isobutyric acid tert-pentyl ester | 194784-93-5

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: isobutyric acid tert-pentyl ester
• 英文别名: Isobuttersaeure-tert-pentylester；2-Methylbutan-2-yl 2-methylpropanoate
• CAS: 194784-93-5
• 化学式: C₉H₁₈O₂
• 分子量: 158.241
• InChiKey: FONMOIQZBGAASK-UHFFFAOYSA-N

物化性质

• 沸点：
  153.5±8.0 °C(Predicted)
• 密度：
  0.874±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  2.6
• 重原子数：
  11
• 可旋转键数：
  4
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.89
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  isobutyric acid tert-pentyl ester 、 对甲苯磺酰胺 在 二甲基乙基硅烷 、 (Ace)Ru₃(CO)7 作用下， 以 二氯甲烷 为溶剂， 反应 20.0h， 以72%的产率得到4-methyl-N-(tert-pentyl)benzenesulfonamide
  参考文献：
  名称：

  使用酯作为伯烷基和叔烷基源的甲苯磺酰胺的N烷基化反应：由钌催化剂活化的氢硅烷介导

  摘要：

  选择您的基团：在使用氢硅烷的钌催化反应中，可以明智地选择用作烷基源的酯，将伯烷基或叔烷基选择性引入甲苯磺酰胺的氮原子上（参见方案; Ts = 4-甲苯磺酰基）。这些N烷基化反应可用于构建天然存在的氮杂环骨架。

  DOI：

  10.1002/anie.201201426
• 作为产物：
  描述：

  2-甲基-2-丁烯 、 异丁酸 在 zinc(II) chloride 作用下， 生成 isobutyric acid tert-pentyl ester
  参考文献：
  名称：

  Kondakow, Zhurnal Russkago Fiziko-Khimicheskago Obshchestva, 1893, vol. 25, p. 448

  摘要：

  DOI：

文献信息

• PRODRUGS OF NH-ACIDIC COMPOUNDS: ESTER, CARBONATE, CARBAMATE AND PHOSPHONATE DERIVATIVES
  申请人：Blumberg Laura Cook

  公开号：US20110319422A1

  公开（公告）日：2011-12-29

  The invention provides a method of sustained delivery of a lactam, imide, amide, sulfonamide, carbamate or urea containing parent drug by administering to a patient an effective amount of a prodrug compound of the invention wherein upon administration to the patient, release of the parent drug from the prodrug is sustained release. Prodrug compounds suitable for use in the methods of the invention are labile conjugates of parent drugs that are derivatized through carbonyl linked prodrug moieties. The prodrug compounds of the invention can be used to treat any condition for which the lactam, imide, amide, sulfonamide, carbamate or urea containing parent drug is useful as a treatment.

  该发明提供了一种持续释放内酰胺、亚酰胺、酰胺、磺胺、碳酸酯或尿素含有母药的方法，通过向患者施用该发明的一种前药化合物的有效量，在向患者施用后，从前药中释放母药是持续释放的。适用于该发明方法的前药化合物是母药的不稳定结合物，通过羰基连接的前药基团进行衍生化。该发明的前药化合物可用于治疗任何需要内酰胺、亚酰胺、酰胺、磺胺、碳酸酯或尿素含有母药作为治疗的情况。
• [EN] PROCESS FOR THE PREPARATION OF ACYLATED SECONDARY ALCOHOL ALKOXYLATES AND SECONDARY ALCOHOL ALKOXYLATES<br/>[FR] PROCÉDÉ DE PRÉPARATION D'ALCOXYLATES D'ALCOOLS SECONDAIRES ACYLÉS ET ALCOXYLATES D'ALCOOLS SECONDAIRES
  申请人：SHELL INT RESEARCH

  公开号：WO2010049465A1

  公开（公告）日：2010-05-06

  A process for the preparation of acylated secondary alcohol alkoxylates, said process comprising : (i) reaction of one or more internal olefins with one or more carboxylic acids in the presence of a catalyst composition in order to form one or more carboxylic acid esters; (ii) reaction of one or more carboxylic acid esters from step (i) with one or more alkylene oxide reactants, in the presence of a catalytically effective amount of a catalyst composition comprising: (a) one or more alkaline earth metal salts of carboxylic and/or hydroxycarboxylic acids and/or hydrates of the former; (b) an oxy-acid selected from sulphuric acid and ortho-phosphoric acid; (c) an alcohol and/or an ester; and/or products of the reciprocal reactions of (a), (b) and/or (c) in order to form one or more acylated secondary alcohol alkoxylates; and optionally (iii) hydrolysis or transesterification of one or more acylated secondary alcohol alkoxylates from step (ii) in order to form one or more secondary alcohol alkoxylates; and a process for making secondary alcohol alkoxy sulphates comprising the steps of: preparing secondary alcohol alkoxylates by the afore-mentioned process; and sulphating the secondary alcohol alkoxylates.

