meta-iodoxybenzoic acid | 150394-39-1

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: meta-iodoxybenzoic acid
• 英文别名: 3-iodosylbenzoic acid；m-iodoxybenzoic acid；m-IBX；3-Iodooxybenzoic acid
• CAS: 150394-39-1
• 化学式: C₇H₅IO₃
• 分子量: 264.019
• InChiKey: DZXBUSLCPSINFS-UHFFFAOYSA-N

物化性质

• 沸点：
  347.2±44.0 °C(Predicted)
• 密度：
  2.058±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  2.9
• 重原子数：
  11
• 可旋转键数：
  1
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  46.5
• 氢给体数：
  1
• 氢受体数：
  3

反应信息

• 作为反应物：
  描述：

  meta-iodoxybenzoic acid 、 三氟乙酸 反应 1.0h， 以92%的产率得到3-[双(三氟乙酰氧基)碘]苯甲酸
  参考文献：
  名称：

  Development of new recyclable reagents and catalytic systems based on hypervalent iodine compounds

  摘要：

  Recent advances in the development of polymer-supported iodine(V) oxidants, recyclable monomeric hypervalent iodine(III) reagents and catalytic systems based on hypervalent iodine compounds are discussed. These efficient and environmentally friendly reagents and catalysts are particularly useful for oxidative transformations of alcohols to carbonyl compounds and for oxidations at the benzylic position.

  DOI：

  10.1016/j.mencom.2010.06.001
• 作为产物：
  描述：

  3-碘苯甲酸 在 过氧乙酸 作用下， 以 溶剂黄146 为溶剂， 反应 12.0h， 以80%的产率得到meta-iodoxybenzoic acid
  参考文献：
  名称：

  Development of new recyclable reagents and catalytic systems based on hypervalent iodine compounds

  摘要：

  Recent advances in the development of polymer-supported iodine(V) oxidants, recyclable monomeric hypervalent iodine(III) reagents and catalytic systems based on hypervalent iodine compounds are discussed. These efficient and environmentally friendly reagents and catalysts are particularly useful for oxidative transformations of alcohols to carbonyl compounds and for oxidations at the benzylic position.

  DOI：

  10.1016/j.mencom.2010.06.001
• 作为试剂：
  描述：

  3-Alpha-羟基-5-beta-24-胆烷酸甲酯 在 meta-iodoxybenzoic acid 、 二苯基二硒醚 作用下， 以 甲苯 为溶剂， 反应 3.0h， 以84%的产率得到choladiene-1,4 one-3 oate-24 de methyle
  参考文献：
  名称：

  Barton, Derek H. R.; Godfrey, Christopher R. A.; Morzycki, Jacek W., Journal of the Chemical Society. Perkin transactions I, 1982, # 8, p. 1947 - 1952

  摘要：

  DOI：

文献信息

• Composition and test strip for measuring peroxidatively active substances
  申请人：EIKEN KAGAKU KABUSHIKI KAISHA

  公开号：EP0553820A2

  公开（公告）日：1993-08-04

  A stable composition for use in the redox reaction-based measurement of peroxidatively active substances in a test sample (e.g., urine and blood), which can be produced easily, is stable for a prolonged period of time and does not cause false negatives due to the presence of a reducing substance in the test sample or false positives due to the addition of an oxidizing agent in the composition, as well as a test strip comprising a carrier incorporated with the composition. The composition includes a buffer material, a chromogen in an amount sufficient to react with the peroxidatively active substance in a test sample to develop color, a phosphonic acid analog of complexane as a stabilizing agent in an amount sufficient to stabilize the composition, and an oxidizing agent in an amount sufficient to oxidize reducing substances in a test sample.

  一种用于基于氧化还原反应测量测试样品（如尿液和血液）中过氧化活性物质的稳定组合物，该组合物易于生产，可长时间保持稳定，不会因测试样品中存在还原性物质而导致假阴性，也不会因组合物中添加氧化剂而导致假阳性。该组合物包括一种缓冲材料、一种发色剂（其用量足以与测试样品中的过氧化活性物质反应而显色）、一种络氨酸的膦酸类似物（其用量足以稳定该组合物）以及一种氧化剂（其用量足以氧化测试样品中的还原性物质）。
• Process for the oxidation of primary and secondary alcohols to aldehydes and ketones and for the oxidation of 1,2-diols to alpha-ketols and alpha-diketones
  申请人：Sigma-Tau Industrie Farmaceutiche Riunite S.p.A.

  公开号：EP0658533A1

  公开（公告）日：1995-06-21

  The invention provides a process for the selective oxidation of a primary or secondary alcohol to an aldehyde or ketone and for the oxidation of a 1,2-diol to an α-ketol or α-diketone which comprises contacting the alcohol or 1,2-diol with o-iodoxybenzoic acid.

