3,5-hexafluoroxylyl sulfonic acid | 25601-74-5

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 3,5-hexafluoroxylyl sulfonic acid
• 英文别名: 3,5-Bistrifluoromethylbenzenesulfonic acid；3,5-bis(trifluoromethyl)benzenesulfonic acid
• CAS: 25601-74-5
• 化学式: C₈H₄F₆O₃S
• 分子量: 294.174
• InChiKey: ZTSMHBJVSSKMNR-UHFFFAOYSA-N

物化性质

• 密度：
  1.641±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  3
• 重原子数：
  18
• 可旋转键数：
  1
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.25
• 拓扑面积：
  62.8
• 氢给体数：
  1
• 氢受体数：
  9

反应信息

• 作为反应物：
  描述：

  bis(cyclopentadienyl)dimethylzirconium(IV) 、 3,5-hexafluoroxylyl sulfonic acid 以 乙醚 为溶剂， 以74%的产率得到Cp2Zr(OSO2-3,5-C6H3(CF3)2)2
  参考文献：
  名称：

  Huesgen, Nicola S.; Luinstra, Gerrit A., Inorganica Chimica Acta, 1997, vol. 259, # 1-2, p. 185 - 196

  摘要：

  DOI：
• 作为产物：
  描述：

  吗啉 、 O-((3,5-bis(trifluoromethyl)phenyl)sulfonyl)-N-(hexan-2-yl)hydroxylamine, hydrogen salt 以 四氢呋喃 、 乙酸乙酯 为溶剂， 生成 3,5-hexafluoroxylyl sulfonic acid 、
  参考文献：
  名称：

  Structural effects on the transition states of imine-forming eliminations in N-substituted O-(arylsulfonyl)hydroxylamines

  摘要：

  DOI：

  10.1021/ja00220a048

文献信息

• PHOTOSENSITIVE COMPOSITION, PATTERN FORMING METHOD USING THE PHOTOSENSITIVE COMPOSITION AND COMPOUND FOR USE IN THE PHOTOSENSITIVE COMPOSITION
  申请人：Wada Kenji

  公开号：US20100233617A1

  公开（公告）日：2010-09-16

  A photosensitive composition includes: (A) a resin containing a repeating unit corresponding to a compound represented by the following formula (I); the resin being capable of producing an acid group upon irradiation with an actinic ray or radiation: Z-A-X—B—R   (I) wherein Z represents a group capable of becoming an acid group resulting from leaving of a cation upon irradiation with an actinic ray or radiation; A represents an alkylene group; X represents a single bond or a heteroatom-containing divalent linking group; B represents a single bond, an oxygen atom or —N(Rx)-; Rx represents a hydrogen atom or a monovalent organic group; R represents a monovalent organic group substituted by Y; when B represents —N(Rx)-, R and Rx may combine with each other to form a ring; and Y represents a polymerizable group.

  一种感光组合物包括：（A）含有与下式（I）所表示的化合物对应的重复单元的树脂；该树脂能够在受到光敏射线或辐射照射后产生酸基团：Z-A-X—B—R   （I）其中Z代表一个能够在受到光敏射线或辐射照射后由阳离子离去而形成酸基团的基团；A代表一个烷基基团；X代表一个单键或含杂原子的二价连接基团；B代表一个单键、一个氧原子或—N（Rx）-；Rx代表一个氢原子或一个一价有机基团；R代表一个通过Y取代的一价有机基团；当B代表—N（Rx）-时，R和Rx可以结合在一起形成一个环；Y代表一个可聚合的基团。
• Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film
  申请人：FUJIFILM CORPORATION

  公开号：US10248019B2

  公开（公告）日：2019-04-02

  A pattern forming, method, includes: (i) forming a film from an actinic ray-sensitive or radiation-sensitive resin composition that contains (A) a compound capable of generating an acid upon irradiation with an actinic ray or radiation and decomposing by an action of an acid to decrease a solubility of the compound (A) for an organic solvent; (ii) exposing the film; and (iii) performing development by using a developer containing an organic solvent.

