The present invention provides a photoresist composition containing: a resin which contains a structural unit derived from a compound having an acid-labile group and which is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid; an acid generator and a compound represented by the formula (I):
wherein R
1
, X
1
, R
2
, u1, s1, t1 are each defined in the specification, with the proviso that sum of s1 and t1 is 1 or 2.