申请人:Sudo Atsushi
公开号:US20050130057A1
公开(公告)日:2005-06-16
It is intended to provide compositions to be used in resists and the like for forming fine patterns with a high sensitivity and a high resolution by increasing the difference in the solubilities between exposed parts and unexposed parts. Acid-degradable compositions contain a polymer having a repeating unit represented by the following general formula (I):
wherein R
1
and R
2
independently represent hydrogen atom, halogen atom, C
1-20
hydrocarbon group, a heterocyclic group, a cyano group, a nitro group, C(═O)R
4
group, S(O)
n
R
4
group, P(═O)(R
4
)
2
group or M(R
4
)
3
group; R
3
represents C
1-20
hydrocarbon group or a heterocyclic group: R
4
represents C
1-20
hydrocarbonoxy group, C
1-20
hydrocarbon group, C
1-20
hydrocarbonthio group or mono- or di-C
1-20
hydrocarbonamino group; M represents a silicon, germanium, tin or lead atom; and n is
0, 1
or
2
, and an acid or a compound capable of generating an acid in response to an external stimulus.
本发明旨在提供用于制备高灵敏度和高分辨率细微图案的抗蚀剂等组合物,通过增加曝光部分和未曝光部分之间的溶解度差异。可降解酸性组合物包含具有以下通式(I)所表示的重复单元的聚合物:其中,R1和R2独立地表示氢原子、卤素原子、C1-20碳氢基团、杂环基团、氰基团、硝基团、C(═O)R4基团、S(O)nR4基团、P(═O)(R4)2基团或M(R4)3基团;R3表示C1-20碳氢基团或杂环基团;R4表示C1-20碳氢氧基团、C1-20碳氢基团、C1-20碳氢硫基团或单烷基或二烷基氨基基团;M表示硅、锗、锡或铅原子;n为0、1或2,以及一种酸或能够响应外部刺激产生酸的化合物。