  一种形成图案的方法包括：(i) 使用一种含有（A）一种能够在受到光或辐射照射时生成酸并通过酸的作用分解以降低该化合物（A）对有机溶剂的溶解度的光敏或辐射敏感树脂组合物形成薄膜；(ii) 曝光薄膜；和(iii) 使用含有有机溶剂的显影剂进行显影。
• PROCESS FOR PRODUCING AMINOALKYLSULFONIC ACID AND METHOD OF SALT EXCHANGE FOR SALT THEREOF
  申请人：Wako Pure Chemical Industries, Ltd.

  公开号：EP1548002A1

  公开（公告）日：2005-06-29

  The present invention relates to a method for efficiently producing an aminoalkylsulfonic acid in an industrial scale, and provides    "a process for producing an aminoalkylsulfonic acid represented by the general formula [2]:    wherein R1 and R2 are each independently a hydrogen atom, an alkyl group, an aryl group or an aralkyl group; and R3 and R4 are each independently a hydrogen atom or an alkyl group, comprising reacting an aminoalkylsulfonate salt represented by the general formula [1]:    wherein M is an alkali metal atom, an organic ammonium ion or an ammonium ion; and R1 to R4 are the same as described above,    an aqueous solution thereof, or a solution dissolving any one of them in a water-soluble organic solvent, selected from alcohols having 1 to 3 carbon atoms, carboxylic acids having 2 to 12 carbon atoms and dimethylformamide, with an organic acid; and    a method of salt exchange for an aminoalkylsulfonate salt represented by the general formula [1']:    wherein M' is an alkali metal atom, an organic ammonium ion or an ammonium ion; and R1 and R4 are the same as described above, comprising reacting an aminoalkylsulfonate salt represented by the above general formula [2] with a hydroxide represented by the general formula [6]:         M'OH     [6]    wherein M' is the same as described above, in an alcohol or water".

  本发明涉及一种在工业规模上高效生产氨基磺酸的方法，并提供“一种生产由通式[2]表示的氨基磺酸的方法：其中R1和R2分别是氢原子、烷基、芳基或芳基烷基；R3和R4分别是氢原子或烷基的氨基磺酸盐发生反应所得的方法，通式[1]表示如下：其中M是碱金属原子、有机铵离子或铵离子；R1至R4与上述相同，其水溶液或将任何一种溶解于水溶性有机溶剂中的溶液，所选的有1至3个碳原子的醇、有2至12个碳原子的羧酸和二甲基甲酰胺，与有机酸反应；以及氨基磺酸盐交换的方法，通式[1']表示如下：其中M'是碱金属原子、有机铵离子或铵离子；R1和R4与上述相同，包括将上述通式[2]表示的氨基磺酸盐与通式[6]表示的氢氧化物发生反应：M'OH [6]其中M'与上述相同，在醇或水中”。
• Photosensitive composition, compound for use in the photosensitive composition, and pattern forming method using the photosensitive composition
  申请人：Wada Kenji

  公开号：US20050123859A1

  公开（公告）日：2005-06-09

  A photosensitive composition comprising a compound capable of generating a specific sulfonic acid upon irradiation with actinic rays or a radiation; a compound capable of generating a specific sulfonic acid upon irradiation with an actinic ray or a radiation; and a pattern forming method using a photosensitive composition comprising a compound capable of generating a specific sulfonic acid upon irradiation with an actinic ray or a radiation.

  一种包含能够在受到光敏辐射或辐射照射后生成特定磺酸的化合物的光敏组合物；一种包含能够在受到光敏辐射或辐射照射后生成特定磺酸的化合物的光敏组合物；以及一种使用包含能够在受到光敏辐射或辐射照射后生成特定磺酸的化合物的光敏组合物的图案形成方法。
• PROCESS FOR PRODUCING ESTER COMPOUND
  申请人：Imazeki Shigeaki

  公开号：US20100324314A1

  公开（公告）日：2010-12-23

  PROBLEM To provide an environmentally-friendly method for producing industrially an ester compound. SOLUTION The present invention is a method for producing an ester compound which comprises subjecting a carboxylic acid and an alcohol to dehydration-condensation reaction using an involatile acid catalyst and then removing the residual acid catalyst by bringing a weak basic substance into contact with the residual acid catalyst.

  问题提供一种生产工业酯化合物的环保方法。 解决方案是一种生产酯化合物的方法，包括将羧酸和醇经过脱水缩合反应，使用一种不挥发的酸催化剂，然后通过将弱碱性物质与残留的酸催化剂接触来去除残留的酸催化剂。