N-[2-(adamantan-1-ylcarbonyloxy)ethyl]trifluoromethanesulfonamide | 1379583-70-6

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 有机磺酸及其衍生物
• 英文名称: N-[2-(adamantan-1-ylcarbonyloxy)ethyl]trifluoromethanesulfonamide
• 英文别名: N-[2-(adamantane-1-ylcarbonyloxy)ethyl]trifluoromethanesulfonamide；2-(trifluoromethylsulfonylamino)ethyl adamantane-1-carboxylate
• CAS: 1379583-70-6
• 化学式: C₁₄H₂₀F₃NO₄S
• 分子量: 355.378
• InChiKey: JVBNWDXICYDSRP-UHFFFAOYSA-N

物化性质

• 沸点：
  396.1±52.0 °C(Predicted)
• 密度：
  1.415±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  3
• 重原子数：
  23
• 可旋转键数：
  6
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.93
• 拓扑面积：
  80.8
• 氢给体数：
  1
• 氢受体数：
  8

反应信息

• 作为反应物：
  描述：

  N-[2-(adamantan-1-ylcarbonyloxy)ethyl]trifluoromethanesulfonamide 在 碳酸氢钠 作用下， 反应 5.0h， 生成 N-[2-(adamantan-1-ylcarbonyloxy)ethyl]trifluoromethanesulfonamide sodium salt
  参考文献：
  名称：

  JP5728916

  摘要：

  公开号：
• 作为产物：
  描述：

  1-金刚烷甲酸 、 2-(三氟甲基)磺酰胺乙醇 在 对甲苯磺酸 作用下， 以 甲苯 为溶剂， 反应 9.0h， 以75%的产率得到N-[2-(adamantan-1-ylcarbonyloxy)ethyl]trifluoromethanesulfonamide
  参考文献：
  名称：

  NOVEL COMPOUND

  摘要：

  一个由一般公式表示的化合物（c1）（R1代表一个含有5个或更多碳原子的脂环基团，可能带有取代基; X代表双价连接基团; Y代表线性、支链或环烷基团或芳基团; Rf代表含有氟原子的烃基团; M+代表有机阳离子或金属阳离子）。

  公开号：

  US20120149916A1

文献信息

• RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ACID GENERATOR AND COMPOUND
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US20170176855A1

  公开（公告）日：2017-06-22

  A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, and which includes a base component (A) which exhibits changed solubility in a developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including a compound (B1) represented by general formula (b1) shown below (in general formula (b1), R b1 represents a bridged alicyclic group having 7 to 30 carbon atoms and containing a polar group; Y b1 represents a linear hydrocarbon group of 9 or more carbon atoms which may have a substituent excluding at least one member selected from the group consisting of an aromatic hydrocarbon group and a vinyl group; V b1 represents a fluorinated alkylene group; m represents an integer of 1 or more; and M m+ represents an organic cation having a valency of m). R b1 —Y b1 —V b1 —SO 3 − (M m+ ) 1/m (b1)

  一种抗蚀组合物，在暴露后产生酸，并在酸的作用下在显影溶液中表现出改变的溶解度，包括在酸的作用下在显影溶液中表现出改变的溶解度的基组分（A）和在暴露后产生酸的酸生成组分（B），其中酸生成组分（B）包括下面所示的一般式（b1）表示的化合物（B1）（在一般式（b1）中，Rb1代表具有7至30个碳原子并含有极性基团的桥环脂环基团；Yb1代表具有9个或更多碳原子的线性烃基团，可能具有一个取代基，但不包括由芳香烃基团和乙烯基组成的至少一种成员；Vb1代表氟代烷基烯基团；m表示1或更多的整数；Mm+代表价数为m的有机阳离子）。Rb1—Yb1—Vb1—SO3−(Mm+)1/m（b1）
• NOVEL COMPOUND
  申请人：UTSUMI Yoshiyuki

  公开号：US20120149916A1

  公开（公告）日：2012-06-14

  A compound represented by general formula (c1) (R 1 represents an alicyclic group of 5 or more carbon atoms which may have a substituent; X represents a divalent linking group; Y represents a linear, branched or cyclic alkylene group or an arylene group; Rf represents a hydrocarbon group containing a fluorine atom; and M + represents an organic cation or a metal cation).

