2-Methyl-[1]phenanthrol | 855356-64-8

• 分子结构分类: 有机化合物 - 苯类化合物 - 菲及其衍生物
• 英文名称: 2-Methyl-[1]phenanthrol
• 英文别名: 1-Hydroxy-2-methyl-phenanthren；2-Methylphenanthren-1-OL；2-methylphenanthren-1-ol
• CAS: 855356-64-8
• 化学式: C₁₅H₁₂O
• 分子量: 208.26
• InChiKey: GAAWHOQVXCMFOS-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.4
• 重原子数：
  16
• 可旋转键数：
  0
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.07
• 拓扑面积：
  20.2
• 氢给体数：
  1
• 氢受体数：
  1

反应信息

• 作为反应物：
  描述：

  2-Methyl-[1]phenanthrol 、 硫酸二甲酯 在 氢氧化钾 作用下， 生成 甲基-(2-甲基-[1]菲基)-醚
  参考文献：
  名称：

  16-Equilenone and 16,17-Substituted Equilenane Derivatives

  摘要：

  DOI：

  10.1021/ja01238a025
• 作为产物：
  描述：

  benzoic acid-(2-methyl-[1]phenanthryl ester) 在 氢氧化钾 作用下， 生成 2-Methyl-[1]phenanthrol
  参考文献：
  名称：

  Structural Changes of Humic Acids During Olive Mill Pomace Composting

  摘要：

  DOI：

  10.1080/1065657x.2001.10702027

文献信息

• RESIN HAVING FLUORENE STRUCTURE AND UNDERLAYER FILM-FORMING MATERIAL FOR LITHOGRAPHY
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：EP2762513A1

  公开（公告）日：2014-08-06

  There are provided a novel resin having a fluorene structure which has a relatively high carbon concentration in the resin, which has a relatively high heat resistance and also a relatively high solvent solubility, and which can be applied to a wet process, and a method for producing the resin, as well as a material for forming an underlayer film useful for forming a novel resist underlayer film excellent in heat resistance and etching resistance as an underlayer film for multilayer resist, and a pattern forming method using the material. The resin of the present invention has a structure represented by the following general formula (1). (in the general formula (1), each of R3 and R4 independently denotes a benzene ring or a naphthalene ring, a carbon atom at the bridgehead of a fluorene backbone or (di)benzofluorene backbone is bonded with a carbon atom of each of other aromatic rings, and a carbon atom of each of aromatic rings of a fluorene backbone or (di)benzofluorene backbone is bonded with a carbon atom at the bridgehead of other fluorene backbone or (di)benzofluorene backbone.)

  本发明提供了一种具有芴结构的新型树脂，该树脂中的碳浓度相对较高，具有相对较高的耐热性和相对较高的溶剂溶解性，可应用于湿法工艺，还提供了一种生产该树脂的方法，以及一种用于形成底层膜的材料，该底层膜可用于形成耐热性和耐蚀刻性优异的新型抗蚀剂底层膜，作为多层抗蚀剂的底层膜，还提供了一种使用该材料的图案形成方法。本发明的树脂具有以下通式 (1) 所表示的结构。 (在通式（1）中，R3 和 R4 各自独立地表示苯环或萘环，芴骨架或（二）苯并芴骨架桥头的一个碳原子与其他每个芳香环的一个碳原子键合、芴骨架或(二)苯并芴骨架的每个芳香环的碳原子与其他芴骨架或(二)苯并芴骨架桥头的碳原子键合。)
• RESIN HAVING FLUORENE STRUCTURE AND MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY
  申请人：Higashihara Go

  公开号：US20140246400A1

  公开（公告）日：2014-09-04

  A resin having a fluorene structure, a relatively high carbon concentration in the resin, a relatively high heat resistance and a relatively high solvent solubility has a structure represented by wherein each of R 3 and R 4 independently denotes a benzene ring or a naphthalene ring, a carbon atom at the bridgehead of a fluorene backbone or (di)benzofluorene backbone is bonded with a carbon atom of each of other aromatic rings, and a carbon atom of each of aromatic rings of a fluorene backbone or (di)benzofluorene backbone is bonded with a carbon atom at the bridgehead of other fluorene backbone or (di)benzofluorene backbone. The resin can be applied to a wet process. Methods for producing the resin, for forming an underlayer film useful for forming a novel resist, and for pattern forming using the material, and an underlayer film excellent in heat resistance and etching resistance for multilayer resist are described.