The present invention relates to novel solid-phase processes for the production of radiolabelled tracers, in particular for the production of
18
F-labelled compounds which may be suitable for use as Positron Emission Tomography (PET) radiotracers. The invention also comprises radiopharmaceutical kits using these novel processes.
Resist composition and method of pattern formation with the same
申请人:Takahashi Hyou
公开号:US20060068320A1
公开(公告)日:2006-03-30
A resist composition comprises (A) a compound having a molecular weight of 3,000 or lower which has in its molecule a structure having two or more monovalent anions and a structure having two or more monovalent cations.
Solid-phase preparation of [18f] fluorohaloalkanes
申请人:Brady Frank
公开号:US20060069294A1
公开(公告)日:2006-03-30
The invention relates to a process for the production of an [
18
F]fluorohaloalkane which comprises treatment of a solid support-bound precursor of formula (I): SOLID SUPPORT-LINKER-SO
2
—O—(CH
2
)
n
X (I) wherein n is an integer of from (1) to (7) and X is chloro, bromo or iodo; with
18
F
−
to produce the [
18
F]fluorohaloalkane of formula (II)
18
F—(CH
2
)
n
X (II) wherein n and X are as defined for the compound of formula (I), optionally followed by (i) removal of excess
18
F
−
, for example by ion-exchange chromatography; and/or (ii) removal of organic solvent.
The present application relates to a compound of formula A-X—B, where (i) A-X—B form an ionic compound Ai Xi Bi where Ai and Bi are each individually an organic onium cation; and Xi is anion of the formula Q-R
500
—SO
3
−
or (ii) A-X—B form a non-ionic compound Ac-Xc-Bc, where Ai, Bi, Q,, R
500
, Ac, Bc, and Xc are defined herein. The compounds are useful as photoactive materials.
本申请涉及一种化合物A-X-B,其中(i)A-X-B形成离子化合物Ai Xi Bi,其中Ai和Bi分别是有机离子阳离子;Xi是公式Q-R500-SO3-的阴离子;或(ii)A-X-B形成非离子化合物Ac-Xc-Bc,其中Ai,Bi,Q,R500,Ac,Bc和Xc在此定义。该化合物可用作光活性材料。
Solid-Phase Preparation of [18F]Fluorohaloalkanes
申请人:Brady Frank
公开号:US20070202039A1
公开(公告)日:2007-08-30
The invention relates to a process for the production of an [
18
F]fluorohaloalkane which comprises treatment of a solid support-bound precursor of formula (I):
SOLID SUPPORT-LINKER-SO
2
—O—(CH
2
)
n
X (I)
wherein n is an integer of from 1 to 7 and X is chloro, bromo or iodo;
with
18
F
−
to produce the [
18
F]fluorohaloalkane of formula (II)
18
F—(CH
2
)
n
—X (II)
wherein n and X are as defined for the compound of formula (I), optionally followed by
(i) removal of excess
18
F
−
, for example by ion-exchange chromatography; and/or (ii) removal of organic solvent.