4'-methyl-4-mercapto benzophenone | 1421320-22-0

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 4'-methyl-4-mercapto benzophenone
• 英文别名: 4'-methyl-4-mercaptobenzophenone；(4-Methylphenyl)-(4-sulfanylphenyl)methanone
• CAS: 1421320-22-0
• 化学式: C₁₄H₁₂OS
• 分子量: 228.315
• InChiKey: PWFHAUHIYFZZFH-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.8
• 重原子数：
  16
• 可旋转键数：
  2
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.07
• 拓扑面积：
  18.1
• 氢给体数：
  1
• 氢受体数：
  2

反应信息

• 作为产物：
  描述：

  4-氯-4-甲基苯甲酮 在 sodiumsulfide nonahydrate 作用下， 以 N,N-二甲基甲酰胺 为溶剂， 反应 8.0h， 以40%的产率得到4'-methyl-4-mercapto benzophenone
  参考文献：
  名称：

  Mercapto Benzophenone Compounds, Compositions and Preparation Method Thereof

  摘要：

  本发明提供了一种使用巯基苯酮化合物作为关键原料制备的光固化组合物。本发明旨在解决先前光固化技术中存在的问题，即低分子光引发剂容易残留和迁移，而大分子光引发剂由于有效成分含量低而具有低起始效率，并且存在一定的迁移问题。本发明中的光固化组合物可以轻松制备，并且与乙烯基不饱和化合物具有高添加效率，通过添加得到的光固化组合物在用于光固化涂料、粘结剂和油墨配方时没有残留的巯基，具有高起始活性和零迁移率的特点。

  公开号：

  US20130150479A1

文献信息

• PHOTOACID GENERATOR, AND RESIN COMPOSITION FOR PHOTOLITHOGRAPHY
  申请人：SAN-APRO LTD.

  公开号：US20160368879A1

  公开（公告）日：2016-12-22

  Provided is a non-ionic photoacid generator (A) expressed by general formula (1). R1 and R2 each independently represents an alkyl group having 1-18 carbons or a fluoroalkyl group having 1-18 carbons, an alkenyl group having 2-18 carbons, an alkynyl group having 2-18 carbons, an aryl group having 6-18 carbons, a silyl group, or the like; m and n respectively represent the number of R1s and R2s, each number being an integer from 0 to 3, and the total number (m+n) of R1s and R2s being an integer from 1 to 6. The m number of R1s and the n number of R2s may each be the same or different. R3 represents a hydrocarbon having 1-18 carbons wherein one part or all of the hydrogen may be substituted by fluorine.

  提供的非离子光酸发生剂（A）由通式（1）表示。R1和R2分别独立表示具有1-18个碳原子的烷基基团或具有1-18个碳原子的氟烷基基团，具有2-18个碳原子的烯基基团，具有2-18个碳原子的炔基基团，具有6-18个碳原子的芳基基团，硅基团等；m和n分别表示R1和R2的数量，每个数字为0到3的整数，R1和R2的总数（m+n）为1到6的整数。R1的数量m和R2的数量n可以相同也可以不同。R3表示具有1-18个碳原子的碳氢化合物，其中氢的一部分或全部可以被氟取代。
• SULFONIUM SALT, HEAT- OR PHOTO-ACID GENERATOR, HEAT- OR PHOTO-CURABLE COMPOSITION, AND CURED PRODUCT THEREOF
  申请人：SAN APRO LTD.

  公开号：US20190284134A1

  公开（公告）日：2019-09-19

  The sulfonium salt does not contain a toxic metal and exhibits higher cationic polymerization performance and crosslinking performance than a tetrakis(pentafluorophenyl)borate salt. The heat- or photo-acid generator contains the sulfonium salt. The sulfonium salt is formed of a sulfonium cation selected from a group represented by general formulas (1), (9), (10) and (11) described below and a gallate anion represented by formula (a). The heat- or photo-acid generator contains the sulfonium salt. The heat- or energy ray-curable composition contains the acid generator and a cationically polymerizable compound. A cured product can be obtained by curing the same.

  硫铵盐不含有毒金属，表现出比四(五氟苯基)硼酸盐更高的阳离子聚合性能和交联性能。热或光酸发生剂含有硫铵盐。硫铵盐由下面描述的通用公式(1)、(9)、(10)和(11)所代表的一组硫铵阳离子和由公式(a)代表的镓酸根阴离子形成。热或光酸发生剂含有硫铵盐。热或能量射线固化组合物含有酸发生剂和阳离子聚合性化合物。通过固化可以获得固化产品。
• SULFONIUM SALT, PHOTOACID GENERATOR, PHOTOCURABLE COMPOSITION, AND CURED PRODUCT THEREOF
  申请人：SAN-APRO LTD.

