琥珀酸二己酯 | 15805-75-1

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 脂肪酰基
• 中文名称: 琥珀酸二己酯
• 英文名称: dihexyl succinate
• 英文别名: dihexyl butanedioate
• CAS: 15805-75-1
• 化学式: C₁₆H₃₀O₄
• 分子量: 286.412
• InChiKey: XEYHWMQDXTVNJW-UHFFFAOYSA-N

物化性质

• 沸点：
  326.6±10.0 °C(Predicted)
• 密度：
  0.955±0.06 g/cm3(Predicted)
• LogP：
  5.354 (est)
• 保留指数：
  1941;1910

计算性质

• 辛醇/水分配系数(LogP)：
  5
• 重原子数：
  20
• 可旋转键数：
  15
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.88
• 拓扑面积：
  52.6
• 氢给体数：
  0
• 氢受体数：
  4

安全信息

• 海关编码：
  2917190090

反应信息

• 作为反应物：
  描述：

  琥珀酸二己酯 在 sodium sulfite 作用下， 以 水 为溶剂， 生成 sodium dioctyl sulfosuccinate
  参考文献：
  名称：

  Jobe, David J.; Reinsborough, Vincent C., Canadian Journal of Chemistry, 1984, vol. 62, p. 280 - 284

  摘要：

  DOI：
• 作为产物：
  描述：

  马来酸酐 、 正己醇 反应 2.0h， 生成 琥珀酸二己酯
  参考文献：
  名称：

  Jobe, David J.; Reinsborough, Vincent C., Canadian Journal of Chemistry, 1984, vol. 62, p. 280 - 284

  摘要：

  DOI：

文献信息

• MATERIAL FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND COMPOUND
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20210286266A1

  公开（公告）日：2021-09-16

  The present invention is a material for forming an organic film, including: a compound shown by the following general formula (1); and an organic solvent, where in the general formula (1), X represents an organic group with a valency of “n” having 2 to 50 carbon atoms or an oxygen atom, “n” represents an integer of 1 to 10 , and R 1 independently represents any of the following general formulae (2), where in the general formulae (2), broken lines represent attachment points to X, and Q 1 represents a monovalent organic group containing a carbonyl group, at least a part of which is a group shown by the following general formulae (3), where in the general formulae (3), broken lines represent attachment points, X 1 represents a single bond or a divalent organic group having 1 to 20 carbon atoms optionally having a substituent when the organic group has an aromatic ring, R 2 represents a hydrogen atom, a methyl group, an ethyl group, or a phenyl group, and ** represents an attachment point. An object of the present invention is to provide a material for forming an organic film for forming an organic film having dry etching resistance, and also having high filling and planarizing properties and adhesion to a substrate.

  本发明是一种用于形成有机薄膜的材料，包括：由以下通用式（1）所示的化合物；和有机溶剂，在通用式（1）中，X代表具有2至50个碳原子或一个氧原子的价为“n”的有机基团，“n”表示1到10的整数，R1独立地表示以下通用式（2）中的任何一种，其中在通用式（2）中，虚线表示连接点到X，Q1表示含有羰基的一价有机基团，其中至少部分是以下通用式（3）所示的基团，其中在通用式（3）中，虚线表示连接点，X1表示单键或具有1到20个碳原子的二价有机基团，在有机基团具有芳香环时可选地具有取代基，R2表示氢原子、甲基基团、乙基基团或苯基团，**表示连接点。本发明的目的是提供一种用于形成具有干法刻蚀抗性的有机薄膜的材料，同时具有高填充和平整化性能以及对基底的粘附性。
• COMPOUND, COMPOSITION FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING SEMICONDUCTOR APPARATUS, METHOD FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20190300498A1

  公开（公告）日：2019-10-03

  A compound including two or more partial structures shown by the following general formula (1-1) in the molecule, wherein each Ar independently represents an aromatic ring optionally having a substituent or an aromatic ring that contains at least one nitrogen atom optionally having a substituent, and two Ars are optionally bonded with each other to form a ring structure; the broken line represents a bond with an organic group; B represents an anionic leaving group that is capable of forming a reactive cation due to effect of either or both of heat and acid. This provides a compound that is capable of curing under the film forming conditions in air or an inert gas without forming byproducts, and forming an organic under layer film that has good dry etching durability during substrate processing not only excellent characteristics of gap filling and planarizing a pattern formed on a substrate.

