1-acetoxymethyl-3-ethoxyadamantane | 1158076-76-6

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: 1-acetoxymethyl-3-ethoxyadamantane
• 英文别名: (3-Ethoxy-1-adamantyl)methyl acetate
• CAS: 1158076-76-6
• 化学式: C₁₅H₂₄O₃
• 分子量: 252.354
• InChiKey: WCRNNSYFGHFUJA-UHFFFAOYSA-N

物化性质

• 沸点：
  309.6±15.0 °C(predicted)
• 密度：
  1.09±0.1 g/cm3(Temp: 20 °C; Press: 760 Torr)(predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  2.5
• 重原子数：
  18
• 可旋转键数：
  5
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.93
• 拓扑面积：
  35.5
• 氢给体数：
  0
• 氢受体数：
  3

反应信息

• 作为产物：
  描述：

  1-(acetoxymethyl)-3-fluoroadamantane 、 三甲基乙氧基硅烷 在 aluminium(III) triflate 作用下， 以 二氯甲烷 为溶剂， 反应 20.0h， 以80%的产率得到1-acetoxymethyl-3-ethoxyadamantane
  参考文献：
  名称：

  Synthesis of functionalized adamantanes from fluoroadamantanes

  摘要：

  Selective introduction of functional groups on the tert-carbon of adamantane was performed by substitution with fluorides. A methyl, phenacyl, aryl, cyclohexyl, alkoxy, or azido group was introduced into the adamantane skeleton without influencing the other functional groups present. Various functionalized adamantanes were synthesized using this scheme. A fluorinated analog of memantine (3-fluoro-5,7-dimethyl-1-adamantylammoniurn acetate 25) was synthesized from methyl 3,5-dimethyladamantane-1-carboxylate 6. (C) 2009 Elsevier Ltd. All rights reserved.

  DOI：

  10.1016/j.tet.2009.02.059

文献信息

• SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20180065925A1

  公开（公告）日：2018-03-08

  A salt represented by formula (I): wherein R 1 and R 2 independently each represent a C6-C18 unsubstituted or substituted aromatic hydrocarbon group, X 1 represents a C1-C12 divalent aliphatic saturated hydrocarbon group in which a methylene group can be replaced by an oxygen atom or a carbonyl group, and A − represents an organic anion.

  一种由化学式(I)表示的盐：其中R1和R2分别独立地代表C6-C18未取代或取代的芳香烃基，X1代表C1-C12二价脂肪饱和碳氢烃基，其中一个亚甲基基团可被氧原子或羰基取代，A−代表有机阴离子。
• Photoresist composition
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US10564544B2

  公开（公告）日：2020-02-18

  A photoresist composition comprising an acid generator and a resin which comprises one or more structural units (a1) derived from a monomer (a1) having an acid-liable group, all of monomers (a1) showing a distance of Hansen solubility parameters between the monomer (a1) and butyl acetate in the range of 3 to 5, the distance being calculated from formula (1): R=(4×(δdm−15.8)2+(δpm−3.7)2+(δhm−6.3)2)1/2  (1) in which δdm represents a dispersion parameter of a monomer, δpm represents a polarity parameter of a monomer, δhm represents a hydrogen bonding parameter of a monomer, and R represents a distance of Hansen solubility parameters, and at least one of the monomers (a1) showing a difference of R between the monomer (a1) and a compound in which an acid is removed from the monomer (a1) in the range of not less than 5.

  一种光致抗蚀剂组合物，包括一种酸发生器和一种树脂，该树脂由一个或多个结构单元（a1）组成，这些结构单元（a1）由具有酸性基团的单体（a1）衍生而来，所有单体（a1）与乙酸丁酯之间的汉森溶解度参数距离在 3 至 5 之间，该距离由式（1）计算得出： R=(4×(δdm-15.8)2+(δpm-3.7)2+(δhm-6.3)2)1/2 (1) 其中，δdm 代表单体的分散参数，δpm 代表单体的极性参数，δhm 代表单体的氢键参数，R 代表汉森溶解度参数的距离，单体（a1）中至少有一种单体（a1）与从单体（a1）中除去一种酸的化合物之间的 R 差的范围不小于 5。
• Compound, resin, resist composition and method for producing resist pattern
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US10725380B2

  公开（公告）日：2020-07-28

  A compound represented by the formula (I). wherein R1 represents a hydrogen atom, a halogen atom or a C1 to C6 alkyl group that may have a halogen atom; R2 represents a C1 to C12 fluorinated saturated hydrocarbon group; W1 represents a C5 to C18 divalent alicyclic hydrocarbon group; A1 and A2 independently represents a single bond or *—A3—X1—(A4—X2)a—; A3 and A4 independently represents a C1 to C6 alkanediyl group; X1 and X2 independently represents —O—, —CO—O—or —O—CO—; a represents 0 or 1; and * represents a bond to an oxygen atom.

  式 (I) 所代表的化合物。 其中 R1 代表氢原子、卤素原子或可能带有卤素原子的 C1 至 C6 烷基；R2 代表 C1 至 C12 氟化饱和烃基；W1 代表 C5 至 C18 二价脂环烃基；A1和A2独立地代表单键或*-A3-X1-(A4-X2)a-；A3和A4独立地代表C1至C6烷二基；X1和X2独立地代表-O-、-CO-O-或-O-CO-；a代表0或1；以及*代表与氧原子的键。
• Compound, resin, photoresist composition and process for producing photoresist pattern
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US10781198B2

  公开（公告）日：2020-09-22

  A compound represented by the formula (I): wherein the values of R1, R2, R3, Ar and X1 in formula (I) are defined in the specification.

  式 (I) 所代表的化合物： 其中，式（I）中 R1、R2、R3、Ar 和 X1 的值在说明书中定义。
• Salt and photoresist composition containing the same
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US10838300B2

  公开（公告）日：2020-11-17

  A salt represented by formula (I): wherein R1 and R2 independently each represent a C6-C18 unsubstituted or substituted aromatic hydrocarbon group, X1 represents a C1-C12 divalent aliphatic saturated hydrocarbon group in which a methylene group can be replaced by an oxygen atom or a carbonyl group, and A− represents an organic anion.

  式 (I) 所代表的盐： 其中 R1 和 R2 各自独立地代表 C6-C18 未取代或取代的芳香烃基团、 X1 代表 C1-C12 二价脂肪族饱和烃基，其中亚甲基可被氧原子或羰基取代，以及 A- 代表有机阴离子。