ANTIFUNGAL PROTEINS, DNA CODING THEREFORE, AND HOSTS INCORPORATING SAME
申请人:MOGEN INTERNATIONAL N.V.
公开号:EP0939798A2
公开(公告)日:1999-09-08
FATTY ACID NIACIN CONJUGATES AND THEIR USES
申请人:Catabasis Pharmaceuticals, Inc.
公开号:EP2473045A1
公开(公告)日:2012-07-11
USE OF FATTY ACID NIACIN CONJUGATES FOR TREATING DISEASES
申请人:Catabasis Pharmaceuticals, Inc.
公开号:EP2941252A2
公开(公告)日:2015-11-11
COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR EUV LITHOGRAPHY
申请人:Sakamoto Rikimaru
公开号:US20120040291A1
公开(公告)日:2012-02-16
There is provided a compositions of resist underlayer films for EUV lithography that is used in a production process of devices employing EUV lithography, that reduces adverse effects caused by EUV, and that has a beneficial effect on the formation of a favorable resist pattern; and a method for forming resist patterns using the composition of resist underlayer films for EUV lithography. A composition for forming a resist underlayer film for an EUV lithography process used in production of a semiconductor device, comprising a novolac resin containing a halogen atom. The novolac resin may include a cross-linkable group composed of an epoxy group, a hydroxy group, or a combination thereof. The halogen atom may be a bromine atom or an iodine atom. The novolac resin may be a reaction product of a novolac resin or an epoxidized novolac resin and a halogenated benzoic acid; or a reaction product of a glycidyloxy novolac resin and diiodosalicylic acid.