CHAIN SCISSION POLYESTER POLYMERS FOR PHOTORESISTS
申请人:Brainard Robert L.
公开号:US20110127651A1
公开(公告)日:2011-06-02
Polymers for extreme ultraviolet and 193 nm photoresists are disclosed. The polymers comprise a photoacid generator (PAG) residue, an acid cleavable residue and a diacid joined by ester linkages. The polymers include a photoacid generating diol, a diacid and an acid table diol.
Imide Compound and Chemically Amplified Resist Composition Containing The Same
申请人:TAKEMOTO Ichiki
公开号:US20100028807A1
公开(公告)日:2010-02-04
An imide compound represented by the formula (I):
wherein R
1
represents a C1-C20 aliphatic hydrocarbon group etc., W
1
represents —CO—O— etc., Q
1
and Q
2
each independently represent a fluorine atom etc., and A represents a group represented by the formula (I-1):
wherein A
1
represents —CH
2
—CH
2
— etc., and a chemically amplified resist composition containing the same.