The present invention provides a photoresist composition containing: a resin which contains a structural unit derived from a compound having an acid-labile group and which is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid; an acid generator and a compound represented by the formula (I):
wherein R
1
, X
1
, R
2
, u1, s1, t1 are each defined in the specification, with the proviso that sum of s1 and t1 is 1 or 2.
US8753795B2
申请人:——
公开号:US8753795B2
公开(公告)日:2014-06-17
Shiryaev, A. K.; Moiseev, I. K.; Stroganov, V. F., Journal of general chemistry of the USSR, 1990, vol. 60, # 12.1, p. 2442 - 2446
作者:Shiryaev, A. K.、Moiseev, I. K.、Stroganov, V. F.