Photorearrangement of Propargyl Bromide as a Probe to Study Propargylic and Allenic Radicals by Infrared Matrix Isolation Technique
摘要:
AbstractThe photolysis of propargyl bromide in Ar matrix to form allenyl bromide proceeded with a radical mechanism. The deuterium label study and radical scavenger were used to investigate the mechanism. Neither propargyl nor allenyl radical was trapped in Ar matrix at 8 K. The rates of propargyl and allenyl radicals coupled with bromo radical are significantly fast. The stability of propargyl and allenyl radicals is discussed.