4,4'-[(2-羟基-5-甲基-1,3-亚苯基)二(亚甲基)]二(2,5-二甲基苯酚) | 148398-19-0

• 分子结构分类: 有机化合物 - 苯丙烷和聚酮 - 二芳基庚烷
• 中文名称: 4,4'-[(2-羟基-5-甲基-1,3-亚苯基)二(亚甲基)]二(2,5-二甲基苯酚)
• 英文名称: 2,6-bis(4-hydroxy-2,5-dimethylbenzyl)-4-methylphenol
• 英文别名: 2,6-bis[(4-hydroxy-2,5-dimethylphenyl)methyl]-4-methylphenol
• CAS: 148398-19-0
• 化学式: C₂₅H₂₈O₃
• 分子量: 376.496
• InChiKey: GOWFRAUGTCYVPS-UHFFFAOYSA-N

物化性质

• 沸点：
  570.1±45.0 °C(Predicted)
• 密度：
  1.158±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  6.5
• 重原子数：
  28
• 可旋转键数：
  4
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.28
• 拓扑面积：
  60.7
• 氢给体数：
  3
• 氢受体数：
  3

反应信息

• 作为反应物：
  描述：

  4,4'-[(2-羟基-5-甲基-1,3-亚苯基)二(亚甲基)]二(2,5-二甲基苯酚) 在 sodium hydroxide 、 聚合甲醛 、 溶剂黄146 作用下， 以 四氢呋喃 、 水 为溶剂， 生成 2,6-bis(4-hydroxy-3-hydroxymethyl-2,5-dimethylbenzyl)-4-methylphenol
  参考文献：
  名称：

  Positive resist composition and photosensitizers

  摘要：

  一种正相光刻胶组合物，包括以下式（I）所代表的酚化合物的喹喔二唑磺酸酯作为光敏剂：其中Q.sup.1、Q.sup.2、Q.sup.3、Q.sup.4、Q.sup.5、Q.sup.6、Q.sup.7、Q.sup.8、Q.sup.9和Q.sup.10独立地代表氢、具有1-6个碳原子的烷基或苯基，或Q.sup.1和Q.sup.2、Q.sup.3和Q.sup.4、Q.sup.5和Q.sup.6、Q.sup.7和Q.sup.8、或Q.sup.9和Q.sup.10可以与它们连接的碳原子一起形成具有6个或更少碳原子的环烷烃环，R.sup.1、R.sup.2、R.sup.3、R.sup.4、R.sup.5、R.sup.6、R.sup.7、R.sup.8、R.sup.9、R.sup.10、R.sup.11、R.sup.12、R.sup.13、R.sup.14、R.sup.15和R.sup.16独立地代表氢、羟基、具有1-6个碳原子的烷基或苯基；m和n独立地代表0或1的数字；以及一种碱溶性树脂；和式（I）的一种酚化合物的喹喔二唑磺酸酯。

  公开号：

  US05866724A1

文献信息

• Optically active compound and photosensitive resin composition
  申请人：——

  公开号：US20030211421A1

  公开（公告）日：2003-11-13

  A photoactive compound is used in combination with a photosensitizer, represented by the following formula (1): A −[( J ) m −( X-Pro )] n (1) wherein A represents a hydrophobic unit comprising at least one kind of hydrophobic groups selected from a hydrocarbon group and a heterocyclic group, J represents a connecting group, X-Pro represents a hydrophilic group protected by a protective group Pro which is removable by light exposure, m represents 0 or 1, and n represents an integer of not less than 1. The protective group Pro may be removable by light exposure in association with the photosensitizer (especially, a photo acid generator), or may be a hydrophobic protective group. The hydrophilic group may be a hydroxyl group or a carboxyl group. The photoactive compound has high sensitivity to a light source of short wavelength beams, for resist application, therefore, the photoactive compound is advantageously used for forming a pattern with high resolution.

  一种光活性化合物与光敏剂结合使用，由以下公式（1）表示： A −[( J ) m −( X-Pro )] n (1) 其中，A代表至少包括一种从烃基和杂环基中选择的疏水基的疏水单元，J代表连接基团，X-Pro代表由光照可去除的保护基团Pro保护的亲水基团，m代表0或1，n代表不少于1的整数。 保护基团Pro可以与光敏剂（特别是光酸发生剂）一起通过光照可去除，也可以是疏水保护基团。亲水基团可以是羟基或羧基。光活性化合物对短波长光源具有很高的敏感性，用于光刻应用，因此，该光活性化合物有利于形成具有高分辨率的图案。
• Colored photosensitive resin composition, and color filter array and solid-state image pickup device using the same
  申请人：Miya Yoshiko

  公开号：US20080237553A1

  公开（公告）日：2008-10-02

  A colored photosensitive resin composition comprising an alkali-soluble resin, a photosensitive compound, a curing agent, a solvent and a colorant represented by the formula (I): The colored photosensitive resin composition can form a color filter array which shows good spectral characteristics.

