甲氧普烯杂质A1 | 56374-21-1

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 脂肪酰基
• 中文名称: 甲氧普烯杂质A1
• 英文名称: Octanoic acid, 7-methoxy-7-methyl-
• 英文别名: 7-methoxy-7-methyloctanoic acid
• CAS: 56374-21-1
• 化学式: C₁₀H₂₀O₃
• 分子量: 188.26
• InChiKey: SBUHNNWPSIDTNB-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.8
• 重原子数：
  13
• 可旋转键数：
  7
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.9
• 拓扑面积：
  46.5
• 氢给体数：
  1
• 氢受体数：
  3

文献信息

• Radiation-sensitive resin composition
  申请人：——

  公开号：US20030170561A1

  公开（公告）日：2003-09-11

  A radiation-sensitive resin composition comprising (A) an acid-dissociable group-containing polysiloxane and (B) a photoacid generator containing trifluoromethane sulfonic acid or a compound which generates an acid of the following formula (I), 1 wherein Rf individually represents a fluorine atom or a trifluoromethyl group, and Ra represents a hydrogen atom, a fluorine atom, a linear or branched alkyl group having 1-20 carbon atoms, or a linear or branched fluoroalkyl group having 1-20 carbon atoms, a substituted or unsubstituted monovalent cyclic hydrocarbon group having 3-20 carbon atoms, or a substituted or unsubstituted monovalent cyclic fluoro-hydrocarbon group having 3-20 carbon atoms. The radiation-sensitive resin composition of the present invention exhibits superior resolution, while maintaining high transparency to radiations and high dry etching resistance. The resin composition thus can greatly contribute to the lithography process that will become more and more minute in the future.

  一种辐射敏感的树脂组合物，包括（A）含有酸可解离基团的聚硅氧烷和（B）含有三氟甲烷磺酸或生成以下式（I）酸的化合物的光酸发生剂，其中Rf分别表示氟原子或三氟甲基基团，Ra表示氢原子，氟原子，具有1-20个碳原子的线性或支链烷基，或具有1-20个碳原子的线性或支链氟烷基，具有3-20个碳原子的取代或未取代的单价环烃基或具有3-20个碳原子的取代或未取代的单价环氟烃基。本发明的辐射敏感树脂组合物表现出优异的分辨率，同时保持对辐射的高透明度和高干法刻蚀抵抗力。因此，该树脂组合物可以为未来变得越来越微小的光刻工艺做出巨大贡献。
• Benzimidazole derivatives
  申请人：——

  公开号：US20040044056A1

  公开（公告）日：2004-03-04

  This invention relates to the compounds represented by a general formula [I]: 1 [in which A 1 and A 2 represent optionally fluorine-substituted methine or the like; B represents halogen, cyano, lower alkyl or the like; D represents optionally substituted heterocyclic group or the like; and G represents C 3 -C 20 aliphatic group such as alicyclic group]. These compounds inhibit nociceptin activities due to their high affinity to nociceptin receptor, and are useful as analgesic, antiobestic, corebral function improver, drugs for treatment of alzheimer's disease and dementia, remedies for schizophrenia and neurodegenerative diseases, antidepressant, remedies for diabetes insipidus, polyuria, hypotension and so on.

  本发明涉及由一般式[I]表示的化合物：1[其中，A1和A2表示选择性氟代甲基或类似物；B表示卤素，氰基，低碳烷基或类似物；D表示选择性取代的杂环基团或类似物；G表示C3-C20脂肪族基团，例如脂环族基团]。这些化合物由于对痛觉受体具有高亲和力而抑制了痛觉肽活性，并且可用作镇痛剂，抗肥胖剂，脑功能改善剂，治疗阿尔茨海默病和痴呆症的药物，治疗精神分裂症和神经退行性疾病的药物，抗抑郁剂，治疗尿崩症，多尿症，低血压等的药物。
• HYPERBRANCHED POLYMER SYNTHESIZING METHOD, HYPERBRANCHED POLYMER, RESIST COMPOSITION, SEMICONDUCTOR INTEGRATED CIRCUIT, AND SEMICONDUCTOR INTEGRATED CIRCUIT FABRICATION METHOD
  申请人：Tanaka Yuko

  公开号：US20110198730A1

  公开（公告）日：2011-08-18

  A method of synthesizing a hyperbranched polymer by living radical polymerization of a monomer in the presence of a metal catalyst includes at least adding a compound or setting the amount of the monomer in the living radical polymerization. The compound added is at least a compound represented by R 1 -A or a compound represented by R 2 —B—R 3 , where R 1 denotes hydrogen, an alkyl group (1-10 carbons), aryl group (1-10 carbons), or aralkyl group (7-10 carbons), A denotes a cyano group, hydroxyl group, or nitro group, R 2 and R 3 denote hydrogen, alkyl groups (1-10 carbons), aryl groups (6-10 carbons), aralkyl groups (7-10 carbons), or dialkylamino groups (2-10 carbons), and B denotes a carbonyl group or sulfonyl group. Setting of the monomer amount includes setting the amount of monomer to be mixed into a reaction system at one mixing to be less than the total monomer to be mixed with the reaction system.

