Resist composition and method of pattern formation with the same
申请人:Takahashi Hyou
公开号:US20060068320A1
公开(公告)日:2006-03-30
A resist composition comprises (A) a compound having a molecular weight of 3,000 or lower which has in its molecule a structure having two or more monovalent anions and a structure having two or more monovalent cations.
Solid-phase preparation of [18f] fluorohaloalkanes
申请人:Brady Frank
公开号:US20060069294A1
公开(公告)日:2006-03-30
The invention relates to a process for the production of an [
18
F]fluorohaloalkane which comprises treatment of a solid support-bound precursor of formula (I): SOLID SUPPORT-LINKER-SO
2
—O—(CH
2
)
n
X (I) wherein n is an integer of from (1) to (7) and X is chloro, bromo or iodo; with
18
F
−
to produce the [
18
F]fluorohaloalkane of formula (II)
18
F—(CH
2
)
n
X (II) wherein n and X are as defined for the compound of formula (I), optionally followed by (i) removal of excess
18
F
−
, for example by ion-exchange chromatography; and/or (ii) removal of organic solvent.
The present application relates to a compound of formula A-X—B, where (i) A-X—B form an ionic compound Ai Xi Bi where Ai and Bi are each individually an organic onium cation; and Xi is anion of the formula Q-R
500
—SO
3
−
or (ii) A-X—B form a non-ionic compound Ac-Xc-Bc, where Ai, Bi, Q,, R
500
, Ac, Bc, and Xc are defined herein. The compounds are useful as photoactive materials.
本申请涉及一种化合物A-X-B,其中(i)A-X-B形成离子化合物Ai Xi Bi,其中Ai和Bi分别是有机离子阳离子;Xi是公式Q-R500-SO3-的阴离子;或(ii)A-X-B形成非离子化合物Ac-Xc-Bc,其中Ai,Bi,Q,R500,Ac,Bc和Xc在此定义。该化合物可用作光活性材料。
Solid-Phase Preparation of [18F]Fluorohaloalkanes
申请人:Brady Frank
公开号:US20070202039A1
公开(公告)日:2007-08-30
The invention relates to a process for the production of an [
18
F]fluorohaloalkane which comprises treatment of a solid support-bound precursor of formula (I):
SOLID SUPPORT-LINKER-SO
2
—O—(CH
2
)
n
X (I)
wherein n is an integer of from 1 to 7 and X is chloro, bromo or iodo;
with
18
F
−
to produce the [
18
F]fluorohaloalkane of formula (II)
18
F—(CH
2
)
n
—X (II)
wherein n and X are as defined for the compound of formula (I), optionally followed by
(i) removal of excess
18
F
−
, for example by ion-exchange chromatography; and/or (ii) removal of organic solvent.
Solid-phase preparation of [18F] fluorohaloalkanes
申请人:Hammersmith Imanet Ltd.
公开号:US07223891B2
公开(公告)日:2007-05-29
The invention relates to a process for the production of an [18F]fluorohaloalkane which comprises treatment of a solid support-bound precursor of formula (I): SOLID SUPPORT-LINKER-SO2—O—(CH2)nX (I) wherein n is an integer of from (1) to (7) and X is chloro, bromo or iodo; with 18F− to produce the [18F]fluorohaloalkane of formula (II) 18F—(CH2)n—X (II) wherein n and X are as defined for the compound of formula (I), optionally followed by (i) removal of excess 18F−, for example by ion-exchange chromatography; and/or (ii) removal of organic solvent.