  公开号：US20190300476A1

  公开（公告）日：2019-10-03

  A sulfonium salt is formed of a sulfonium cation selected from a group indicated by general formulas (1), (2), and (3) and a gallate anion represented by formula (a). A photoacid generator is characterized in that said sulfonium salt is contained therein. An energy-ray curable composition contains the acid generator and a cationic polymerizable compound. A cured product is formed by curing these substances.

  一种磺胺盐由通式（1）、（2）和（3）所示的一组磺胺阳离子以及由式（a）表示的没食子酸根阴离子组成。一种光酸发生剂的特征在于其中含有该磺胺盐。一种能量射线固化组合物包含该酸发生剂和一个阳离子可聚合化合物。通过固化这些物质形成一个固化产物。
• SULFONATE COMPOUND, PHOTOACID GENERATOR, AND RESIN COMPOSITION FOR PHOTOLITHOGRAPHY
  申请人：SAN-APRO LIMITED

  公开号：US20170233336A1

  公开（公告）日：2017-08-17

  Provided are: a non-ionic photoacid generator containing a sulfonate compound having a high photosensitivity to i lines, exhibiting excellent heat-resistance stability, and exhibiting excellent solubility in a hydrophobic material; and a resin composition for photolithography containing the same. The present invention is a sulfonate compound characterized by being represented by general formula (1). [In formula (1), R1 represents an aryl group having 6 to 18 carbon atoms or a heterocyclic hydrocarbon group having 4 to 20 carbon atoms. R2 represents a hydrogen atom, an alkyl group having 1 to 18 carbon atoms, an alkenyl group having 2 to 18 carbon atoms, an alkynyl group having 2 to 18 carbon atoms, or an aryl group having 6 to 18 carbon atoms. R3 represents a hydrocarbon group having 1 to 18 carbon atoms (in which some or all hydrogen atoms may be substituted with fluorine).]

  提供的是：一种非离子光酸发生剂，含有对i线具有高光敏度的磺酸化合物，表现出优异的耐热稳定性，并在疏水材料中表现出优异的溶解性；以及含有该化合物的光刻树脂组合物。本发明是一种磺酸化合物，其特征在于由通式（1）表示。[在式（1）中，R1表示具有6至18个碳原子的芳基基团或具有4至20个碳原子的杂环烃基团。R2表示氢原子，具有1至18个碳原子的烷基基团，具有2至18个碳原子的烯基基团，具有2至18个碳原子的炔基基团或具有6至18个碳原子的芳基基团。R3表示具有1至18个碳原子的烃基团（其中一些或全部氢原子可以被氟代替）。]
• SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOSENSITIVE COMPOSITION
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US20170305848A1

  公开（公告）日：2017-10-26

  A novel sulfonium salt having high sensitivity with respect to active energy rays, a photoacid generator including the sulfonium salt, and a photosensitive composition containing the photoacid generator. The sulfonium salt is represented by formula (a1). In the formula, R 1 and R 2 each independently represent the group that is represented by formula (a2) or an alkyl group that may be substituted by a halogen atom, R 1 and R 2 are bonded to each other and may form a ring with the sulfur atom within the formula, R 3 is the group represented by formula (a3) or the group represented by formula (a4), A 1 represents S or the like, X − represents a monovalent anion, and R 1 and R 2 are not both an alkyl group which may be substituted with a halogen atom. In formulas (a2) to (a4), the ring Z 1 represents an aromatic hydrocarbon ring, R 4 , R 6 , R 9 , and R 10 each represents a specific monovalent group, R 5 , R 7 , and R 8 each represents a specific divalent group, A 2 and A 3 each represents S or the like, m1 represents an integer of 0 or more, and n1 and n2 each represent 0 or more.

  一种对活性能量射线具有高敏感度的新型磺鎓盐，包括该磺鎓盐的光酸发生剂以及含有该光酸发生剂的光敏组合物。该磺鎓盐由公式（a1）表示。在该公式中，R1和R2分别表示由公式（a2）表示的基团或可能被卤素原子取代的烷基基团，R1和R2彼此相连并且可以与公式中的硫原子形成环，R3表示由公式（a3）表示的基团或由公式（a4）表示的基团，A1表示S或类似物，X-表示一价阴离子，且R1和R2不同时为可能被卤素原子取代的烷基基团。在公式（a2）到（a4）中，环Z1表示芳香族碳氢环，R4、R6、R9和R10各自表示特定的一价基团，R5、R7和R8各自表示特定的二价基团，A2和A3各自表示S或类似物，m1表示0或更多的整数，n1和n2各自表示0或更多。