  本发明提供了一种将伯醇或仲醇选择性氧化成醛或酮以及将 1,2-二醇氧化成 α-酮或 α-二酮的工艺，该工艺包括将醇或 1,2-二醇与邻碘氧基苯甲酸接触。
• Polishing Composition for Noble Metals
  申请人：Cabot Microelectronics Corporation

  公开号：EP2431434A1

  公开（公告）日：2012-03-21

  The invention provides a polishing composition and a method of chemically-mechanically polishing a substrate comprising a noble metal, the polishing composition comprising (a) an oxidizing agent that oxidizes a noble metal, (b) an anion selected from the group consisting of sulfate, borate, nitrate, and phosphate, and (c) a liquid carrier. The invention further provides a polishing composition and a method of chemically-mechanically polishing a substrate comprising ruthenium, the polishing composition comprising (a) an oxidizing agent that oxidizes ruthenium above the +4 oxidation state, (b) a polishing additive selected from the group consisting of metal sequestering polymers, metal chelators, organic thiols, compounds that reduce ruthenium tetraoxide, lactones, and α-hydroxycarbonyl compounds.

  本发明提供了一种抛光组合物和一种对包含贵金属的基底进行化学机械抛光的方法，该抛光组合物包含(a)一种氧化贵金属的氧化剂，(b)一种选自由硫酸盐、硼酸盐、硝酸盐和磷酸盐组成的组的阴离子，以及(c)一种液体载体。本发明进一步提供了一种抛光组合物和一种对包含钌的基底进行化学机械抛光的方法，该抛光组合物包含(a)一种氧化剂，该氧化剂可将钌氧化至+4氧化态以上；(b)一种抛光添加剂，该抛光添加剂选自由金属封存聚合物、金属螯合剂、有机硫醇、可还原四氧化钌的化合物、内酯和α-羟基羰基化合物组成的组。
• CMP of noble metals
  申请人：Cabot Microelectronics Corporation

  公开号：US20040266196A1

  公开（公告）日：2004-12-30

  The invention provides a method of polishing a substrate comprising (i) contacting a substrate comprising a noble metal layer with a chemical-mechanical polishing system comprising (a) a polishing component, (b) an oxidizing agent, and (c) a liquid carrier, and (ii) abrading at least a portion of the noble metal layer to polish the substrate. The polishing component is selected from the group consisting of an abrasive, a polishing pad, or a combination thereof, and the oxidizing agent is selected from the group consisting of bromates, bromites, hypobromites, chlorates, chlorites, hypochlorites, perchlorates, iodates, hypoiodites, periodates, peroxyacetic acid, organo-halo-oxy compounds, salts thereof, and combinations thereof. The chemical-mechanical polishing system has a pH of about 9 or less, and the oxidizing agent does not produce a substantial amount of elemental halogen. The invention also provides a method of polishing a substrate comprising a noble metal layer and a second layer using the aforementioned polishing system that further comprises a stopping compound.

  本发明提供了一种抛光基底的方法，包括(i)将包含贵金属层的基底与化学机械抛光系统接触，该系统包含(a)抛光组分、(b)氧化剂和(c)液体载体，以及(ii)研磨贵金属层的至少一部分以抛光基底。抛光组分选自由研磨剂、抛光垫或其组合组成的组，氧化剂选自由溴酸盐、溴酸盐、次溴酸盐、氯酸盐、亚氯酸盐、次氯酸盐、高氯酸盐、碘酸盐、次碘酸盐、过碘酸盐、过氧乙酸、有机卤氧化合物、其盐及其组合组成的组。化学机械抛光系统的 pH 值约为 9 或更低，氧化剂不会产生大量的卤素元素。本发明还提供了一种使用上述抛光系统对包括贵金属层和第二层的基底进行抛光的方法，该抛光系统还包括一种止动化合物。
• Polishing composition for noble metals
  申请人：De Rege Thesauro Francesco

  公开号：US20060024967A1

  公开（公告）日：2006-02-02

  The invention provides a polishing composition and a method of chemically-mechanically polishing a substrate comprising a noble metal, the polishing composition comprising (a) an oxidizing agent that oxidizes a noble metal, (b) an anion selected from the group consisting of sulfate, borate, nitrate, and phosphate, and (c) a liquid carrier. The invention further provides a polishing composition and a method of chemically-mechanically polishing a substrate comprising ruthenium, the polishing composition comprising (a) an oxidizing agent that oxidizes ruthenium above the +4 oxidation state, (b) a polishing additive selected from the group consisting of metal sequestering polymers, metal chelators, organic thiols, compounds that reduce ruthenium tetraoxide, lactones, and α-hydroxycarbonyl compounds.

  本发明提供了一种抛光组合物和一种对包含贵金属的基底进行化学机械抛光的方法，该抛光组合物包含(a)一种氧化贵金属的氧化剂，(b)一种选自由硫酸盐、硼酸盐、硝酸盐和磷酸盐组成的组的阴离子，以及(c)一种液体载体。本发明进一步提供了一种抛光组合物和一种对包含钌的基底进行化学机械抛光的方法，该抛光组合物包含(a)一种氧化剂，该氧化剂可将钌氧化至+4氧化态以上；(b)一种抛光添加剂，该抛光添加剂选自由金属封存聚合物、金属螯合剂、有机硫醇、可还原四氧化钌的化合物、内酯和α-羟基羰基化合物组成的组。