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Methacrylsaeure-(β,β'-dichlor-isopropylester) | 44978-88-3

中文名称
——
中文别名
——
英文名称
Methacrylsaeure-(β,β'-dichlor-isopropylester)
英文别名
1,3-dichloro-2-propyl (meth)acrylate;1,3-Dichloropropan-2-yl 2-methylprop-2-enoate
Methacrylsaeure-(β,β'-dichlor-isopropylester)化学式
CAS
44978-88-3
化学式
C7H10Cl2O2
mdl
——
分子量
197.061
InChiKey
WNVYIRNVNNETNB-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

物化性质

  • 沸点:
    88 °C(Press: 8 Torr)
  • 密度:
    1.3112 g/cm3

计算性质

  • 辛醇/水分配系数(LogP):
    2.7
  • 重原子数:
    11
  • 可旋转键数:
    5
  • 环数:
    0.0
  • sp3杂化的碳原子比例:
    0.57
  • 拓扑面积:
    26.3
  • 氢给体数:
    0
  • 氢受体数:
    2

反应信息

  • 作为产物:
    描述:
    甲基丙烯酸甲酯1,3-二氯丙醇 以82%的产率得到
    参考文献:
    名称:
    KORSHUNOV, M. A.;KUZOVLEVA, R. G.;KARTASHOVA, N. N., OSNOV. ORGAN. SINTEZ I NEFTEXIMIYA, YAROSLAVL, 1981, N 15, 36-40
    摘要:
    DOI:
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文献信息

  • Process for synthesis of polymer compositions, polymer compositions obtainable by the process, and use of the same
    申请人:RohMax Additives GmbH
    公开号:US20030060587A1
    公开(公告)日:2003-03-27
    The present invention relates to a process for synthesis of polymer compositions with reduced catalyst content, wherein ethylenically unsaturated monomers containing less than 0.5 wt % of ethylenically unsaturated monomers with at least one carboxylic group, sulfonic acid group and/or at least one phosphonic acid group relative to the total weight of the ethylenically unsaturated monomers are polymerized by means of initiators containing a transferable group of atoms and of one or more catalysts comprising at least one transition metal in the presence of ligands which can form a coordination compound with the metal catalyst or catalysts and, after the polymerization, the catalyst contained in the polymer is at least partly separated. For this purpose, the polymer composition is filtered, after the polymerization, in the presence of at least one filter aid which contains at least 0.5 wt%, relative to the total weight of the filter aid, of repeating units that contain at least one carboxylic acid group, sulfonic acid group and/or at least one phosphonic acid group.
    本发明涉及一种合成聚合物组合物的过程,其具有降低催化剂含量的效果。在该过程中,含有少于0.5重量%的至少含有一个羧基,磺酸基和/或至少一个膦酸基的乙烯基不饱和单体相对于乙烯基不饱和单体的总重量进行聚合,通过含有可转移原子团的引发剂和至少一种过渡金属的催化剂,在与可以形成与金属催化剂或催化剂配合物的配体一起的情况下进行聚合,在聚合之后,聚合物中的催化剂至少部分被分离。为此,在聚合之后,通过至少一种过滤助剂过滤聚合物组合物,该过滤助剂相对于总重量含有至少0.5重量%的重复单元,其中包含至少一个羧酸基,磺酸基和/或至少一个膦酸基。
  • COMPOSITION HAVING REFRACTIVE INDEX SENSITIVELY CHANGEABLE BY RADIATION AND METHOD FOR FORMING REFRACTIVE INDEX PATTERN
    申请人:JSR Corporation
    公开号:EP1235104A1
    公开(公告)日:2002-08-28
    A radiation sensitive refractive index changing composition comprising (A) a decomposable compound, (B) a non-decomposable compound having a lower refractive index than the decomposable compound (A), (C) a radiation sensitive decomposer and (D) a stabilizer. By exposing the composition to radiation through a pattern mask, the above components (C) and (A) of an exposed portion are decomposed and a refractive index difference is made between the exposed portion and unexposed portion, thereby forming a pattern having different refractive indices.
    一种对辐射敏感的折射率变化组合物,包括:(A)可分解化合物;(B)折射率低于可分解化合物(A)的不可分解化合物;(C)对辐射敏感的分解剂;以及(D)稳定剂。通过图案掩膜将组合物暴露在辐射下,暴露部分的上述成分(C)和(A)被分解,暴露部分和未暴露部分之间产生折射率差,从而形成具有不同折射率的图案。
  • Radiation sensitive refractive index changing composition and refractive index changing method
    申请人:JSR Corporation
    公开号:EP1323742A2
    公开(公告)日:2003-07-02
    A radiation sensitive refractive index changing composition whose refractive index of a material is changed by a simple method, whose changed refractive index difference is sufficiently large, and which can provide a stable refractive index pattern and a stable optical material regardless of their use conditions. The radiation sensitive refractive index changing composition comprises (A) a polymerizable compound, (B) a non-polymerizable compound having a lower refractive index than the polymer of the polymerizable compound (A), and (C) a radiation sensitive polymerization initiator.
    一种辐射敏感折射率改变组合物,其材料的折射率可通过简单的方法改变,改变后的折射率差足够大,并且无论使用条件如何,都能提供稳定的折射率图案和稳定的光学材料。 辐射敏感折射率变化组合物包括:(A) 可聚合化合物;(B) 折射率低于可聚合化合物 (A) 聚合物的不可聚合化合物;(C) 辐射敏感聚合引发剂。
  • RADIATION-SENSITIVE COMPOSITION CHANGING IN REFRACTIVE INDEX AND METHOD OF CHANGING REFRACTIVE INDEX
    申请人:JSR Corporation
    公开号:EP1350814A1
    公开(公告)日:2003-10-08
    A radiation sensitive refractive index changing composition comprising (A) a decomposable compound, (B) a non-decomposable compound having a higher refractive index than the decomposable compound (A), (C) a radiation sensitive decomposer and (D) astabilizer. By exposing this composition to radiation through a pattern mask, the above components (C) and (A) of an exposed portion decompose to create a refractive index difference between the exposed portion and an unexposed portion, thereby forming a pattern having different refractive indices.
    一种对辐射敏感的折射率变化组合物,包括:(A) 可分解化合物;(B) 折射率高于可分解化合物(A)的不可分解化合物;(C) 对辐射敏感的分解剂;(D) 稳定剂。通过图案掩膜将这种组合物暴露在辐射下,暴露部分的上述成分(C)和(A)分解,在暴露部分和未暴露部分之间产生折射率差,从而形成具有不同折射率的图案。
  • RADIATION-SENSITIVE COMPOSITION CAPABLE OF HAVING REFRACTIVE INDEX DISTRIBUTION
    申请人:JSR Corporation
    公开号:EP1369459A1
    公开(公告)日:2003-12-10
    A method of forming a refractive index pattern or an optical material stable regardless of use conditions, which provides a sufficiently large change in refractive index by a simple method. The refractive index pattern or optical material is formed by exposing a refractive index changing composition which comprises (A) a decomposable compound, (B) a non-decomposable compound containing inorganic oxide particles and (C) a radiation sensitive decomposer to radiation and then treating it with (D) a stabilizer.
    一种形成折射率图案或光学材料的方法,无论使用条件如何,它都能保持稳定,并能通过简单的方法提供足够大的折射率变化。 折射率图案或光学材料的形成方法是:将由 (A) 可分解化合物、(B) 含无机氧化物颗粒的不可分解化合物和 (C) 辐射敏感分解物组成的折射率变化组合物暴露于辐射中,然后用 (D) 稳定剂处理。
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