申请人:Matsumoto Akira
公开号:US20050153244A1
公开(公告)日:2005-07-14
Chemically amplified photoresist compositions comprising, (a) a compound which cures upon the action of an acid or a compound whose solubility is increased upon the action of an acid; and (b) a compound of the formula (Ia), (Ib), (IIa), (IIb), (IIIa), (IIIb), (Iva), (Ivb), (Va), (Vb) or (VIa), wherein n is 1 or 2; m is 0 or 1; X
0
is —[CH
2]
h
—X or —CH═CH
2
; h is 2, 3, 4, 5 or 6; R
1
when n is 1, is for example optionally substituted phenyl, naphthyl, anthracyl, phenanthryl, or heteroaryl; R
1
, when n is 2, is for example optionally substituted phenylene or naphthylene; R
2
for example has one of the meanings of R
1
; X is for example —OR
20
, —NR
21
R
22
, —SR
23
; X′ is —X
1
-A
3
-X
2
—; X
1
and X
2
are for example —O—, —S— or a direct bond; A
3
is e.g. phenylene; R
3
has for example one of the meanings given for R
1
; R
4
has for example one of the meaning given for R
2
; R
5
and R
6
e.g. are hydrogen; G i.a. is —S— or —O—; R
7
when n is 1, e.g. is phenyl, optionally substituted, when n is 2, is for example phenylene; R
8
and R
9
e.g. are C
1
-C
18
alkyl; R
10
has one of the meanings given for R
7
; R
11
i.a. is C
1
-C
18
alkyl; R
12
, R
13
, R
14
, R
15
R
16
, R
17
and R
18
for example are hydrogen or C
1
-C
18
alkyl; R
20
, R
21
, R
22
and R
23
i.a are phenyl or C
1
-C
18
alkyl; give high resolution with good resist profile.
化学增感光阻剂组合物包括:(a)一种在酸的作用下固化或其溶解度在酸的作用下增加的化合物;和(b)式(Ia)、(Ib)、(IIa)、(IIb)、(IIIa)、(IIIb)、(Iva)、(Ivb)、(Va)、(Vb)或(VIa)的化合物,其中n为1或2;m为0或1;X0为—[CH2]h—X或—CH═CH2;h为2、3、4、5或6;当n为1时,R1例如为可选取代的苯基、萘基、蒽基、菲基或杂环芳基;当n为2时,R1例如为可选取代的苯基或萘基;R2例如具有R1的其中一种含义;X例如为—OR20、—NR21R22、—SR23;X′为—X1-A3-X2—;X1和X2例如为—O—、—S—或直接键;A3例如为苯基;R3例如具有R1给出的其中一种含义;R4例如具有R2给出的其中一种含义;R5和R6例如为氢;G例如为—S—或—O—;当n为1时,R7例如为可选取代的苯基,当n为2时,例如为苯基;R8和R9例如为C1-C18烷基;R10具有R7给出的其中一种含义;R11例如为C1-C18烷基;R12、R13、R14、R15、R16、R17和R18例如为氢或C1-C18烷基;R20、R21、R22和R23例如为苯基或C1-C18烷基;具有良好的抗蚀性能和高分辨率。