  一个由一般公式表示的化合物（c1）（R1代表一个含有5个或更多碳原子的脂环基团，可能带有取代基; X代表双价连接基团; Y代表线性、支链或环烷基团或芳基团; Rf代表含有氟原子的烃基团; M+代表有机阳离子或金属阳离子）。
• Resist composition and method of forming resist pattern
  申请人：Shimizu Hiroaki

  公开号：US09005872B2

  公开（公告）日：2015-04-14

  A resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid, a basic-compound component (C) and an acid-generator component (B) which generates acid upon exposure, the component (B) including a compound represented by formula (b1), and the component (C) including at least one compound represented by formulas (c1) to (c3) (wherein Z1 represents a ring skeleton-containing hydrocarbon group, Q1 represents a divalent linking group containing oxygen, Y1 represents a fluorinated alkylene group, M+ represents an organic cation, R1 represents a fluorinated alkyl group or a hydrocarbon group, L1+ and L2+ represents a sulfonium or an iodonium, Z2 represents a hydrogen atom or a hydrocarbon group, Y2 represents a single bond or a divalent linking group containing no fluorine, R2 represents an organic group, Y3 represents an alkylene group or an arylene group; and Rf represents a fluorine-containing hydrocarbon group).

  一种抗蚀组合物，包括在酸的作用下在显影溶液中表现出改变溶解度的基础组分（A），以及在暴露后生成酸的酸发生剂组分（B）和碱性化合物组分（C），其中组分（B）包括由式（b1）表示的化合物，组分（C）包括至少一种由式（c1）到（c3）表示的化合物（其中Z1表示含环骨架的烃基，Q1表示含氧的双价连接基团，Y1表示氟化烷基基团，M+表示有机阳离子，R1表示氟化烷基基团或烃基，L1+和L2+表示砜或碘化物，Z2表示氢原子或烃基，Y2表示不含氟的双价连接基团或单键，R2表示有机基团，Y3表示烷基基团或芳基基团；Rf表示含氟烃基）。
• RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, ACID GENERATOR, PHOTOREACTIVE QUENCHER, AND COMPOUND
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US20160280679A1

  公开（公告）日：2016-09-29

  A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, and which includes a base component which exhibits changed solubility in a developing solution under action of acid and an acid-generator component including a compound (B0-1) represented by general formula (b0) shown below in which Ra 1 represents an aromatic ring; Ra 01 represents an alkyl group of 5 or more carbon atoms optionally having a substituent; Ra 02 and Ra 03 each independently represents an alkyl group of 1 to 10 carbon atoms optionally having a substituent; n1 represents an integer of 1 to 5; n2 represents an integer of 0 to 2; n3 represents an integer of 0 to 4; and X − represents a counteranion.

  一种抗蚀组合物，暴露后产生酸并在酸的作用下在显影溶液中表现出溶解度改变，包括在酸的作用下在显影溶液中表现出溶解度改变的碱性组分和包括一种化合物（B0-1）的酸发生组分，该化合物由下面所示的一般式（b0）表示，其中Ra1代表芳香环；Ra01代表具有5个或更多碳原子的烷基基团，可选地具有取代基；Ra02和Ra03各自独立地表示具有1至10个碳原子的烷基基团，可选地具有取代基；n1表示1至5的整数；n2表示0至2的整数；n3表示0至4的整数；X−表示一个反离子。
• ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20220127225A1

  公开（公告）日：2022-04-28

  An onium salt having formula (1) serving as an acid diffusion inhibitor and a chemically amplified resist composition comprising the acid diffusion inhibitor are provided. When processed by lithography, the resist composition forms a pattern having minimal defects and excellent lithography performance factors such as CDU, LWR and DOF.

  提供一种化学式为(1)的盐类，作为酸扩散抑制剂，并提供一种化学增强型光刻胶组合物，其中包括该酸扩散抑制剂。当通过光刻技术进行加工时，该光刻胶组合物形成的图案具有最小的缺陷和出色的光刻性能因子，如CDU、LWR和DOF。