This invention relates to new photoacid generator compounds and photoresist compositions that comprise such compounds. In particular, the invention relates to photoacid generator compounds that generate an &agr;,&agr;-difluoroalkyl sulfonic acid upon exposure to activating radiation. Positive- and negative-acting chemically amplified resists that contain such PAGs are particularly preferred. The invention also includes methods for synthesis of such PAGs and &agr;,&agr;-difluoroalkyl sulfonic acids
本发明涉及新型光酸发生器化合物和包含此类化合物的光刻胶组合物。特别是,本发明涉及光酸发生器化合物,该化合物在受到活化辐射时会生成&agr;,&agr;-二氟烷基
磺酸。特别优选的是含有这种 PAG 的正作用和负作用
化学放大抗蚀剂。本发明还包括合成此类 PAG 和&agr;,&agr;-二氟烷基
磺酸的方法