PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE
申请人:FUJIFILM Corporation
公开号:US20170153545A1
公开(公告)日:2017-06-01
There is provided a pattern forming method including (1) a step of forming a film with an active-light-sensitive or radiation-sensitive resin composition containing the following (A) to (C): (A) a resin having a repeating unit having a phenolic hydroxyl group, and having a group that decomposes by the action of an acid to generate a polar group, (B) a compound that generates an acid upon irradiation with active light or radiation, and (C) a compound having a cationic site and an anionic site in the same molecule, in which the cationic site and the anionic site are linked to each other via a covalent bond; (2) a step of exposing the film; and (3) a step of developing the exposed film using a developer including an organic solvent to form a negative tone pattern.
[EN] POLYMERIC ACID CATALYSTS AND USES THEREOF<br/>[FR] CATALYSEURS ACIDES POLYMÈRES ET LEURS UTILISATIONS
申请人:MIDORI RENEWABLES INC
公开号:WO2012118767A1
公开(公告)日:2012-09-07
Polymers useful as catalysts in non-enzymatic saccharification processes are provided. Provided are also methods for hydrolyzing cellulosic materials into monosaccharides and/or oligosaccharides using these polymeric acid catalysts.