5-Hydroxy-1,2-dimethylindan | 51086-26-1

• 分子结构分类: 有机化合物 - 苯类化合物 - 茚满类
• 英文名称: 5-Hydroxy-1,2-dimethylindan
• 英文别名: 1,2-dimethyl-2,3-dihydro-1H-inden-5-ol
• CAS: 51086-26-1
• 化学式: C₁₁H₁₄O
• 分子量: 162.232
• InChiKey: ABWSMLAWUHYFPX-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3
• 重原子数：
  12
• 可旋转键数：
  0
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.45
• 拓扑面积：
  20.2
• 氢给体数：
  1
• 氢受体数：
  1

反应信息

• 作为反应物：
  描述：

  5-Hydroxy-1,2-dimethylindan 在 五氟化锑 、 氟磺酸 作用下， 生成 7,8-Dimethyl-bicyclo<4.3.0>nona-1,6-dien-3-on
  参考文献：
  名称：

  Coustard,J.-M.; Jacquesy,J.-C., Bulletin de la Societe Chimique de France, 1973, p. 2098 - 2101

  摘要：

  DOI：

文献信息

• POSITIVE-TYPE RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, PHOTO-REACTIVE QUENCHER, AND POLYMERIC COMPOUND
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US20160376233A1

  公开（公告）日：2016-12-29

  A positive-type resist composition which generates an acid upon exposure and whose solubility in an alkali developing solution increases under the action of an acid, the composition including a base material component whose solubility in an alkali developing solution increases under the action of an acid; and a compound represented by the following general formula (m0): Z 01 to Z 04 each independently represent a substituent having electron withdrawing properties, Rb 21 and Rb 22 each independently represent an alkyl group, an alicyclic hydrocarbon group which may have a substituent, or a hydroxyl group, Rb 1 represents an aryl group which may have a substituent, an alkyl group, or an alkenyl group, n1 and n2 represent an integer of 0 to 3, and X0 − represents an organic anion.

  一种正型抗蚀组合物，曝光后生成酸，其在碱性显影溶液中的溶解度在酸的作用下增加，该组合物包括一种基材组分，在酸的作用下在碱性显影溶液中的溶解度增加；以及由以下一般式（m0）表示的化合物：Z01至Z04分别独立表示具有电子吸引性的取代基，Rb21和Rb22分别独立表示烷基基团、可能具有取代基的脂环烃基团或羟基，Rb1表示可能具有取代基的芳基、烷基或烯基，n1和n2表示0至3的整数，X0−表示有机阴离子。
• ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE RESIN COMPOSITION, AND ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE FILM AND PATTERN FORMING METHOD USING THE SAME
  申请人：KAWABATA Takeshi

  公开号：US20120082939A1

  公开（公告）日：2012-04-05

  An active light ray sensitive or radioactive ray sensitive resin composition which satisfies high sensitivity, high resolution, good pattern configuration, and good line edge roughness at the same time to a great extent, while having sufficiently good outgassing performance during exposure, and an active light ray sensitive or radioactive ray sensitive film formed by using the composition, and a pattern-forming method, are provided. The active light ray sensitive or radioactive ray sensitive resin composition according to the present invention includes a resin (P) containing a repeating unit (A) which decomposes by irradiation with active light ray or radioactive ray to generate an acid, and a repeating unit (C) containing a primary or secondary hydroxyl group.

  提供了一种活性光线敏感或放射线敏感的树脂组合物，其在很大程度上同时满足高灵敏度、高分辨率、良好的图案配置和良好的线边粗糙度，同时在曝光期间具有足够好的排气性能，以及使用该组合物形成的活性光线敏感或放射线敏感薄膜和形成图案的方法。本发明的活性光线敏感或放射线敏感的树脂组合物包括含有重复单元（A）的树脂（P），该重复单元通过活性光线或放射线辐射分解生成酸，并且含有主要或次要羟基的重复单元（C）。
• ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME
  申请人：TAKAHASHI Hidenori

  公开号：US20110318693A1

  公开（公告）日：2011-12-29

  An embodiment of the composition contains a resin (P) containing a repeating unit (A) that is configured to decompose when exposed to actinic rays or radiation to thereby generate an acid. The repeating unit (A) contains a cation structure with a monocyclic or polycyclic heterocycle containing a nitrogen atom.

  该组合物的实施例包含一种树脂（P），其中包含一个重复单元（A），当暴露于光致射线或辐射时，该单元（A）被配置为分解以产生酸。 重复单元（A）包含具有含氮杂环的单环或多环阳离子结构。
• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE COMPOSITION AND PATTERN FORMING METHOD
  申请人：Inasaki Takeshi

  公开号：US20120301817A1

  公开（公告）日：2012-11-29

  An actinic ray-sensitive or radiation-sensitive resin composition comprising (P) a resin having a repeating unit represented by the following formula (1), a resist film using the composition, and a pattern forming method.

  一种感光树脂组合物，其包括（P）一种具有以下式（1）所表示的重复单元的树脂，使用该组合物的光阻膜以及一种图案形成方法。
• CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME
  申请人：Fujimori Toru

  公开号：US20120006788A1

  公开（公告）日：2012-01-12

  A chemical amplification resist composition that is used for preparation of a mold, and a mold preparation method and a resist film each using the composition are provided.

  提供一种用于制备模具的化学放大型光阻组合物，以及使用该组合物的模具制备方法和光阻膜。