  该化合物包括分子中由以下一般式（1-1）所示的两个或更多个部分结构，其中每个Ar独立地表示一个芳香环，可以具有取代基，或者是一个含有至少一个氮原子的芳香环，可以具有取代基，两个Ar可以选择地彼此连接以形成一个环结构；虚线代表与有机基团的键合；B代表一种能够由于热和酸的作用而形成反应性阳离子的阴离子离去基团。这提供了一种能够在空气或惰性气体中的成膜条件下固化而不形成副产物的化合物，并形成具有良好干法刻蚀耐久性的有机底层膜，在衬底加工过程中不仅具有填隙和平坦化在衬底上形成的图案的优异特性。
• [EN] SOLVENT-FREE PROCESS FOR THE PREPARATION OF DIKETOPYRROLOPYRROLE DERIVATIVES<br/>[FR] PROCEDE DE PREPARATION SANS SOLVANT DE DERIVES DICETOPYRROLOPYRROLIQUES
  申请人：MCA TECHNOLOGIES GMBH

  公开号：WO2004076456A1

  公开（公告）日：2004-09-10

  The present application relates to compounds of formula A(D)X(E)y, (I), compounds of formula (III), compounds of formula (X), as well as processes for the preparation thereof, processes where the compounds (I) are converted to pigments of formula (II) and the use of the compounds (I).

  本申请涉及到化合物的公式A(D)X(E)y（I），化合物的公式（III），化合物的公式（X），以及其制备方法，其中化合物（I）被转化为公式（II）的颜料的方法和化合物（I）的使用。
• HYDROPHOBIC POLYSACCHARIDES WITH DIESTER- OR CARBONATE ESTER-CONTAINING LINKAGES HAVING ENHANCED DEGRADATION
  申请人：Swan Dale G.

  公开号：US20100316687A1

  公开（公告）日：2010-12-16

  Hydrophobic α(1→4)glucopyranose polymers with enhanced degradation properties are described. Between the α(1→4)glucopyranose polymeric portion and the hydrophobic portion exists a linker portion having a chemistry that facilitates degradation of the polymer. Diester and carbonate ester linker chemistries are exemplified. Biodegradable matrices can be formed from these polymers, and the matrices can be used for the preparation of implantable and injectable medical devices wherein the matrix is capable of degrading in vivo at an increased rate. Matrices including and capable of releasing a bioactive agent in vivo are also described.

  描述了具有增强降解性能的疏水性α(1→4)葡萄糖吡喃聚合物。在α(1→4)葡萄糖吡喃聚合物部分和疏水部分之间存在一个连接部分，其化学性质有助于聚合物的降解。举例说明了二酯和碳酸酯连接剂的化学性质。可以从这些聚合物形成可生物降解的基质，这些基质可用于制备可植入和可注射的医疗器械，其中基质能够在体内以增加的速率降解。还描述了包含并能够在体内释放生物活性物质的基质。
• [EN] INDAZOLE COMPOUNDS<br/>[FR] COMPOSÉS INDAZOLE
  申请人：GLAXO GROUP LTD

  公开号：WO2012025474A1

  公开（公告）日：2012-03-01

  Indazole compounds, processes for their preparation, pharmaceutical compositions containing such compounds and their use in therapy.

  吲唑化合物，其制备方法，含有这种化合物的药物组合物，以及它们在治疗中的用途。