyl, C6-C14aryl, C3-C12heteroaryl, C1-C20alkyl substituted by one or more D, C2- C20alkyl interrupted by one or more E, C2-C20alkyl substituted by one or more D and inter- rupted by one or more E or Q; R1, R2, R3, R4, Ra, Rb and Rc are T1; D is for example R5, OR5, SR5 or Q1; E is for example O, S, COO or Q2; R5 and R6 for example are hydrogen, C1- C12alkyl or phenyl; Q is for example C6-C12bicycloalkyl, C6-C12bicycloalkenyl or C6- C12tricycloalkyl; Q1 is for example, C6-C14aryl or C3-C12heteroaryl; Q2 is for example C6- C14arylene or C3-C12heteroarylene; Y is an anion; and M is a cation; provided that at least one of L, L1, L2, L3, L4, L5, L6, L7 and L8 is other than hydrogen; and provided that (i) at least one of T1 or T2 is a group Q; or (ii) at least one D is a group Q1; or (iii) at least one E is a group Q2; are suitable as photolatent catalysts.

  化合物的式子（I），其中X是单键，CRaRb O，S，NRC，NCORC，CO，SO或SO2; L，L1，L2，L3，L4，L5，L6，L7和L8例如是氢，R1或COT; T表示T1或O-T2; T1和T2例如是氢，C1-C20烷基，C3-C12环烷基，C2-C20烯基，C5-C12环烯基，C6-C14芳基，C3-C12杂芳基，被一个或多个D取代的C1-C20烷基，被一个或多个E中断的C2-C20烷基，被一个或多个D取代并被一个或多个E或Q中断的C2-C20烷基; R1，R2，R3，R4，Ra，Rb和Rc是T1; D例如是R5，OR5，SR5或Q1; E例如是O，S，COO或Q2; R5和R6例如是氢，C1-C12烷基或苯基; Q例如是C6-C12双环烷基，C6-C12双环烯基或C6-C12三环烷基; Q1例如是C6-C14芳基或C3-C12杂芳基; Q2例如是C6-C14芳撑基或C3-C12杂芳撑基; Y是阴离子; M是阳离子; 前提是L，L1，L2，L3，L4，L5，L6，L7和L8中至少有一个不是氢; 并且前提是（i）至少有一个T1或T2是Q组; 或（ii）至少有一个D是Q1组; 或（iii）至少有一个E是Q2组; 适用于光潜催化剂。
• [EN] SULPHONIUM SALT INITIATORS<br/>[FR] INITIATEURS DE SEL DE SULFONIUM
  申请人：CIBA HOLDING INC

  公开号：WO2009047105A1

  公开（公告）日：2009-04-16

  Compounds of the Formula (I), wherein L1, L'1, L'1, L2, L'2, L'2, L3, L'3, L'3, L4, L'4 and L'4 for example are hydrogen or COT; R, R' and R' for example are hydrogen,C6-C12aryl or C3-C20heteroaryl; X, X' and X' for exampleare O, S, single bond, NRa or NCORa, T is for example hydrogen, C1-C20alkyl, C3-C12cycloalkyl, C2- C20alkenyl, C5-C12cycloalkenyl, C7-C18cycloalkylenaryl, C5-C18cycloalkylenheteroaryl, C6- C14aryl, providedthat at least one of R, R' or R' is unsubstitutedor substituted C3- C20heteroaryl; and Y is an inorganic or organic anion; are suitable as photolatent acid generators.

  式(I)的化合物，其中L1，L'1，L'1，L2，L'2，L'2，L3，L'3，L'3，L4，L'4和L'4例如是氢或COT；R，R'和R'例如是氢，C6-C12芳基或C3-C20杂环芳基；X，X'和X'例如是O，S，单键，NRa或NCORa，T例如是氢，C1-C20烷基，C3-C12环烷基，C2-C20烯基，C5-C12环烯基，C7-C18环烷基芳基，C5-C18环烷基杂环芳基，C6-C14芳基，前提是至少有一个R，R'或R'是未取代或取代的C3-C20杂环芳基；而Y是无机或有机阴离子；适用于光酸发生剂。
• [EN] 1-IMIDAZOLYMETHYL-SUBSTITUTED-2-NAPHTOLS AND THEIR USE AS ACCELERATORS FOR LOW-TEMPERATURE CURING<br/>[FR] 1-IMIDAZOLYMETHYLE-SUBSTITUTE-2-NAPHTOLS ET LEUR UTILISATION EN TANT QU'ACCELERATEURS POUR UN DURCISSEMENT A FAIBLE TEMPERATURE
  申请人：HUNTSMAN ADV MAT SWITZERLAND

