申请人:SHIN-ETSU CHEMICAL CO., LTD.
公开号:US11022882B2
公开(公告)日:2021-06-01
A compound shown by the following general formula (1-1),
AR1 and AR2 each independently represent an aromatic ring or an aromatic ring containing at least one nitrogen and/or sulfur atom, two AR1s, AR1 and AR2, or two AR2s are optionally bonded; AR3 represents a benzene, naphthalene, thiophene, pyridine, or diazine ring; A represents an organic group; B represents an anionic leaving group; Y represents a divalent organic group; “p” is 1 or 2; “q” is 1 or 2; “r” is 0 or 1; “s” is 2 to 4; when s=2, Z represents a single bond, divalent atom, or divalent organic group; and when s=3 or 4, Z represents a trivalent or quadrivalent atom or organic group. This compound cures to form an organic film, and also forms an organic under layer film.
如下通式 (1-1) 所示的化合物、
AR1 和 AR2 各自独立地代表一个芳香环或一个至少含有一个氮原子和/或硫原子的芳香环,两个 AR1、AR1 和 AR2 或两个 AR2 可以选择键合;AR3 代表苯环、萘环、噻吩环、吡啶环或重氮环;A 代表一个有机基团;B 代表阴离子离去基团;Y 代表二价有机基团;"p "为 1 或 2;"q "为 1 或 2;"r "为 0 或 1;"s "为 2 至 4;当 s=2 时,Z 代表单键、二价原子或二价有机基团;当 s=3 或 4 时,Z 代表三价或四价原子或有机基团。这种化合物固化后可形成有机薄膜,也可形成有机底层薄膜。