A photosensitive composition is disclosed including a fluorinated photo cross-linkable polymer provided in a fluorinated solvent such as a hydrofluoroether. The photo cross-linkable polymer includes a first repeating unit having a fluorine-containing group but not a cinnamate group, and a second repeating unit having a fluorine-containing cinnamate group. The polymer has a total fluorine content in a range of 30 to 60% by weight. The composition can be used to form patterned barrier or dielectric structures over substrates and devices such as organic electronic devices.
本发明公开了一种光敏组合物,该组合物包括在
氟化溶剂(如氢
氟醚)中的
氟化可光交联聚合物。光交联聚合物包括具有含
氟基团但不含
肉桂酸基团的第一重复单元和具有含
氟肉桂酸基团的第二重复单元。聚合物的总
氟含量范围为 30% 至 60%(按重量计)。该组合物可用于在基底和有机电子器件等设备上形成图案化的阻挡层或介电结构。