2,2,4-三甲基-1,3-二甲基丙烯酸戊二醇酯 | 13283-44-8

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 中文名称: 2,2,4-三甲基-1,3-二甲基丙烯酸戊二醇酯
• 英文名称: 2,2,4-Trimethyl-1,3-pentanediol dimethacrylate
• 英文别名: [2,2,4-trimethyl-3-(2-methylprop-2-enoyloxy)pentyl] 2-methylprop-2-enoate
• CAS: 13283-44-8
• 化学式: C₁₆H₂₆O₄
• 分子量: 282.37
• InChiKey: TVGGFVNRRGKACD-UHFFFAOYSA-N

物化性质

• 沸点：
  342.2±15.0 °C(Predicted)
• 密度：
  0.973±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  4.5
• 重原子数：
  20
• 可旋转键数：
  9
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.625
• 拓扑面积：
  52.6
• 氢给体数：
  0
• 氢受体数：
  4

安全信息

• 海关编码：
  2916190090

文献信息

• Halo resistent, photoimagable coverlay compositions, having, advantageous application and removal properties, and methods relating thereto
  申请人：——

  公开号：US20040058276A1

  公开（公告）日：2004-03-25

  A flexible, aqueous processible, photoimagable coverlay compositions, having advantageous adhesion and release properties and resistance to (unwanted) haloing. The coverlay compositions of the present invention comprise an acrylic, low Tg, graft copolymer binder component, having an alkali resistant backbone-segment and a pendant arm segment comprising hydrophilic moieties. Optionally, the coverlay further comprises a thiophene-type adhesion promoter to further improve adhesion properties.

  一种灵活、水溶性、光敏覆盖层组合物，具有优异的粘附和释放性能以及抗（不需要的）晕影性能。本发明的覆盖层组合物包括具有耐碱骨架段和含亲水性基团的悬臂臂段的丙烯酸低Tg嫁接共聚物粘合剂组分。可选地，覆盖层进一步包括一种噻吩型粘附促进剂，以进一步改善粘附性能。
• Improved aqueous developable photopolymerizable elements
  申请人：E.I. DU PONT DE NEMOURS AND COMPANY

  公开号：EP0049504A1

  公开（公告）日：1982-04-14

  An aqueous developable photopolymerizable element having improved rate of development consisting essentially of (a) an ethylenically unsaturated monomeric compound, (b) an organic acidic polymeric binder, (c) a photoinitiator or photoinitiator system and (d) at least 2% by weight based on weight of solids of an organic compound or salt of an organic compound as defined. The elements are useful as photoresists, printing plates and for preparation of proofs and litho masks.

  一种水性可显影光聚合元素，具有更好的显影率，其主要成分包括：(a) 乙烯不饱和单体化合物；(b) 有机酸性聚合物粘合剂；(c) 光引发剂或光引发剂体系；(d) 至少 2%（以固体重量计）的有机化合物或有机化合物的盐。这些元素可用作光致抗蚀剂、印版以及制备打样和平版掩膜。
• Aqueous processible, alcohol resistant flexographic printing plates
  申请人：E.I. DU PONT DE NEMOURS AND COMPANY

  公开号：EP0076028A2

  公开（公告）日：1983-04-06

  Photosensitive elastomeric compositions comprising 40 to 90 weight percent of a heat workable, carboxyl- and sulfur-containing polymer of a diene; 2 to 50 weight percent of a nongaseous, ethylenically unsaturated compound; and 0.001 to 10 weight percent of a radical generating system; the compositions being useful for making flexographic printing plates.

