申请人:AZ Electronic Materials USA Corp.
公开号:US07601480B2
公开(公告)日:2009-10-13
The present application relates to a compound of formula
where X is selected from the group CF3SO3, C4F9SO3, N(SO2C2F5)2, N(SO2CF3SO2C4F9), N(SO2C3F7)2, N(SO2C4F9)2, CF3CHFO(CF2)2SO3, and CH3CH2CH2O(CF2)4SO3. A photoresist composition comprising a polymer containing an acid labile group, the above compounds, and one or more additional photoacid generators is also provided for.
本申请涉及的化合物的化学式为X,其中X被选自CF3SO3,C4F9SO3,N(SO2C2F5)2,N(SO2CF3SO2C4F9),N(SO2C3F7)2,N(SO2C4F9)2,CF3CHFO(CF2)2SO3和CH3CH2CH2O(CF2)4SO3。还提供了一种包含含酸敏基团的聚合物,上述化合物和一个或多个额外的光酸发生剂的光阻剂组合物。