  一种有色光敏树脂组合物，包括碱溶性树脂、光敏化合物、固化剂、溶剂和由式(I)表示的着色剂。该有色光敏树脂组合物可以形成一个显示良好光谱特性的彩色滤光片阵列。
• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE COMPOSITION
  申请人：INASAKI Takeshi

  公开号：US20130029255A1

  公开（公告）日：2013-01-31

  Provided is an actinic ray-sensitive or radiation-sensitive resin composition containing a compound (A) which contains at least one phenolic hydroxyl group and at least one group where a hydrogen atom in a phenolic hydroxyl group is substituted by a group represented by the following General Formula (1). (in the formula, each of R 11 and R 12 independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group, or an aralkyl group; X 11 represents an aryl group; M 11 represents a single bond or a divalent linking group; and Q 11 represents an alkyl group, a cycloalkyl group or an aryl group, wherein the number of carbon atoms which are included in the group represented by -M 11 -Q 11 is 3 or more, and at least two of R 11 , R 12 , Q 11 , and X 11 may form a ring by bonding to each other)

  提供的是一种感光树脂组合物，其中包含至少含有一个酚羟基和至少一个氢原子被以下通式（1）所代表的基替换的基团的化合物（A）。（在通式中，R11和R12分别独立地表示氢原子、烷基、环烷基、芳基或芳基烷基；X11表示芳基；M11表示单键或二价连接基团；Q11表示烷基、环烷基或芳基，其中包含在-M11-Q11所代表的基团中的碳原子数为3或更多，并且R11、R12、Q11和X11中至少有两个可以通过相互键合形成环）
• Selected O-quinonediazide sulfonic acid esters of phenolic compounds
  申请人：OCG MICROELECTRONIC MATERIALS, INC.

  公开号：EP0840170A1

  公开（公告）日：1998-05-06

  A positive photoresist composition comprising an admixture of an alkali soluble resin and a photoactive compound comprising quinonediazide sulfonic acid ester of a phenol compound; wherein: (a) said phenol compound has no less than four phenolic hydroxyl groups, and (b) wherein a HPLC peak area corresponding to the quinonediazide sulfonic acid triesters is greater than or equal to 50% of all HPLC peak areas corresponding to the photoactive compounds in said HPLC spectrum; said HPLC spectrum measured with a primary detector using UV light having the wavelength of 254 nm.

  一种正性光刻胶组合物，包括碱溶性树脂和光活性化合物的混合物，光活性化合物包括苯酚化合物的醌噻磺酸酯；其中 (a) 所述酚化合物具有不少于四个酚羟基，以及 (b) 在所述高效液相色谱光谱中，与喹酮噻嗪磺酸三酯相对应的高效液相色谱峰面积大于或等于与光活性化合物相对应的所有高效液相色谱峰面积的 50%；所述高效液相色谱光谱是使用波长为 254 纳米的紫外光的主检测器测量的。
• Novolak resin precursor, novolak resin and positive photoresist composition containing the novolak resin
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：EP0902326A2

  公开（公告）日：1999-03-17

  A novolak resin precursor is composed of bonded phenolic moieties, one of the hydrogen atoms in the o- or p-positions relative to the hydroxy group of each phenolic moiety is substituted with an alkyl or alkenyl group having 1 to 3 carbon atoms, and the other two hydrogen atoms are bonded through methylene bonds. The content of ortho-ortho bonding is 30 to 70% relative to the number of total methylene bonds and the weight average molecular weight of the precursor is 300 to 10,000. A novolak resin is obtained from this precursor, and a positive photoresist composition comprises this novolak resin. The invention provides a positive photoresist composition that comprises less binuclear compounds, suppresses scum formation, is excellent in terms of definition and coating performance and provides a resist pattern having satisfactory heat resistance.

  一种新酚醛树脂前体由键合的酚基组成，每个酚基的 o 位或 p 位上相对于羟基的一个氢原子被具有 1 至 3 个碳原子的烷基或烯基取代，另外两个氢原子通过亚甲基键键合。相对于亚甲基键总数，正交-正交键的含量为 30%至 70%，前体的重量平均分子量为 300 至 10,000。从这种前体中可以得到一种酚醛树脂，一种正性光刻胶组合物就包含这种酚醛树脂。本发明提供的正性光刻胶组合物含有较少的双核化合物，可抑制浮渣的形成，具有优异的清晰度和涂布性能，并提供具有令人满意的耐热性的抗蚀图案。