[EN] TRPML MODULATORS<br/>[FR] MODULATEURS DE TRPML
申请人:CASMA THERAPEUTICS INC
公开号:WO2021127337A1
公开(公告)日:2021-06-24
The present invention provides compounds, pharmaceutically acceptable compositions thereof, and methods of using the same.
本发明提供了化合物、药学上可接受的组合物以及使用这些化合物的方法。
INHIBITORS OF STEAROYL-COA DESATURASE
申请人:Gillespie Paul
公开号:US20090149466A1
公开(公告)日:2009-06-11
Provided herein are compounds of the formula (I):
as well as pharmaceutically acceptable salts thereof, wherein the substituents are as those disclosed in the specification. These compounds, and the pharmaceutical compositions containing them, are useful for the treatment of diseases such as, for example, obesity.
[EN] PYRAZOLE DERIVATIVES AS SGC STIMULATORS<br/>[FR] DÉRIVÉS DE PYRAZOLE UTILISÉS COMME STIMULATEURS DE SGC
申请人:IRONWOOD PHARMACEUTICALS INC
公开号:WO2016044447A1
公开(公告)日:2016-03-24
There are described imidazole and pyrazole derivatives which are useful as stimulators of sGC, particularly NO-independent, heme-dependent stimulators. These compounds are also useful for treating, preventing or managing various disorders that are herein disclosed.
[EN] NEW HETEROCYCLIC COMPOUNDS AS MONOACYLGLYCEROL LIPASE INHIBITORS<br/>[FR] NOUVEAUX COMPOSÉS HÉTÉROCYCLIQUES UTILISÉS EN TANT QU'INHIBITEURS DE MONOACYLGLYCÉROL LIPASE
申请人:HOFFMANN LA ROCHE
公开号:WO2020035425A1
公开(公告)日:2020-02-20
The invention provides new heterocyclic compounds having the general formula (I) wherein A, L, X, m, n, R1 and R2 are as described herein, compositions including the compounds, processes of manufacturing the compounds, methods of using the compounds and methods of determining the monoacylglycerol lipase (MAGL) inhibitory activity of the compounds.
[EN] NEW HETEROCYCLIC COMPOUNDS AS MONOACYLGLYCEROL LIPASE INHIBITORS<br/>[FR] NOUVEAUX COMPOSÉS HÉTÉROCYCLIQUES EN TANT QU'INHIBITEURS DE MONOACYLGLYCÉROL LIPASE
申请人:HOFFMANN LA ROCHE
公开号:WO2020035424A1
公开(公告)日:2020-02-20
The invention provides new heterocyclic compounds having the general formula (I) wherein A, L, X, m, n, R1 and R2 are as described herein, compositions including the compounds, processes of manufacturing the compounds and methods of using the compounds.