4-[8,14,20-Tris(4-carboxyphenyl)-4,6,10,12,16,18,22,24-octahydroxy-2-pentacyclo[19.3.1.13,7.19,13.115,19]octacosa-1(25),3(28),4,6,9(27),10,12,15,17,19(26),21,23-dodecaenyl]benzoic acid | 118600-32-1

• 分子结构分类: 有机化合物 - 苯丙烷和聚酮 - 二芳基庚烷
• 英文名称: 4-[8,14,20-Tris(4-carboxyphenyl)-4,6,10,12,16,18,22,24-octahydroxy-2-pentacyclo[19.3.1.13,7.19,13.115,19]octacosa-1(25),3(28),4,6,9(27),10,12,15,17,19(26),21,23-dodecaenyl]benzoic acid
• CAS: 118600-32-1；118712-53-1；1176080-09-3
• 化学式: C₅₆H₄₀O₁₆
• 分子量: 968.924
• InChiKey: ZOQPTAWSIFAGAH-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  8.8
• 重原子数：
  72
• 可旋转键数：
  8
• 环数：
  9.0
• sp3杂化的碳原子比例：
  0.07
• 拓扑面积：
  311
• 氢给体数：
  12
• 氢受体数：
  16

反应信息

• 作为反应物：
  描述：

  4-[8,14,20-Tris(4-carboxyphenyl)-4,6,10,12,16,18,22,24-octahydroxy-2-pentacyclo[19.3.1.13,7.19,13.115,19]octacosa-1(25),3(28),4,6,9(27),10,12,15,17,19(26),21,23-dodecaenyl]benzoic acid 在 氯化亚砜 、 sodium carbonate 作用下， 以 水 为溶剂， 反应 2.0h， 生成 calix[4]resorcinarene-2,8,14,20-tetrakis[N-phenylbenzo]hydroxamic acid
  参考文献：
  名称：

  Microwave‐Assisted Synthesis of Calix[4]resorcinarene Hydroxamic Acids

  摘要：

  New calix[4]resorcinarenes bearing hydroxamic acid groups, calix[4]resorcinarene hydroxamic acids (CRAHAs), have been synthesized.

  DOI：

  10.1080/00397910500498895
• 作为产物：
  描述：

  对醛基苯甲酸 、 间苯二酚 在 盐酸 作用下， 以 乙醇 为溶剂， 反应 48.0h， 以79%的产率得到4-[8,14,20-Tris(4-carboxyphenyl)-4,6,10,12,16,18,22,24-octahydroxy-2-pentacyclo[19.3.1.13,7.19,13.115,19]octacosa-1(25),3(28),4,6,9(27),10,12,15,17,19(26),21,23-dodecaenyl]benzoic acid
  参考文献：
  名称：

  Host-guest complexation. 48. Octol building blocks for cavitands and carcerands

  摘要：

  DOI：

  10.1021/jo00267a015

文献信息

• CYCLIC COMPOUND, PHOTORESIST BASE MATERIAL AND PHOTORESIST COMPOSITION
  申请人：Shibata Mitsuru

  公开号：US20100190107A1

  公开（公告）日：2010-07-29

  A cyclic compound shown by the following formula (I):

  一个由以下公式（I）所示的环状化合物：
• Host-guest complexation. 48. Octol building blocks for cavitands and carcerands
  作者：Linda M. Tunstad、John A. Tucker、Enrico Dalcanale、Jurgen Weiser、Judi A. Bryant、John C. Sherman、Roger C. Helgeson、Carolyn B. Knobler、Donald J. Cram

  DOI：10.1021/jo00267a015

  日期：1989.3
• TUNSTAD, LINDA M.;TUCKER, JOHN A.;DALCANALE, ENRICO;WEISER, JURGEN;BRYANT+, J. ORG. CHEM., 54,(1989) N, C. 1305-1312
  作者：TUNSTAD, LINDA M.、TUCKER, JOHN A.、DALCANALE, ENRICO、WEISER, JURGEN、BRYANT+

  DOI：——

  日期：——
• RADIATION-SENSITIVE COMPOSITION
  申请人：Echigo Masatoshi

  公开号：US20100047709A1

  公开（公告）日：2010-02-25

  A radiation-sensitive composition containing a resist compound having a high sensitivity, a high resolution, a high etching resistance, and a low outgas which forms a resist pattern with a good shape is described. Further described is a method of forming a resist pattern using the radiation-sensitive composition. Still further described are a novel composition for forming a photoresist under coat film which is excellent in optical properties and etching resistance and contains substantially no sublimable substance and an under coat film formed by the composition. Still further described are a radiation-sensitive composition containing a solvent and a cyclic compound having a specific structure, for example, a cyclic compound (A) having a molecular weight of 700 to 5000 which is synthesized by the condensation reaction of a compound having 2 to 59 carbon atoms and 1 to 4 formyl groups (aldehyde compound (A1)) with a compound having 6 to 15 carbon atoms and 1 to 3 phenolic hydroxyl groups (phenol compound (A2)), and a cyclic compound for use in the radiation-sensitive composition.
• US8110334B2
  申请人：——

  公开号：US8110334B2

  公开（公告）日：2012-02-07