FLUORINATED COMPOUND, AND FLUOROPOLYMER, PROCESS FOR ITS PRODUCTION AND RESIST COMPOSITION CONTAINING IT
申请人:TAKEBE Yoko
公开号:US20070207409A1
公开(公告)日:2007-09-06
To provide a fluoropolymer having functional groups and having high transparency in a wide wavelength region, and a resist composition comprising the fluoropolymer. A fluoropolymer (A) having monomer units formed by polymerization of a fluorinated diene represented by the following formula (1):
CF
2
═CFCH
2
CH-Q-CH
2
CH═CH
2
(1)
wherein Q is (CH
2
)
a
C(CF
3
)
2
OR
4
(wherein a is an integer of from 0 to 3, R
4
is an alkyl group or a fluorinated alkyl group having at most 20 carbon atoms which may have an etheric oxygen atom, an alkoxycarbonyl group having at most 6 carbon atoms, or CH
2
R
5
(wherein R
5
is an alkoxycarbonyl group having at most 6 carbon atoms)), or (CH
2
)
d
COOR
6
(wherein d is 0 or 1, and R
6
is a hydrogen atom, or an alkyl group or a fluorinated alkyl group having at most 20 carbon atoms), a process for its production and a resist composition having the fluoropolymer (A) as a base.
Fluorinated compound, and fluoropolymer, process for its production and resist composition containing it
申请人:Takebe Yoko
公开号:US20060122348A1
公开(公告)日:2006-06-08
To provide a fluoropolymer having functional groups and having high transparency in a wide wavelength region, and a resist composition comprising the fluoropolymer. A fluoropolymer (A) having monomer units formed by polymerization of a fluorinated diene represented by the following formula (1):
CF
2
═CFCH
2
CH-Q-CH
2
CH═CH
2
(1)
wherein Q is (CH
2
)
a
C(CF
3
)
2
OR
4
(wherein a is an integer of from 0 to 3, R
4
is an alkyl group or a fluorinated alkyl group having at most 20 carbon atoms which may have an etheric oxygen atom, an alkoxycarbonyl group having at most 6 carbon atoms, or CH
2
R
5
(wherein R
5
is an alkoxycarbonyl group having at most 6 carbon atoms)), or (CH
2
)
d
COOR
6
(wherein d is 0 or 1, and R
6
is a hydrogen atom, or an alkyl group or a fluorinated alkyl group having at most 20 carbon atoms), a process for its production and a resist composition having the fluoropolymer (A) as a base.