2-乙氧基甲基-丁酸 | 19758-28-2

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 脂肪酰基
• 中文名称: 2-乙氧基甲基-丁酸
• 英文名称: 2-ethoxymethyl-butyric acid
• 英文别名: 3-Aethoxy-2-aethyl-propionsaeure；2-Aethoxymethyl-buttersaeure；2-ethoxymethylbutyric acid；2-Ethoxymethyl-buttersaeure；Ethoxyisovaleriansaeure；2-(Ethoxymethyl)butanoic acid
• CAS: 19758-28-2
• 化学式: C₇H₁₄O₃
• 分子量: 146.186
• InChiKey: RHDAAWLTXPGJDZ-UHFFFAOYSA-N

物化性质

• 沸点：
  120 °C(Press: 15 Torr)
• 密度：
  0.9907 g/cm3

计算性质

• 辛醇/水分配系数(LogP)：
  0.9
• 重原子数：
  10
• 可旋转键数：
  5
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.86
• 拓扑面积：
  46.5
• 氢给体数：
  1
• 氢受体数：
  3

反应信息

• 作为反应物：
  描述：

  2-乙氧基甲基-丁酸 在 氯化亚砜 、 乙醚 、 氨 作用下， 生成 4-ethoxymethyl-3-oxo-hexanoic acid ethyl ester
  参考文献：
  名称：

  Sacharkin; Preobrashenskii, Zhurnal Obshchei Khimii, 1952, vol. 22, p. 1890,1894; engl. Ausg. S. 1931, 1934

  摘要：

  DOI：
• 作为产物：
  描述：

  ethoxymethyl-ethyl-malonic acid diethyl ester 在 氢氧化钾 作用下， 生成 2-乙氧基甲基-丁酸
  参考文献：
  名称：

  Sacharkin; Preobrashenskii, Zhurnal Obshchei Khimii, 1952, vol. 22, p. 1890,1894; engl. Ausg. S. 1931, 1934

  摘要：

  DOI：

文献信息

• MONOMERS, POLYMERS AND PHOTORESIST COMPOSITIONS
  申请人：Rohm and Haas Electronic Materials Korea Ltd.

  公开号：US20180059545A1

  公开（公告）日：2018-03-01

  In one preferred embodiment, polymers are provided that comprise a structure of the following Formula (I): Photoresists that comprises such polymers also are provided.

  在一个首选实施例中，提供了包含以下化学式（I）结构的聚合物： 还提供了包含这种聚合物的光刻胶。
• RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYPHENOLIC COMPOUND FOR USE IN THE COMPOSITION, AND ALCOHOLIC COMPOUND THAT CAN BE DERIVED THEREFROM
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：US20160145231A1

  公开（公告）日：2016-05-26

  A resist composition containing a compound represented by the general formula (1) or (2), a method for forming a resist pattern using the composition, a polyphenolic compound for use in the composition, and an alcoholic compound that can be derived therefrom are described.

  描述了一种包含由通式（1）或（2）表示的化合物的光刻胶组合物，使用该组合物形成光刻胶图案的方法，用于该组合物的多酚化合物，以及可以由其衍生的醇化合物。
• RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US20170371241A1

  公开（公告）日：2017-12-28

  A resist composition containing a resin component having a structural unit represented by general formula (a0-1), and a compound represented by general formula (b1). In general formula (a0-1), R is a hydrogen atom, an alkyl group, or a halogenated alkyl group. Va 1 is a divalent hydrocarbon group. n a1 represents an integer of 0 to 2. Ra′ 12 and Ra′ 13 are a monovalent chain saturated hydrocarbon group having 1 to 10 carbon atoms or a hydrogen atom. Ra′ 14 is a phenyl group, a naphthyl group, or an anthryl group. In general formula (b1), R b1 represents a cyclic hydrocarbon group. Y b1 represents a divalent linking group containing an ester bond. V b1 represents an alkylene group, a fluorinated alkylene group, or a single bond. m is an integer of 1 or more, and M m+ is an m-valent organic cation.

