2-hydroxycarbonyl-3-hydroxycarbonylmethylbicyclo[2.2.1]hept-5-ene | 24434-92-2

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: 2-hydroxycarbonyl-3-hydroxycarbonylmethylbicyclo[2.2.1]hept-5-ene
• 英文别名: 3-(Carboxymethyl)bicyclo[2.2.1]hept-5-ene-2-carboxylic acid
• CAS: 24434-92-2
• 化学式: C₁₀H₁₂O₄
• 分子量: 196.203
• InChiKey: YZRMOQASKCPNAH-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.6
• 重原子数：
  14
• 可旋转键数：
  3
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.6
• 拓扑面积：
  74.6
• 氢给体数：
  2
• 氢受体数：
  4

文献信息

• RESIN COMPOSITION AND SEMICONDUCTOR DEVICE BOARD
  申请人：Osaku Yumi

  公开号：US20140087136A1

  公开（公告）日：2014-03-27

  A resin composition which contains a binder resin (A), radiation-sensitive compound (B), silane-modified resin (C), and antioxidant (D), wherein a content of the silane-modified resin (C) is 0.1 to 150 parts by weight with respect to 100 parts by weight of the binder resin (A), a content of the antioxidant (D) is 0.1 to 10 parts by weight with respect to 100 parts by weight of the binder resin (A), and an amount of warping is 14 μm or less when using the resin composition to form a thickness 2 to 3 μm resin film and baking the formed resin film at 230° C. is provided.

  一种树脂组合物，包含粘合剂树脂（A），辐射敏感化合物（B），硅改性树脂（C）和抗氧化剂（D），其中硅改性树脂（C）的含量相对于100份粘合剂树脂（A）为0.1至150份重量，抗氧化剂（D）的含量相对于100份粘合剂树脂（A）为0.1至10份重量，并且使用该树脂组合物形成2至3μm厚度的树脂膜并在230°C下烘烤形成的树脂膜翘曲量为14μm或以下。
• RADIATION-SENSITIVE RESIN COMPOSITION AND ELECTRONIC COMPONENT
  申请人：Zeon Corporation

  公开号：EP3121651A1

  公开（公告）日：2017-01-25

  A radiation-sensitive resin composition comprising a binder resin (A), a radiation-sensitive compound (B), a tetrafunctional or lower functional epoxy-based cross-linking agent (C) having an epoxy equivalent of 450 or less and a softening point of 30°C or less, and an aralkyl phenol resin (D) is provided. According to the present invention, it is possible to provide a radiation-sensitive resin composition able to give a resin film high in adhesion to a metal layer and excellent in developability and low hygroscopicity.

  本发明提供了一种辐射敏感树脂组合物，该组合物由粘结剂树脂（A）、辐射敏感化合物（B）、环氧当量为 450 或以下且软化点为 30°C 或以下的四官能度或更低官能度环氧基交联剂（C）和芳基苯酚树脂（D）组成。根据本发明，可以提供一种辐射敏感性树脂组合物，该树脂组合物能够生成与金属层粘附性高、显影性好和吸湿性低的树脂膜。
• RADIATION-SENSITIVE RESIN COMPOSITION, RESIN FILM, AND ELECTRONIC COMPONENT
  申请人：Zeon Corporation

  公开号：EP3136173A1

  公开（公告）日：2017-03-01

  There are provided a radiation-sensitive resin composition comprising a binder resin (A), radiation-sensitive compound (B), and cross-linking agent (C) represented by the following general formula (1), whereina content of the cross-linking agent (C) is 3 to 25 parts by weight with respect to 100 parts by weight of the binder resin (A): wherein, in the general formula (1), each of R1 to R3 independently represents a hydrocarbon group having 1 to 10 carbon atoms.

  提供了一种辐射敏感树脂组合物，该组合物由以下通式（1）表示的粘合剂树脂 （A）、辐射敏感化合物（B）和交联剂（C）组成，其中交联剂（C）的含量相对于 100 重量份的粘合剂树脂（A）为 3 至 25 重量份： 其中，在通式（1）中，R1 至 R3 各自独立地代表具有 1 至 10 个碳原子的烃基。
• RESIN COMPOSITION
  申请人：Zeon Corporation

  公开号：EP3345970A1

  公开（公告）日：2018-07-11

  A resin composition comprising a binder resin (A), a phenoxy resin having a hydroxyl equivalent of 300 or more, and a cross-linking agent (C). The resin composition of the present invention preferably further comprises a photoacid generator (D). The photoacid generator (D) is more preferably a quinone diazide compound.

  一种树脂组合物，包括粘合剂树脂 (A)、羟基当量大于等于 300 的苯氧树脂和交联剂 (C)。本发明的树脂组合物最好还包括光酸发生器（D）。光酸发生剂（D）最好是重氮化醌化合物。
• RESIN COMPOSITION, RESIN FILM, AND ELECTRONIC COMPONENT
  申请人：Zeon Corporation

  公开号：EP3434731A1

  公开（公告）日：2019-01-30

  A resin composition comprising a cyclic olefin polymer (A) having a protonic polar group, a cross-linking agent (B), and an organic solvent (C), wherein the organic solvent (C) contains diethylene glycol ethyl methyl ether, and a content of diethylene glycol dimethyl ether contained in the organic solvent (C) is 10 ppm by weight or less when a content of the diethylene glycol ethyl methyl ether is 100 wt%, is provided.

  本发明提供了一种树脂组合物，该树脂组合物由具有质子极性基团的环烯烃聚合物（A）、交联剂（B）和有机溶剂（C）组成，其中有机溶剂（C）含有二乙二醇乙基甲基醚，当二乙二醇乙基甲基醚的含量为 100 wt%时，有机溶剂（C）中所含的二乙二醇二甲醚的含量为 10 ppm 或以下（按重量计）。