  公开号：WO2004092141A1

  公开（公告）日：2004-10-28

  Compounds of the general formulae (I) and (II): where R1, R2 and R3 each independently of one another are H; C1-17alkyl; C3-12cycloalkyl, optionally substituted by C1-4alkyl groups; C4-20cycloalkyl-alkyl, optionally substituted by C1-4alkyl groups; C6-10, aryl, optionally substituted by 1-3 C1-4alkyl groups, -CN, Hal, OH, or C1-10alkoxy; C7-15phenylalkyl, optionally substituted by 1-3 C1-­4alkyl groups; C3-12alkenyl; C3-12alkynyl; or aromatic or aliphatic C3-12acyl; R4, R5, R6, R7, R8, and R9 each independently of one another are H; C1-17alkyl; C3-12Ccycloalkyl, optionally substituted by C1-4alkyl groups; C4-­20cycloalkyl-alkyl, optionally substituted by C1-4alkyl groups; C6-10aryl, optionally substituted by 1-3 C1-4alkyl groups; C7-15phenylalkyl, optionally substituted by 1-3 C1-4alkyl groups; C3-17alkenyl; C3-12alkynyl; C1-12alkoxy; or OH; for formula (1) R is C1-12alkyl; C3-12cycloalkyl, optionally substituted by C1-4alkyl groups; C4-20cycloalkyl­alkyl, optionally substituted by C1-4alkyl groups; C6-10aryl, optionally substituted by 1-3 C1-4alkyl groups; C7­-15phenylalkyl, optionally substituted by 1-3 C1-4alkyl groups; C3-12alkenyl; or C3-12alkynyl; and for formula (II) n = 2 - 12; as accelerators in curable epoxy resin compositions which are used as a compression moulding compound, sinter powder, encapsulating system, or casting resin, or for producing prepregs and laminates having very good interlaminar shear strength values using the resin infusion method, wet layup method and injection methods, for producing components, especially components of large surface area.

  通式(I)和(II)的化合物：其中R1、R2和R3各自独立地为H；C1-17烷基；C3-12环烷基，可选地被C1-4烷基基团取代；C4-20环烷基-烷基，可选地被C1-4烷基基团取代；C6-10芳基，可选地被1-3个C1-4烷基基团，-CN，Hal，OH或C1-10烷氧基取代；C7-15苯基烷基，可选地被1-3个C1-4烷基基团取代；C3-12烯基；C3-12炔基；或芳香或脂肪C3-12酰基；R4、R5、R6、R7、R8和R9各自独立地为H；C1-17烷基；C3-12环烷基，可选地被C1-4烷基基团取代；C4-20环烷基-烷基，可选地被C1-4烷基基团取代；C6-10芳基，可选地被1-3个C1-4烷基基团取代；C7-15苯基烷基，可选地被1-3个C1-4烷基基团取代；C3-17烯基；C3-12炔基；C1-12烷氧基；或OH；对于式(1)，R为C1-12烷基；C3-12环烷基，可选地被C1-4烷基基团取代；C4-20环烷基烷基，可选地被C1-4烷基基团取代；C6-10芳基，可选地被1-3个C1-4烷基基团取代；C7-15苯基烷基，可选地被1-3个C1-4烷基基团取代；C3-12烯基；或C3-12炔基；对于式(II)，n = 2-12；作为可固化环氧树脂组合物的催化剂，该组合物用作压缩成型复合材料、烧结粉末、封装系统或浇注树脂，或用于使用树脂渗透法、湿层压法和注射法制备具有非常好的层间剪切强度值的预浸料和层压板，用于制造特别是大面积构件。