  一种电阻组分，包含具有一般式（a0-1）所代表的结构单元的树脂组分，以及一种由一般式（b1）所代表的化合物。在一般式（a0-1）中，R是氢原子、烷基或卤代烷基。Va1是双价碳氢基团。na1表示0至2的整数。Ra′12和Ra′13是具有1至10个碳原子的单价链饱和碳氢基团或氢原子。Ra′14是苯基、萘基或蒽基。在一般式（b1）中，Rb1代表环烃基。Yb1代表含有酯键的双价连接基团。Vb1代表烷基、氟化烷基或单键。m是1或更多的整数，Mm+是m价有机阳离子。
• RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ACID GENERATOR AND COMPOUND
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US20170176855A1

  公开（公告）日：2017-06-22

  A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, and which includes a base component (A) which exhibits changed solubility in a developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including a compound (B1) represented by general formula (b1) shown below (in general formula (b1), R b1 represents a bridged alicyclic group having 7 to 30 carbon atoms and containing a polar group; Y b1 represents a linear hydrocarbon group of 9 or more carbon atoms which may have a substituent excluding at least one member selected from the group consisting of an aromatic hydrocarbon group and a vinyl group; V b1 represents a fluorinated alkylene group; m represents an integer of 1 or more; and M m+ represents an organic cation having a valency of m). R b1 —Y b1 —V b1 —SO 3 − (M m+ ) 1/m (b1)

  一种抗蚀组合物，在暴露后产生酸，并在酸的作用下在显影溶液中表现出改变的溶解度，包括在酸的作用下在显影溶液中表现出改变的溶解度的基组分（A）和在暴露后产生酸的酸生成组分（B），其中酸生成组分（B）包括下面所示的一般式（b1）表示的化合物（B1）（在一般式（b1）中，Rb1代表具有7至30个碳原子并含有极性基团的桥环脂环基团；Yb1代表具有9个或更多碳原子的线性烃基团，可能具有一个取代基，但不包括由芳香烃基团和乙烯基组成的至少一种成员；Vb1代表氟代烷基烯基团；m表示1或更多的整数；Mm+代表价数为m的有机阳离子）。Rb1—Yb1—Vb1—SO3−(Mm+)1/m（b1）
• [EN] NOVEL BIO-BASED DIOLS FROM SUSTAINABLE RAW MATERIALS, USES THEREOF TO MAKE DIGLYCIDYL ETHERS, AND THEIR COATINGS<br/>[FR] NOUVEAUX DIOLS D'ORIGINE BIOLOGIQUE À PARTIR DE MATIÈRES PREMIÈRES RENOUVELABLES, LEURS UTILISATIONS POUR LA FABRICATION D'ÉTHERS DIGLYCIDYLIQUES, ET LEURS REVÊTEMENTS
  申请人：NDSU RES FOUNDATION

  公开号：WO2021007171A1

  公开（公告）日：2021-01-14

  The invention relates to diols derived from 5-hydroxymethyl furfural, diformyl furan, or derivatives thereof. The invention further relates to diglycidyl ethers derived from the diols of the invention, curable coating compositions containing the diglycidyl ethers, and objects coated with the curable coating compositions. The invention also relates to composites, composites, adhesives, and films containing the diglycidyl ethers of the invention. The invention also relates to methods of making the diols, diglycidyl ethers, and curable coating compositions.

  该发明涉及从5-羟甲基糠醛、二甲酰呋喃或其衍生物衍生的二元醇。该发明还涉及从该发明的二元醇衍生的二环氧乙烷醚，含有该二环氧乙烷醚的可固化涂料组合物，以及涂有该可固化涂料组合物的物体。该发明还涉及含有该发明的二环氧乙烷醚的复合材料、胶粘剂和薄膜。该发明还涉及制备二元醇、二环氧乙烷醚和可固化涂料组合物的方法。