(kET) showed any significant differences among 1–3, albeit that the surface morphologies of the modified HOPG substrates showed domain structures that were characteristic for each Ru complex. In the case of 3, the average height changed from ∼2 to ∼4 nm upon increasing the concentration of the solution of 3 that was used for the surface modification. In contrast, the height for 1 and 2 remained constant
我们合成了三种类型的双核钌络合物(1 - 3),它们包含芘锚的吸附1 - 3到纳米碳材料通过非共价π-π相互作用,为了研究其吸附和它们的解吸从高度有序的热解石墨( HOPG)。从Langmuir等温线获得HOPG上1(6.22pmol / cm 2),2(2.83pmol / cm 2)和3(3.53pmol / cm 2)的吸附饱和度。HOPG电极的解吸速率按3(2.4×10 –5 s –1)的顺序降低>2(1.4×10 –5 s –1)≫ 1(1.8×10 –6 s –1)。这些结果表明,such配合物的数量及其在这类配合物中的取代位置强烈影响解吸行为。然而,无论吸附的自由能(Δ ģ广告),也不异构电子转移速率(ķ ET)显示中的任何显著差异1 - 3,尽管该改性HOPG衬底的表面形貌显示,是特性为畴结构每个汝情结。在3的情况下,随着用于表面改性的3溶液浓度的增加,平均高度从〜2变为〜4
Tuning of Metal–Metal Interactions in Mixed-Valence States of Cyclometalated Dinuclear Ruthenium and Osmium Complexes Bearing Tetrapyridylpyrazine or -benzene
Os) or ligand reduction waves. In addition, an M(III/IV) couple was observed in cyclometalated [M2(bis(benzimidazolyl)benzene)2(BL)] complexes (M = Ru, Os). Effects of the cyclometalated bonds on the redox behaviors and the accessibility to the mixed-valence M(II)–M(III) dinuclear complexes are discussed. Introduction of a cyclometalated bond induced a large negative potential shift in the redox potentials
In the ITO||(Ru‐NP)m|(Ru‐CP)n multilayer heterofilms, the direct electron transfer (ET) from the outer Ru‐CP layers to the ITO were observed to be blocked for m>2, and charge trapping in the outer Ru‐CP layers became evident from the appearance of an intervalence charge transfer (IVCT) band at 1140 nm from the formation of the mixed‐valent state of Ru‐CP units, resulting from the reductive ET mediation
METAL COMPLEX, AND ABSORBENT, OCCLUSION MATERIAL AND SEPARATION MATERIAL PRODUCED THEREFROM
申请人:Kuraray Co., Ltd.
公开号:EP2868649A1
公开(公告)日:2015-05-06
The metal complex comprises a multivalent carboxylic acid compound, at least one metal ion selected from ions of metals belonging to Groups 2 to 13 of the periodic table, an organic ligand capable of multidentate binding to the metal ion, and a C1 or C2 monocarboxylic acid compound. The metal complex has excellent gas adsorption, storage, and separation performance as well as excellent durability. The metal complex is stably present under high temperature and high humidity, and can maintain high adsorption performance.
Disclosed is a method for producing a metal complex comprising a multivalent carboxylic acid compound, at least one metal ion, an organic ligand capable of multidentate binding to the metal ion, and a monocarboxylic acid compound, wherein the metal ion is used in the form of a metal salt having a counter anion of the metal ion, a conjugate acid of the counter anion having a first dissociation exponent larger by 0 to 6 than that of the multivalent carboxylic acid compound, and at least one of the multivalent carboxylic acid compound, the metal ion, the organic ligand capable of multidentate binding, and the monocarboxylic acid compound is reacted in a suspended state. This method can effectively produce a metal complex.