1,1-bis(phenylsulphonyl)cylohexane | 103979-48-2

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 1,1-bis(phenylsulphonyl)cylohexane
• 英文别名: 1,1-Diphenylsulfon-cyclohexan；Benzene, 1,1'-[cyclohexylidenebis(sulfonyl)]bis-；[1-(benzenesulfonyl)cyclohexyl]sulfonylbenzene
• CAS: 103979-48-2
• 化学式: C₁₈H₂₀O₄S₂
• 分子量: 364.486
• InChiKey: MFHRIYCSTNYZKY-UHFFFAOYSA-N

物化性质

• 熔点：
  158 °C(Solv: methanol (67-56-1))
• 沸点：
  598.5±46.0 °C(Predicted)
• 密度：
  1.304±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  3.8
• 重原子数：
  24
• 可旋转键数：
  4
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.33
• 拓扑面积：
  85
• 氢给体数：
  0
• 氢受体数：
  4

反应信息

• 作为反应物：
  描述：

  1,1-bis(phenylsulphonyl)cylohexane 在 naphthalen-1-yl-lithium 作用下， 以 四氢呋喃 为溶剂， 以85%的产率得到cyclohexyl phenyl sulfone
  参考文献：
  名称：

  Reductive lithiation of bis-phenylsulfones

  摘要：

  Reductive cleavage of geminal bis-phenylsulfones using lithium naphthalenide in THF at -78 degrees C selectively affords alpha-sulfonyl carbanions which participate in typical reaction with electrophiles.

  DOI：

  10.1016/s0040-4039(00)73519-2
• 作为产物：
  描述：

  在 sodium ethanolate 、 间氯过氧苯甲酸 作用下， 以 乙醇 、 氯仿 为溶剂， 反应 6.0h， 生成 1,1-bis(phenylsulphonyl)cylohexane
  参考文献：
  名称：

  Benedetti, Fabio; Stirling, Charles J.M., Journal of the Chemical Society. Perkin transactions II, 1986, p. 605 - 612

  摘要：

  DOI：

文献信息

• Methanofullerenes
  申请人：Robinson Alex Philip Graham

  公开号：US20140134843A1

  公开（公告）日：2014-05-15

  The present disclosure relates to novel methanofullerene derivatives, negative-type photoresist compositions prepared therefrom and methods of using them. The derivatives, their photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays.

  本公开涉及新型甲烷富勒烯衍生物，由此制备的负型光刻胶组合物以及使用它们的方法。这些衍生物、它们的光刻胶组合物和方法非常适合使用紫外线辐射、超极紫外线辐射、极紫外线辐射、X射线和带电粒子束进行精细图案加工。
• [EN] METHANOFULLERENES<br/>[FR] MÉTHANOFULLERRÈNES
  申请人：ROBINSON ALEX PHILIP GRAHAM

  公开号：WO2014078097A1

  公开（公告）日：2014-05-22

  The present disclosure relates to novel methanofullerene derivatives, negative- type photoresist compositions prepared therefrom and methods of using them. The derivatives, their photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays.

  本公开涉及新型甲烷富勒烯衍生物，由此制备的负型光刻胶组合物以及使用它们的方法。这些衍生物，它们的光刻胶组合物和方法非常适合使用紫外线辐射、超过极紫外线辐射、极紫外线辐射、X射线和带电粒子射线等技术进行精细图案处理。
• [EN] METHANOFULLERENES<br/>[FR] MÉTHANOFULLERÈNES
  申请人：ROBINSON ALEX PHILIP GRAHAM

  公开号：WO2014137663A1

  公开（公告）日：2014-09-12

  The present disclosure relates to novel methanofullerene derivatives, negative- type photoresist compositions prepared therefrom and methods of using them. The derivatives, their photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays. Negative photosensitive compositions are also disclosed.

  本公开涉及新型甲烷富勒烯衍生物，制备其负型光阻组合物和使用它们的方法。这些衍生物、它们的光阻组合物和方法非常适合使用紫外线辐射、超过极紫外线辐射、极紫外线辐射、X射线和带电粒子射线进行精细图案处理。还公开了负光敏组合物。
• RADIATION-SENSITIVE RESIN COMPOSITION
  申请人：JSR Corporation

  公开号：EP1953593A1

  公开（公告）日：2008-08-06

  It is intended to provide a radiation-sensitive resin composition, which comprises a radiation-sensitive acid generator excellent in resolution performance, heat stability, and storage stability, suppresses fluctuations in line width and deterioration in pattern profile attributed to standing waves, and produces a resist pattern improved in nano edge roughness and LEF. The radiation-sensitive resin composition is characterized by (A) a radiation-sensitive acid generator comprising: a sulfonium salt compound typified by 2,4,6-trimethylphenyldiphenylsulfonium 2,4-difluorobenzenesulfonate, 2,4,6-trimethylphenyldiphenylsulfonium 4-trifluoromethylbenzenesulfonate, or the like; and a sulfonimide compound. It is preferred that the composition should further comprise (B) a resin typified by a 4-hydroxystyrene/4-t-butoxystyrene copolymer, a 4-hydroxystyrene/t-butyl (meth)acrylate, or the like.

  本发明的目的是提供一种辐射敏感树脂组合物，该组合物包含一种在分辨率、热稳定性和储 存稳定性方面都很出色的辐射敏感酸发生器，它能抑制驻波引起的线宽波动和图案轮廓的恶化， 并能产生在纳米边缘粗糙度和 LEF 方面都有所改善的抗蚀图案。辐射敏感树脂组合物的特征在于 (A) 辐射敏感酸发生器，包括：锍盐化合物，如 2,4,6-三甲基二苯基锍 2,4-二氟苯磺酸盐、2,4,6-三甲基二苯基锍 4-三氟甲基苯磺酸盐或类似物；以及磺酰亚胺化合物。组合物最好还包括 (B) 一种树脂，其类型为 4-羟基苯乙烯/4-叔丁氧基苯乙烯共聚物、4-羟基苯乙烯/（甲基）丙烯酸丁酯或类似物。
• Multiple trigger photoresist compositions and methods
  申请人：Robinson Alex Phillip Graham

  公开号：US10095112B2

  公开（公告）日：2018-10-09

  The present disclosure relates to novel multiple trigger negative working photoresist compositions and processes. The processes involve removing acid-labile protecting groups from crosslinking functionalities in a first step and crosslinking the crosslinking functionality with an acid sensitive crosslinker in a second step. The incorporation of a multiple trigger pathway in the resist catalytic chain increases the chemical gradient in areas receiving a low dose of irradiation, effectively acting as a built in dose depend quencher-analog and thus enhancing chemical gradient and thus resolution, resolution blur and exposure latitude. The photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays.

  本公开涉及新型多触发阴性工作光刻胶组合物和工艺。这些工艺包括在第一步中去除交联官能团上的酸标签保护基团，在第二步中用酸敏感交联剂交联交联官能团。在光刻胶催化链中加入多重触发途径可增加接受低剂量辐照区域的化学梯度，有效地起到内置剂量依赖性淬火器-模拟器的作用，从而提高化学梯度，进而提高分辨率、分辨率模糊度和曝光宽容度。光刻胶组合物和方法非常适合使用紫外线辐射、超强紫外线辐射、极紫外线辐射、X 射线和带电粒子射线等进行精细图案处理。