申请人:Shin-Etsu Chemical Co., Ltd.
公开号:US07132215B2
公开(公告)日:2006-11-07
Novel ester compounds having formula (1) wherein A1 is a polymerizable functional group having a double bond, A2 is furandiyl, tetrahydrofurandiyl or oxanorbornanediyl, R1 and R2 each are a monovalent hydrocarbon group, or R1 and R2 may bond together to form an aliphatic hydrocarbon ring with the carbon atom, and R3 is hydrogen or a monovalent hydrocarbon group which may contain a hetero atom are polymerizable into polymers. Resist compositions comprising the polymers are sensitive to high-energy radiation, have an improved sensitivity, resolution, and etching resistance, and lend themselves to micropatterning with electron beams or deep-UV rays.
具有式(1)的新型酯化合物,其中A1是具有双键的可聚合官能团,A2是呋喃基,四氢呋喃基或氧杂莽环基,R1和R2各自是一价的碳氢基团,或者R1和R2可以结合形成带有碳原子的脂肪族碳氢环,R3是氢或者可能含有杂原子的一价碳氢基团,可以聚合成聚合物。含有这些聚合物的抗蚀剂组合物对高能辐射敏感,具有更好的敏感度、分辨率和蚀刻抵抗性,并适用于电子束或深紫外线微细图案化。