申请人:Breyta Gregory
公开号:US20080166669A1
公开(公告)日:2008-07-10
A method of creating patterned objects using a class of lithographic photoresist combinations is disclosed which is suitable for use with visible light and does not require a post-exposure bake step. The disclosed photoresists are preferably chemical amplification photoresists and contain a photosensitizer having the structure of formula (I):
where Ar
1
and Ar
2
are independently selected from monocyclic aryl and monocyclic heteroaryl, R
1
and R
2
may be the same or different, and have the structure —X—R
3
where X is O or S and R
3
is C
1
-C
6
hydrocarbyl or heteroatom-containing C
1
-C
6
hydrocarbyl, and R
4
and R
5
are independently selected from the group consisting of hydrogen and —X—R
3
, or, if ortho to each other, may be taken together to form a five- or six-membered aromatic ring, with the proviso that any heteroatom contained within Ar
1
, Ar
2
, or R
3
is O or S. The use of the disclosed photoresists, particularly for the manufacture of holographic diffraction gratings, is also disclosed.
本发明揭示了一种使用一类光刻光阻组合物制造图案对象的方法,适用于可见光且不需要后曝光烘烤步骤。所述光刻光阻首选为化学增强型光刻光阻,其中包含具有公式(I)结构的光敏剂:其中Ar1和Ar2独立地选择自单环芳基和单环杂芳基,R1和R2可以相同也可以不同,具有结构- X-R3,其中X为O或S,R3为C1-C6烃基或含杂原子的C1-C6烃基,R4和R5独立地选择自氢和-X-R3的群,或者如果在相对位置,可以连在一起形成五元或六元芳香环,但Ar1、Ar2或R3中包含的任何杂原子为O或S。还揭示了使用所述光刻光阻,特别是用于制造全息衍射光栅的方法。