申请人:Spirogen Limited
公开号:US20030195196A1
公开(公告)日:2003-10-16
A compound with formula (I)
1
where R
10
is a therapeutically removable nitrogen protecting group; R
2
and R
3
are independently selected from: H, R, OH, OR, ═O, ═CH—R, ═CH
2
, CH
2
—CO
2
R, CH
2
—CO
2
H, CH
2
—SO
2
R, O—SO
2
—R, CO
2
R, COR and CN; R
6
, R
7
and R
9
are independently selected from H, R, OH, OR, halo, amino, nitro, Me
3
Sn; X is S, O or NH; R
11
is either H or R; and where there is optionally a double bond between C1 and C2 or C2 and C3; and R
8
is selected from H, R, OH, OR, halo, amino, nitro, Me
3
Sn, or R
7
and R
8
together form a group —O—(CH
2
)
p
—O—, where p is 1 or 2. Such compounds may be used in methods of ADEPT, GDEPT, NPEPT or PDT.
化合物的
化学式为(I)1,其中R10是一种治疗上可去除的氮保护基;R2和R3独立选择自H、R、OH、OR、═O、═CH—R、═
CH2、 —CO2R、 —CO2H、 —SO2R、O—SO2—R、CO2R、COR和CN;R6、R7和R9独立选择自H、R、OH、OR、卤素、
氨基、硝基、Me3Sn;X为S、O或NH;R11为H或R;并且在C1和C2或C2和C3之间可以选择性地有一个双键;R8选择自H、R、OH、OR、卤素、
氨基、硝基、Me3Sn,或者R7和R8一起形成一个—O—( )p—O—基团,其中p为1或2。这些化合物可用于A
DEPT、G
DEPT、NPE
PT或PDT的方法中。