  一种制备酰化二次醇烷氧基化物的方法，该方法包括：（i）在催化剂组成物的存在下，将一种或多种内部烯烃与一种或多种羧酸反应，以形成一种或多种羧酸酯；（ii）在催化剂组成物的存在下，将步骤（i）中的一种或多种羧酸酯与一种或多种烷基氧化物反应，其中催化剂组成物包括：（a）一种或多种碱土金属羧酸和/或羟基羧酸盐和/或其水合物；（b）从硫酸和正磷酸中选择的氧酸；（c）一种醇和/或一种酯和/或（a），（b）和/或（c）的互反作用产物，以形成一种或多种酰化二次醇烷氧基化物；可选地（iii）水解或酯交换步骤，以形成一种或多种二次醇烷氧基化物。制备二次醇烷氧基硫酸盐的方法包括以下步骤：通过上述方法制备二次醇烷氧基化物；并对二次醇烷氧基化物进行硫酸化。
• COMPOUND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, AND PATTERN FORMATION METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE USING SAME, AND ELECTRONIC DEVICE
  申请人：FUJIFILM CORPORATION

  公开号：US20160024005A1

  公开（公告）日：2016-01-28

  There is provided an actinic ray-sensitive or radiation-sensitive resin composition containing a compound represented by the following formula (1) or (2), and the formula (1) and (2) are defined as herein, and a resist film comprising the actinic ray-sensitive or radiation-sensitive resin composition, and a pattern forming method comprising a step of exposing the resist film, and a step of developing the exposed film, and a method for manufacturing an electronic device, comprising the pattern forming method, and an electronic device manufactured by the manufacturing method of an electronic device.

  提供了一种包含下列式子（1）或（2）所代表的化合物的光致射线敏感或辐射敏感的树脂组合物，其中式（1）和（2）的定义如本文所述，以及包括该光致射线敏感或辐射敏感的树脂组合物的光阻膜，以及包括曝光光阻膜的步骤和显影曝光膜的步骤的图案形成方法，以及包括图案形成方法的制造电子装置的方法，以及由电子装置的制造方法制造的电子装置。
• PHOTOSENSITIVE COMPOSITION, AND PATTERN-FORMING METHOD AND RESIST FILM USING THE PHOTOSENSITIVE COMPOSITION
  申请人：Wada Kenji

  公开号：US20100239978A1

  公开（公告）日：2010-09-23

  A photosensitive composition containing a compound having a specific structure, a pattern-forming method using the photosensitive composition, and a compound having a specific structure used in the photosensitive composition.

  一种含有特定结构化合物的光敏组合物，使用该光敏组合物进行的图案形成方法，以及用于该光敏组合物的具有特定结构的化合物。
• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE SAME, PATTERN FORMING METHOD, MANUFACTURING METHOD OF ELECTRONIC DEVICE, ELECTRONIC DEVICE AND RESIN
  申请人：FUJIFILM Corporation

  公开号：US20150132688A1

  公开（公告）日：2015-05-14

  There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising (P) a resin having (a) a repeating unit represented by the specific formula; a resist film formed using the actinic ray-sensitive or radiation-sensitive resin composition; a pattern forming method comprising (i) a step of forming a film by using the actinic ray-sensitive or radiation-sensitive resin composition, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using a developer to form a pattern; a method for manufacturing an electronic device, comprising the pattern forming method; and an electronic device manufactured by the manufacturing method of an electronic device.

  提供了一种光致射线敏感或辐射敏感的树脂组合物，其中包括（P）具有（a）由特定公式表示的重复单元的树脂；使用该光致射线敏感或辐射敏感的树脂组合物形成的抗蚀膜；包括（i）使用该光致射线敏感或辐射敏感的树脂组合物形成膜的步骤，（ii）曝光膜的步骤，以及（iii）使用显影剂显影曝光的膜以形成图案的图案形成方法；一种制造电子设备的方法，包括图案形成方法；以及通过电子设备的制造方法制造的电子设备。