2-HHSP | 801219-35-2

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯酚醚
• 英文名称: 2-HHSP
• 英文别名: 6-{4-[2-(Pyridin-2-YL)ethenyl]phenoxy}hexan-1-OL；6-[4-(2-pyridin-2-ylethenyl)phenoxy]hexan-1-ol
• CAS: 801219-35-2
• 化学式: C₁₉H₂₃NO₂
• 分子量: 297.397
• InChiKey: ARCNUHDQHVUBMY-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.9
• 重原子数：
  22
• 可旋转键数：
  9
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.32
• 拓扑面积：
  42.4
• 氢给体数：
  1
• 氢受体数：
  3

反应信息

• 作为产物：
  描述：

  6-溴正己醇 、 4-(2-(2-pyridinyl)ethenyl)phenol 在 potassium carbonate 作用下， 以 丙酮 为溶剂， 以67.3%的产率得到2-HHSP
  参考文献：
  名称：

  Synthesis and Photolithographic Property of Conjugated Polymers with Polyazomethine Structure

  摘要：

  Two different polyazomethine-type conjugated polymers, poly(phenoxiazine-3, 3'-dihydroxybensidine)(PZ-DHB) and poly(phenoxiazine-2,4-diamino-6-hydroxypyrimidine)(PZ-DHP) containing phenothiazine moiety and azomethine linkage in the main chain were synthesized by Schiff-base polycondensation reactions. The polymer poly(PZ-DHB) was converted to the photosensitive type, through Mitsunobu reaction by incorporation of a photocrosslinkable group, hydroxyhexyloxystyryl-2-pyridine(2-HHSP) into the polymer side chains. The photosensitive conjugated polymer, poly(PZ-DHB)-PS, exhibited both strong fluorescence emission at 555 nm and good patterning property in the standard photolithographic processes.

  DOI：

  10.1080/15421400903240803

文献信息

• Synthesis and Photolithographic Property of Conjugated Polymers with Polyazomethine Structure
  作者：Sang Chul Ryu、Young Chul Jeong、Lee Soon Park

  DOI：10.1080/15421400903240803

  日期：2009.11.11

  Two different polyazomethine-type conjugated polymers, poly(phenoxiazine-3, 3'-dihydroxybensidine)(PZ-DHB) and poly(phenoxiazine-2,4-diamino-6-hydroxypyrimidine)(PZ-DHP) containing phenothiazine moiety and azomethine linkage in the main chain were synthesized by Schiff-base polycondensation reactions. The polymer poly(PZ-DHB) was converted to the photosensitive type, through Mitsunobu reaction by incorporation of a photocrosslinkable group, hydroxyhexyloxystyryl-2-pyridine(2-HHSP) into the polymer side chains. The photosensitive conjugated polymer, poly(PZ-DHB)-PS, exhibited both strong fluorescence emission at 555 nm and good patterning property in the standard photolithographic processes.