2-乙基己基 2-甲基丁酸酯 | 94200-09-6

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 脂肪酰基
• 中文名称: 2-乙基己基 2-甲基丁酸酯
• 中文别名: 2-乙基己基2-甲基丁酸酯
• 英文名称: 2-Ethylhexyl 2-methylbutyrate
• 英文别名: 2-ethylhexyl 2-methylbutanoate
• CAS: 94200-09-6
• 化学式: C₁₃H₂₆O₂
• 分子量: 214.34
• InChiKey: CQIXPDMUKZPTPX-UHFFFAOYSA-N

物化性质

• LogP：
  5.059 (est)

计算性质

• 辛醇/水分配系数(LogP)：
  4.6
• 重原子数：
  15
• 可旋转键数：
  9
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.92
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  2

文献信息

• Actinic-Ray- or Radiation-Sensitive Resin Composition, Compound and Method of Forming Pattern Using the Composition
  申请人：Yamaguchi Shuhei

  公开号：US20120237874A1

  公开（公告）日：2012-09-20

  According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes any of the compounds (A) of general formula (I) below that when exposed to actinic rays or radiation, generates an acid and a resin (B) whose rate of dissolution into an alkali developer is increased by the action of an acid. (The characters used in general formula (I) have the meanings mentioned in the description.)

  根据一种实施例，一种感光射线或辐射敏感的树脂组合物包括以下任何一种化合物（A），该化合物在暴露于感光射线或辐射时会产生酸和树脂（B），其溶解速度在碱性显影剂的作用下会增加。 （通式（I）中使用的字符具有描述中提到的含义。）
• POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME
  申请人：HIRANO Shuji

  公开号：US20080248419A1

  公开（公告）日：2008-10-09

  A positive resist composition, includes: (A) a resin that has a group having absorption at 248 nm at a main chain terminal of the resin (A), and a pattern forming method uses the composition.

  一种正性光刻胶组合物，包括：（A）一种具有在树脂（A）的主链端具有在248nm处吸收的基团的树脂，并且使用该组合物进行图案形成的方法。
• COPOLYMERS HAVING 1-METHYL-2-METHOXYETHYL MOIETIES
  申请人：Pacetti Stephen

  公开号：US20080125560A1

  公开（公告）日：2008-05-29

  The copolymers include a hydrophobic monomer and an acryloyl or methacryloyl ester of a propylene glycol monomethyl ether, also referred to as 1-methyl-2-methoxyethyl acrylate (“MMOEA”). The combination of the hydrophobic monomer and the MMOEA monomer advantageously provides desired mechanical strength, biocompatibility, and drug permeability in the copolymers. The copolymers can advantageously be used on medical devices.

  这些共聚物包括疏水单体和丙二醇单甲醚的丙烯酰基或甲基丙烯酰基酯，也称为1-甲基-2-甲氧基乙基丙烯酸酯（“MMOEA”）。疏水单体和MMOEA单体的组合在共聚物中优点在于提供所需的机械强度、生物相容性和药物渗透性。这些共聚物可以优点地用于医疗器械。
• LUBRICATING OIL FOR REFRIGERATOR, HYDRAULIC FLUID COMPOSITION FOR REFRIGERATOR AND METHOD FOR LUBRICATION OF REFRIGERATOR
  申请人：NEW JAPAN CHEMICAL CO.,LTD.

  公开号：EP1225213A1

  公开（公告）日：2002-07-24

  The invention provides a lubricating oil for refrigerators, comprising (a) at least one ester represented by the formula (1) wherein R1 is C1 to C18 straight-chain alkyl or C3 to C18 branched-chain alkyl; R2 is H, C1 to C18 straight-chain alkyl or C3 to C18 branched-chain alkyl; with the poviso that the total number of carbons contained in the alkyls represented by R1 and R2 is 2 to 18 and that when R2 is H, R1 is branched-chain alkyl; and R3 is C1 to C20 straight-chain alkyl, C3 to C20 branched-chain alkyl or C3 to C10 cycloalkyl, optionally in combination with (b) at least one member selected from the group consisting of fatty acid polyol esters, phthalic acid esters, alicyclic dicarboxylic acid esters, polyvinyl ethers, hydrocarbon oils and polyalkylene glycols; as well as a method for lubricating a refrigerator using such a lubricating oil, and a working fluid composition for refrigerators comprising (I) component (a) or components (a) and (b) and (II) a refrigerant.

  本发明提供了一种用于冰箱的润滑油，包括 (a) 至少一种由式 (1) 代表的酯类 其中 R1 是 C1 至 C18 直链烷基或 C3 至 C18 支链烷基；R2 是 H、C1 至 C18 直链烷基或 C3 至 C18 支链烷基；前提是 R1 和 R2 所代表的烷基所含的碳总数为 2 至 18，且当 R2 为 H 时，R1 为支链烷基；和 R3 是 C1 至 C20 直链烷基、C3 至 C20 支链烷基或 C3 至 C10 环烷基，可选择与 (b) 至少一种选自脂肪酸多元醇酯、邻苯二甲酸酯、脂环二羧酸酯、聚乙烯醚、烃油和聚烷基二 醇组成的组的成员结合使用；以及一种使用这种润滑油润滑冰箱的方法，和一种用于冰箱的工作液组合物，该组合物包括 (I) 成分 (a) 或成分 (a) 和 (b) 以及 (II) 制冷剂。
• Pattern forming method, composition kit and resist film, manufacturing method of electronic device using these, and electronic device
  申请人：FUJIFILM Corporation

  公开号：US10031419B2

  公开（公告）日：2018-07-24

  There is provided a pattern forming method comprising (i) forming a film on a substrate using an actinic ray-sensitive or radiation-sensitive resin composition which contains (A) a resin which decomposes due to an action of an acid to change its solubility with respect to a developer and (C) a specific resin, (ii) forming a top coat layer using a top coat composition which contains a resin (T) on the film, (iii) exposing the film which has the top coat layer to actinic rays or radiation, and (iv) forming a pattern by developing the film which has the top coat layer after the exposing.

  本发明提供了一种图案形成方法，包括(i)使用感光树脂组合物或辐射敏感树脂组合物在基底上形成胶片，该组合物包含(A)由于酸的作用而分解，从而改变其相对于显影剂的溶解度的树脂和(C)特定树脂、(ii) 使用含有树脂 (T) 的表层组合物在胶片上形成表层，(iii) 将具有表层的胶片暴露于放 射线或辐射，(iv) 在暴露后对具有表层的胶片进行显影，形成图案。