ACETAL COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
申请人:HASEGAWA Koji
公开号:US20110236831A1
公开(公告)日:2011-09-29
The invention provides an acetal compound containing an adamantane ring having an alcoholic hydroxyl group which is protected with an acetal group having a carbonyl moiety of branched structure. A photoresist film comprising a polymer comprising recurring units derived from the acetal compound and an acid generator is characterized by a high dissolution contrast when it is subjected to exposure and organic solvent development to form an image via positive/negative reversal.
US8791290B2
申请人:——
公开号:US8791290B2
公开(公告)日:2014-07-29
Acetal compound, polymer, resist composition, and patterning process
申请人:Hasegawa Koji
公开号:US08791290B2
公开(公告)日:2014-07-29
The invention provides an acetal compound containing an adamantane ring having an alcoholic hydroxyl group which is protected with an acetal group having a carbonyl moiety of branched structure. A photoresist film comprising a polymer comprising recurring units derived from the acetal compound and an acid generator is characterized by a high dissolution contrast when it is subjected to exposure and organic solvent development to form an image via positive/negative reversal.