1-azidoanthracene-9,10-dione | 42013-62-7

• 分子结构分类: 有机化合物 - 苯类化合物 - 蒽
• 英文名称: 1-azidoanthracene-9,10-dione
• 英文别名: 1-azidoanthraquinone；1-azido-anthraquinone；1-Azido-anthrachinon；1-Azidoanthraquinon；Azidoanthraquinone
• CAS: 42013-62-7
• 化学式: C₁₄H₇N₃O₂
• 分子量: 249.228
• InChiKey: UNYPOFWEGVYMRJ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.3
• 重原子数：
  19
• 可旋转键数：
  1
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  48.5
• 氢给体数：
  0
• 氢受体数：
  4

反应信息

• 作为反应物：
  描述：

  1-azidoanthracene-9,10-dione 以 甲苯 为溶剂， 反应 8.0h， 生成 1-S-methyl-1-S-phenyl-N-(anthraquinon-1-yl)sulfoximide
  参考文献：
  名称：

  Sutter, P.; Weis, C. D., Journal of Heterocyclic Chemistry, 1982, vol. 19, p. 997 - 1011

  摘要：

  DOI：
• 作为产物：
  描述：

  9,10-二氢-9,10-二氧代蒽重氮硫酸氢盐 在 sodium azide 、 水 作用下， 生成 1-azidoanthracene-9,10-dione
  参考文献：
  名称：

  Schaarschmidt, Chemische Berichte, 1916, vol. 49, p. 1636

  摘要：

  DOI：

文献信息

• CHEMOSELECTIVE REDUCTION OF AZIDES WITH SODIUM SULFIDE HYDRATE UNDER SOLVENT FREE CONDITIONS
  作者：Foad Kazemi、Ali Reza Kiasat、Sohyl Sayyahi

  DOI：10.1080/10426500490466544

  日期：2004.9

  Sodium sulfide hydrate has been employed for an efficient reduction of a variety of azides to the primary amines in good-to-excellent yields under solvent-free system and without perturbing many active functionalities such as ether, carbonyl, sulfonyl, and nitro.

  硫化钠水合物已被用于在无溶剂系统下以良好到优异的产率将各种叠氮化物有效还原为伯胺，并且不会干扰许多活性官能团，例如醚、羰基、磺酰基和硝基。
• [EN] uPAR-uPA INTERACTION INHIBITORS AND METHODS FOR TREATING CANCER<br/>[FR] INHIBITEURS D'INTERACTION UPAR-UPA ET PROCÉDÉS POUR TRAITER LE CANCER
  申请人：UNIV INDIANA RES & TECH CORP

  公开号：WO2012119079A1

  公开（公告）日：2012-09-07

  The invention described herein pertains to compounds, compositions and formulations comprising the compounds, and methods for use of the compounds, compositions and/or formulations in the treatment of diseases responsive to the inhibition of uPAR-uPA interactions, such as cancer.

  本发明涉及化合物、组合物和制剂，其中包括这些化合物，以及使用这些化合物、组合物和/或制剂治疗对uPAR-uPA相互作用抑制有反应的疾病（如癌症）的方法。
• uPAR-uPA INTERACTION INHIBITORS AND METHODS FOR TREATING CANCER
  申请人：Meroueh Samy

  公开号：US20130338144A1

  公开（公告）日：2013-12-19

  The invention described herein pertains to compounds, compositions and formulations comprising the compounds, and methods for use of the compounds, compositions and/or formulations in the treatment of diseases responsive to the inhibition of uPAR-uPA interactions, such as cancer.

  本发明涉及化合物、组合物和配方，其中包括这些化合物的组合物和配方，以及使用这些化合物、组合物和/或配方治疗对uPAR-uPA相互作用抑制有反应的疾病（如癌症）的方法。
• Process for production of vinyl chloride polymer
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：EP0172427A2

  公开（公告）日：1986-02-26

  This process is a process for production of a vinyl chloride polymer by suspension polymerization or emulsion polymerization of vinyl chloride monomer or a mixture of vinyl chloride monomer with a vinyl monomer copolymerizable with said vinyl chloride monomer in an aqueous medium, characterized in that the polymerization is carried out in a polymerizer, the inner wall surface and portions of the auxiliary equipment thereof which may come into contact with the monomer during polymerization being previously coated with a scaling preventive comprising at least one selected from dyes, pigments and aromatic or heterocyclic compounds having at least 5 conjugated π bonds, while controlling the chloride ion concentration in the reaction mixture to not higher than 100 ppm. According to said process, scaling onto the inner wall surface of a polymerizer, etc. during polymerization can be prevented effectively and surely.

  该工艺是通过氯乙烯单体或氯乙烯单体与可与所述氯乙烯单体共聚的乙烯基单体混合物在水介质中进行悬浮聚合或乳液聚合来生产氯乙烯聚合物的工艺，其特征在于聚合是在聚合器中进行的、内壁表面及其辅助设备中可能在聚合过程中与单体接触的部分事先涂上一层防垢剂，该防垢剂至少包括一种选自染料、颜料和至少有 5 个共轭 π 键的芳香族或杂环化合物的防垢剂，同时控制反应混合物中的氯离子浓度不高于 100 ppm。根据上述工艺，可有效、可靠地防止聚合过程中聚合器等内壁表面结垢。
• Radiation sensitive polymer composition
  申请人：TORAY INDUSTRIES, INC.

  公开号：EP0418870A2

  公开（公告）日：1991-03-27

  A radiation-sensitive composition is described, which is comprised of (a) a polymer containing repeating units [1] represented by the general formula wherin R₁ is a trivalent or tetravalent organic residue having at least two carbon atoms, R₂ is a divalent organic residue having at least two carbon atoms, R₃ is hydrogen or an alkali metal counter ion, and n is 1 or 2; (b) a compound containing a radiation-dimerizable or radiation-polymerizable unsaturated bond and an amino group or a quaternary ammonium salt; (c) a non-alicyclic organic compound having a boiling point not lower than 120°C, containing at least one functional linkage selected from the group consisting of ester linkage, ether linkage and ketone linkage, and containing neither amino group nor hydroxyl group; and (d) optionally a sensitizer. This composition can greatly improve the developability and can give heat-resistant polyimide relief patterns with a good edge sharpness and good mechanical properties.

  描述了一种辐射敏感组合物，它包括 (a) 含有通式[1]代表的重复单元的聚合物 其中 R₁ 是至少具有两个碳原子的三价或四价有机残基，R₂ 是至少具有两个碳原子的二价有机残基，R₃ 是氢或碱金属反离子，n 是 1 或 2； (b) 含有可辐射二聚体或可辐射聚合的不饱和键和氨基或季铵盐的化合物； (c) 沸点不低于 120℃的非脂环有机化合物，含有至少一种选自酯连接、醚连接 和酮连接的官能连接，且既不含氨基也不含羟基；及 (d) 可选的敏化剂。 这种组合物能大大提高显影性，并能制作出边缘锐利、机械性能良好的耐热聚酰亚胺浮雕图案。