  在金属催化剂的存在下，通过活性自由基聚合合成超支化聚合物的方法，至少包括添加化合物或调整活性自由基聚合中单体的量。添加的化合物至少是由R1-A表示的化合物或由R2-B-R3表示的化合物，其中R1表示氢、烷基（1-10个碳）、芳基（1-10个碳）或芳基烷基（7-10个碳），A表示氰基、羟基或硝基，R2和R3表示氢、烷基（1-10个碳）、芳基（6-10个碳）、芳基烷基（7-10个碳）或二烷基氨基基团（2-10个碳），B表示羰基或磺酰基。单体量的调整包括将单体的量设置为在一次混合中混合到反应体系中的单体总量以下。
• VINYLPHENYLPROPIONIC ACID DERIVATIVES, PROCESSES FOR PRODUCTION OF THE DERIVATIVES, POLYMERS THEREOF AND RADIOSENSITIVE RESIN COMPOSITIONS
  申请人：JSR Corporation

  公开号：EP1231205A1

  公开（公告）日：2002-08-14

  Vinylphenylpropionic acid derivatives; processes for producing the derivatives; polymers of the same; and radiosensitive resin compositions containing the polymers. The above polymers exhibit low radiation absorption and are useful as the resin component of radiosensitive resin compositions particularly suitable for chemically amplified resists. For example, t-butyl 4-vinylphenylpropionate is produced by (1) reacting t-butyl bromoacetate with tri(n-butyl)phosphine to obtain a quaternary phosphonium salt, (2) reacting this salt with a base to obtain a phosphorus ylide, (3) reacting this ylide with 2,4,6-tris(3',5'-di-t-butyl-4'-hydroxybenzyl)methyl-styrene to obtain a quaternary phosphonium salt, and (4) hydrolyzing this salt.

  乙烯基苯丙酸衍生物；生产该衍生物的工艺；该衍生物的聚合物；以及含有该聚合物的辐射敏感树脂组合物。上述聚合物的辐射吸收率低，可用作辐射敏感树脂组合物的树脂成分，尤其适用于化学放大抗蚀剂。例如，4-乙烯基苯基丙酸叔丁酯是通过以下方法制得的：(1) 将溴乙酸叔丁酯与三(正丁基)膦反应，得到季鏻盐、(2) 将这种盐与碱反应，得到一种磷酰亚胺； (3) 将这种酰亚胺与 2,4,6-三（3',5'-二-叔丁基-4'-羟基苄基）甲基苯乙烯反应，得到一种季鏻盐； (4) 将这种盐水解。
• RADIATION-SENSITIVE COMPOSITION, INSULATING FILM AND ORGANIC EL DISPLAY ELEMENT
  申请人：JSR Corporation

  公开号：EP1312982A1

  公开（公告）日：2003-05-21

  According to the present invention, there are provided an insulating film for an organic EL element, which has sufficiently low water permeability and a good sectional form and whose reactivity with a basic material and an electrode made from a metal having a low work function is suppressed, an insulating film for an organic EL element, which enables the formation of a through hole or U-shaped cavity therein and has excellent flattening performance, high transparency and high resistance to a resist stripper, and a radiation sensitive resin composition for forming the insulating film. An organic EL display element having this insulating film is free from an emission failure and has sufficiently long luminance half-life period and excellent reliability. The above composition comprises an alkali-soluble resin which may have an epoxy group and a 1,2-quinonediazide compound.

  根据本发明，提供了一种有机电致发光元件用绝缘膜，它具有足够低的透水性和良好的断面形状，并能抑制其与基本材料和低功函数金属制成的电极的反应性；还提供了一种有机电致发光元件用绝缘膜，它能在其中形成通孔或U形腔，并具有优异的扁平化性能、高透明度和高抗抗蚀剂剥离性；还提供了一种用于形成绝缘膜的辐射敏感树脂组合物。 具有这种绝缘膜的有机电致发光显示元件不会出现发射故障，并具有足够长的亮度半衰期和出色的可靠性。 上述组合物包括一种可具有环氧基团的碱溶性树脂和一种 1,2-醌噻嗪化合物。