  光敏弹性体组合物，包括 40 至 90 重量百分比的可热加工、含羧基和硫的二烯聚合物；2 至 50 重量百分比的非气态乙烯不饱和化合物；以及 0.001 至 10 重量百分比的自由基生成体系；该组合物可用于制作柔版印刷板。
• Aqueous developable photopolymer compositions containing terpolymer binder
  申请人：E.I. DU PONT DE NEMOURS AND COMPANY

  公开号：EP0076473A1

  公开（公告）日：1983-04-13

  Compatible, aqueous developable photopolymerizable composition consisting essentially of (a) 22 to 32% by wt of a monomeric compound having at least two terminal ethylenic groups, (b) 0.1 to 5.0% by wt of a photoinitiator or initiator system, (c) 40 to 80% by wt of a binder system which is the reaction product of (1) 65 to 87 parts by wt of a terpolymer of methylmethacrylate, butylmethacrylate and methacrylic acid as defined, (2) 5 to 20 parts by wt of a polyamide resin and (3) 5 to 20 parts by wt of a copolymer of vinyl pyrrolidone and vinyl acetate, (d) 0.03 to 0.10% by wt of a thermal polymerization inhibitor, and optionally up to 18% by wt of a plasticizer and up to 2.0% by wt of a tertiary amine capable of salt formation with a carboxylic acid. Aqueous developable photopolymerizable elements comprise a support bearing a layer of the composition. Relief printing plates can be prepared by imagewise exposing and developing the elements.

  相容的水性可显影光聚合组合物，其主要成分为：(a) 22 至 32% (重量) 的单体化合物，该单体化合物至少具有两个末端乙烯基；(b) 0.1 至 5.0% (重量)的光引发剂或引发剂体系，(c) 40 至 80% (重量)的粘合剂体系，该体系是(1) 65 至 87 (重量)份甲基丙烯酸甲酯、甲基丙烯酸丁酯和甲基丙烯酸的三元共聚物，(2) 5 至 20 (重量)份聚酰胺树脂和(3) 5 至 20 (重量)份吡咯烷酮和醋酸乙烯共聚物的反应产物，(d) 0.03 至 0.10%(重量)的热聚合抑制剂，以及可选的不超过 18%(重量)的增塑剂和不超过 2.0%(重量)的能与羧酸成盐的叔胺。可显影的水性光聚合元素包括带有一层组合物的支撑物。浮雕印版可通过对元件进行图像曝光和显影来制备。
• Photosensitive polymer compositions, electrophoretic deposition processes using same, and the use of same in forming films on substrates
  申请人：ROHM AND HAAS COMPANY

  公开号：EP0176356A2

  公开（公告）日：1986-04-02

  This invention is concerned with photosensitive polymer compositions useful in the preparation of printed circuit boards, lithographic printing plates, cathode ray tubes, as well as in chemical milling, solder resist and planarizing layer applications. The photosensitive polymer compositions comprise a crosslinkable photosensitive polymer composition, which comprises (a) photoinitiator, and (b) at least one polymer having one or more carrier groups per polymer molecule, and wherein the composition contains unsaturated groups so that it is capable, upon exposure to actinic radiation, of forming a film containing crosslinked polymer. The photosensitive polymer compositions, conveniently in the form of aqueous solutions or emulsions, are capable of being electrophoretically deposited as adherent, uniform, photosensitive films on conductive surfaces. Films formed from the photosensitive polymer compositions can be aqueous developable and resistant to strong inorganic acids and strong bases.

  本发明涉及可用于制备印刷电路板、平版印刷板、阴极射线管以及化学研磨、阻焊剂和平面化层应用的光敏聚合物组合物。光敏聚合物组合物包括一种可交联的光敏聚合物组合物，该组合物包含 (a) 光引发剂和 (b) 至少一种聚合物，每种聚合物分子具有一个或多个载体基团，其中该组合物包含不饱和基团，使其在暴露于光辐射后能够形成含有交联聚合物的薄膜。这种光敏聚合物组合物通常以水溶液或乳液的形式存在，能够以粘附、均匀、光敏薄膜的形式电泳沉积在导电表面上。 由光敏聚合物组合物形成的薄膜可在水溶液中显影，并可耐受强无机酸和强碱。