1-ethyl-cyclohexyl hydroperoxide | 18428-15-4

• 分子结构分类: 有机化合物 - 有机氧化合物 - 有机氢过氧化物
• 英文名称: 1-ethyl-cyclohexyl hydroperoxide
• 英文别名: 1-Aethyl-cyclohexylhydroperoxid；1-Hydroperoxy-1-aethyl-cyclohexan；1-Ethyl-cyclohexyl-hydroperoxide；1-ethyl-1-hydroperoxycyclohexane
• CAS: 18428-15-4
• 化学式: C₈H₁₆O₂
• 分子量: 144.214
• InChiKey: GUYYANKNZGSQPL-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.1
• 重原子数：
  10
• 可旋转键数：
  2
• 环数：
  1.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  29.5
• 氢给体数：
  1
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  1-ethyl-cyclohexyl hydroperoxide 在 高氯酸 作用下， 以 溶剂黄146 为溶剂， 生成 8-hydroxy-octan-3-one
  参考文献：
  名称：

  Pritzkow,W.; Groebe,K.-H., Chemische Berichte, 1960, vol. 93, p. 2156 - 2162

  摘要：

  DOI：
• 作为产物：
  描述：

  乙基环己烷 在 氧气 作用下， 生成 1-ethyl-cyclohexyl hydroperoxide
  参考文献：
  名称：

  Pritzkow,W.; Groebe,K.-H., Chemische Berichte, 1960, vol. 93, p. 2156 - 2162

  摘要：

  DOI：

文献信息

• Criegee; Dietrich, Justus Liebigs Annalen der Chemie, 1948, vol. 560, p. 135,140
  作者：Criegee、Dietrich

  DOI：——

  日期：——
• US3956397A
  申请人：——

  公开号：US3956397A

  公开（公告）日：1976-05-11
• [EN] ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, RESIST FILM USING THE SAME, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE<br/>[FR] COMPOSITION SENSIBLE AUX RAYONS ACTINIQUES OU SENSIBLE AUX RADIATIONS, FILM DE RÉSERVE L'UTILISANT, PROCÉDÉ DE FORMATION DE MOTIFS, PROCÉDÉ DE FABRICATION D'UN DISPOSITIF ÉLECTRONIQUE ET DISPOSITIF ÉLECTRONIQUE
  申请人：FUJIFILM CORP

  公开号：WO2013141395A1

  公开（公告）日：2013-09-26

  There is provided an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (P) having a repeating unit represented by the following Formula (A) and having at least two of a repeating unit represented by the following Formula (B), a repeating unit represented by the following Formula (C), a repeating unit represented by the following Formula (D) and a repeating unit represented by the following Formula (E).
• [EN] METHOD OF FORMING PATTERN AND ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION FOR USE IN THE METHOD<br/>[FR] PROCÉDÉ DE FORMATION DE MOTIF ET COMPOSITION DE RÉSINE SENSIBLE À UN RAYONNEMENT OU AUX RAYONS ACTINIQUES POUR UTILISATION DANS LE PROCÉDÉ
  申请人：FUJIFILM CORP

  公开号：WO2014007361A1

  公开（公告）日：2014-01-09

  Provided is a method of forming a pattern, including (a) forming a film comprising an actinic-ray- or radiation-sensitive resin composition comprising a resin (P) containing a repeating unit (P1) with a cyclic carbonic acid ester structure and any of repeating units (P2) of general formula (P2-1) below, and a compound (B) that when exposed to actinic rays or radiation, generates an acid, (b) exposing the film to actinic rays or radiation, and (c) developing the exposed film with a developer comprising an organic solvent to thereby obtain a negative pattern.
• [EN] ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE SAME, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE, AND COMPOUND<br/>[FR] COMPOSITION DE RÉSINE SENSIBLE AUX RAYONS ACTINIQUES OU SENSIBLE AU RAYONNEMENT ACTINIQUE, FILM DE PHOTORÉSINE UTILISANT UNE TELLE COMPOSITION, PROCÉDÉ DE FORMATION DE MOTIFS, ET PROCÉDÉ POUR LA FABRICATION DE DISPOSITIF ÉLECTRONIQUE ET DISPOSITIF ÉLECTRONIQUE, ET COMPOSÉ
  申请人：FUJIFILM CORP

  公开号：WO2014034533A1

  公开（公告）日：2014-03-06

  There is provided an actinic ray-sensitive or radiation-sensitive resin composition containing a compound represented by Formula (1): wherein R1 represents a polycyclic aromatic group or a polycyclic heterocyclic aromatic group, R2 represents a (n+2)-valent saturated hydrocarbon group, R3 represents a (m+2)-valent saturated hydrocarbon group, R4 and R5 each independently represent a substituent, Q represents a linking group containing a heteroatom, m and n each independently represent an integer of 0 to 12, when n is 2 or more, R4's may be the same or different, R4's may be linked to each other to form a non-aromatic ring together with R2, when m is 2 or more, R5's may be the same or different, and R5's may be linked to each other to form a non-aromatic ring together with R3, and X- represents a non-nucleophilic anion.