acetic acid-(1-ethyl-but-1-enyl ester) | 135359-09-0

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: acetic acid-(1-ethyl-but-1-enyl ester)
• 英文别名: Essigsaeure-(1-aethyl-but-1-enylester)；[(E)-hex-3-en-3-yl] acetate
• CAS: 135359-09-0
• 化学式: C₈H₁₄O₂
• 分子量: 142.198
• InChiKey: KGRLQFUSOSMNGA-SOFGYWHQSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.1
• 重原子数：
  10
• 可旋转键数：
  4
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.62
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为产物：
  描述：

  3-己炔 、 溶剂黄146 在 三氟化硼 、 mercury(II) diacetate 作用下， 生成 acetic acid-(1-ethyl-but-1-enyl ester)
  参考文献：
  名称：

  The Mercury-catalyzed Addition of Acetic Acid to 3-Hexyne¹

  摘要：

  DOI：

  10.1021/ja01609a042

文献信息

• A new simple synthesis of isomerically pure α,β-unsaturated nitriles via hydroboration of alkynes
  作者：Yuzuru Masuda、Masayuki Hoshi、Akira Arase

  DOI：10.1039/c39910000748

  日期：——

  Terminal alkynes are converted into (E)-1-cyanoalk-1-enes in good yields via hydroboration followed by reaction with copper(I) cyanide and copper(II) acetate in the presence of a small amount of water, in hexamethylphosphoric triamide.

  末端炔烃通过硼氢化反应以高收率转化为（E）-1-氰基烷基-1-烯，然后在少量水存在下于六甲基磷酸三酰胺中与氰化铜（I）和乙酸铜（II）反应。
• Bottom antireflective coatings
  申请人：Yao Huirong

  公开号：US20050112494A1

  公开（公告）日：2005-05-26

  The present invention relates to bottom antireflective coating compositions and polymers useful in making such compositions.

  本发明涉及用于制备底部抗反射涂层组合物和聚合物的相关技术。
• Perfume Compositions
  申请人：Givaudan Nederland Services B.V.

  公开号：US20130039877A1

  公开（公告）日：2013-02-14

  Perfume compositions comprise between 10% and 30% in total weight of perfume ingredients selected from two groups, Group A, Group B, with the provisos that over 5% but less than 15% of the perfume composition must comprise Group A ingredients, and for compositions comprising less than 10% of Group A ingredients in the aggregate percentage of Group B ingredients present must be at least equal to the expression (2*/10-A %) where A % is the total percentage of Group A ingredients in the composition.

  香水组成物包括总重量在10%至30%之间的香料成分，这些香料成分从两个组中选择，即A组和B组。但是，香水组成物中超过5%但少于15%必须由A组成分组成，对于组成中A组成分少于10%的香水，B组成分的总百分比必须至少等于表达式（2 * / 10-A％），其中A％是组成中A组成分的总百分比。
• Negative-working resist composition
  申请人：FUJI PHOTO FILM CO., LTD.

  公开号：EP1117002A1

  公开（公告）日：2001-07-18

  A chemical amplification system negative-working resist composition for an electron beam and/or an X-ray, which is excellent in sensitivity and resolution and has a rectangular profile, comprising an alkali-soluble resin having structural units represented by the following general formula (a), a compound generating an acid by irradiation of the electron beam or the X-ray, and a crosslinking agent which initiates crosslinking by the acid:

  一种用于电子束和/或 X 射线的化学放大系统负工作抗蚀剂组合物，具有优异的灵敏度和分辨率，并具有矩形轮廓，由具有下式（a）所代表结构单元的碱溶性树脂、通过电子束或 X 射线辐照产生酸的化合物以及通过酸引发交联的交联剂组成：
• Positive resist composition
  申请人：FUJI PHOTO FILM CO., LTD.

  公开号：EP1296190A1

  公开（公告）日：2003-03-26

  A positive resist composition comprising the components of: (A) a compound capable of generating an acid upon irradiation with one of an actinic ray and a radiation; (B) a resin that is insoluble or slightly soluble in alkalis, but becomes alkali-soluble under an action of an acid; (C) a basic compound; and (D) a compound comprising at least three hydroxyl groups or at least three substituted hydroxyl groups, and comprising at least one cyclic structure.

  一种正抗蚀剂组合物，其成分包括(A) 在光射线和辐射线中的一种照射下能产生酸的化合物；(B) 不溶于或微溶于碱，但在酸的作用下可溶于碱的树脂；(C) 碱性化合物；以及 (D) 由至少三个羟基或至少三个取代羟基组成，并包含至少一个环状结构的化合物。