Mapping the ATP-binding domain of DNA-dependent protein kinase (DNA-PK) with coumarin- and isocoumarin-derived inhibitors
摘要:
Replacement of the core heterocycle of a defined series of chromen-4-one DNA-PK inhibitors by the isomeric chromen-2-one (coumarin) and isochromen-1-one (isocoumarin) scaffolds was investigated. Structure-activity relationships for DNA-PK inhibition were broadly consistent, albeit with a reduction of potency compared with the parent chromenone. (C) 2010 Elsevier Ltd. All rights reserved.
Mapping the ATP-binding domain of DNA-dependent protein kinase (DNA-PK) with coumarin- and isocoumarin-derived inhibitors
摘要:
Replacement of the core heterocycle of a defined series of chromen-4-one DNA-PK inhibitors by the isomeric chromen-2-one (coumarin) and isochromen-1-one (isocoumarin) scaffolds was investigated. Structure-activity relationships for DNA-PK inhibition were broadly consistent, albeit with a reduction of potency compared with the parent chromenone. (C) 2010 Elsevier Ltd. All rights reserved.
Abstract A novel and convenient protocol for the synthesis of sulfonate derivatives via DABCO-catalyzed direct sulfonylation of 1-sulfonyl-1,2,3-triazoles to different enols has been established. This synthetic route could effectively avoid the use of transition metal catalysts and extra oxidants, and the target products could be obtained in good to excellent yields (75-86%) with wide substrate scope
Near Infrared Ray Activation Type Positive Resin Composition
申请人:Imai Genji
公开号:US20070259279A1
公开(公告)日:2007-11-08
A near infrared ray activation type positive resist composition comprising (A) a vinyl-based polymer having a monomer unit having an alkali-soluble group blocked by an ether having an alkenyl group next to an ether oxygen, (B) a photothermal converting substance generating heat by a light in the near infrared region, (C) a thermal acid generator generating an acid by heat, can provide a near infrared ray activation type positive resist composition which can be subjected to an exposure treatment in a complete bright room such as under a white light and the like, gives desired sensitivity and resolution, and of which baking treatment conditions can be relaxed or a baking treatment can be omitted, and a pattern formation method using the same.
Positive resist composition for recording medium master, and method of producing recording medium master and method of producing stamper using the same
申请人:Imai Genji
公开号:US20090045552A1
公开(公告)日:2009-02-19
Provided are a positive resist composition for recording medium master showing excellent plating resistance and adhesion to a base plate such as glass or the like characterized by containing a vinyl polymer which has a monomer unit having an alkali-soluble group blocked by an alkyl vinyl ether, and a method of producing a recording medium master or stamper using this positive resist composition.