D-Gluconic acid, monoammonium salt | 10361-31-6

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羟基酸及其衍生物
• 英文名称: D-Gluconic acid, monoammonium salt
• 英文别名: azane;2,3,4,5,6-pentahydroxyhexanoic acid
• CAS: 10361-31-6
• 化学式: C6H15NO7
• 分子量: 213.19
• InChiKey: XLCNHLXQKYRGKZ-UHFFFAOYSA-N

物化性质

• 颜色/状态：
  NEEDLES
• 溶解度：
  IN WATER: 31.6 G/100 ML @ 25 °C; SLIGHTLY SOL IN ALCOHOL; PRACTICALLY INSOL IN MOST ORGANIC SOLVENTS
• 稳定性/保质期：
  TURNS YELLOW ON EXPOSURE TO LIGHT
• 旋光度：
  SPECIFIC OPTICAL ROTATION: +11.6 DEG IN WATER

计算性质

• 辛醇/水分配系数(LogP)：
  -3.33
• 重原子数：
  14
• 可旋转键数：
  5
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.83
• 拓扑面积：
  139
• 氢给体数：
  7
• 氢受体数：
  8

文献信息

• HIGH OXIDE VS NITRIDE SELECTIVITY, LOW AND UNIFORM OXIDE TRENCH DISHING IN SHALLOW TRENCH ISOLATION (STI) CHEMICAL MECHANICAL PLANARIZATION POLISHING (CMP)
  申请人：Versum Materials US, LLC

  公开号：EP3628713B1

  公开（公告）日：2022-01-12
• High Oxide VS Nitride Selectivity, Low And Uniform Oxide Trench Dishing In Shallow Trench Isolation(STI) Chemical Mechanical Planarization Polishing(CMP)
  申请人：Versum Materials US, LLC

  公开号：US20200095502A1

  公开（公告）日：2020-03-26

  Present invention provides Chemical Mechanical Planarization Polishing (CMP) compositions for Shallow Trench Isolation (STI) applications. The CMP compositions contain ceria coated inorganic oxide particles as abrasives, such as ceria-coated silica particles or any other ceria-coated inorganic oxide particles as core particles; suitable chemical additives comprising at least one organic carboxylic acid group, at least one carboxylate salt group or at least one carboxylic ester group and two or more hydroxyl functional groups in the same molecule; and a water soluble solvent; and optionally biocide and pH adjuster; wherein the composition has a pH of 2 to 12, preferably 3 to 10, and more preferably 4 to 9.