2-chloro-acrylic acid-(2-hydroxy-ethyl ester) | 31770-04-4

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: 2-chloro-acrylic acid-(2-hydroxy-ethyl ester)
• 英文别名: 2-Chlor-acrylsaeure-(2-hydroxy-aethylester)；2-Hydroxyethyl 2-chloroprop-2-enoate
• CAS: 31770-04-4
• 化学式: C₅H₇ClO₃
• 分子量: 150.562
• InChiKey: AQCWYUOUKHXYIB-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.9
• 重原子数：
  9
• 可旋转键数：
  4
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.4
• 拓扑面积：
  46.5
• 氢给体数：
  1
• 氢受体数：
  3

反应信息

• 作为产物：
  描述：

  alkaline earth salt of/the/ methylsulfuric acid 在 碳酸氢钠 、 sodium carbonate 作用下， 生成 2-chloro-acrylic acid-(2-hydroxy-ethyl ester)
  参考文献：
  名称：

  Esters of alpha chloroacrylic acid

  摘要：

  公开号：

  US02338967A1

文献信息

• Reactive coatings
  申请人：THE SHERWIN-WILLIAMS COMPANY

  公开号：EP0316874A2

  公开（公告）日：1989-05-24

  Coating compositions which comprise: (i) a hydroxy-­functional compound containing in the molecule an average of at least two hydroxyl groups; (ii) an anhydride-functional compound containing in the molecule an average of at least two cyclic carboxylic acid anhydride groups; and (iii) an epoxy-functional compound containing in the molecule an average of at least two cycloaliphatic epoxy groups, provide low temperature cure response and excellent durability.

  涂料组合物包括：(i) 羟基官能团化合物，分子中平均含有至少两个羟基；(ii) 酸酐官能团化合物，分子中平均含有至少两个环羧酸酸酐基团；以及 (iii) 环氧官能团化合物，分子中平均含有至少两个环脂族环氧基团，具有低温固化反应和优异的耐久性。
• Method for extending the potlife of polyol/polyisocyanate mixtures
  申请人：THE SHERWIN-WILLIAMS COMPANY

  公开号：EP0532899A1

  公开（公告）日：1993-03-24

  A method for extending the pot-life of a curable composition comprising a mixture of at least one active hydrogen-containing material, such as a polyol or polyamine, and a polyisocyanate, which method comprises incorporating within the mixture a pot-life extending amount of a polyanhydride having an average of at least two anhydride groups per molecule.

  一种延长可固化组合物罐内寿命的方法，该组合物由至少一种活性含氢材料（如多元醇或多胺）和一种多异氰酸酯的混合物组成，该方法包括在混合物中加入一种可延长罐内寿命的多酸酐，该多酸酐平均每个分子至少有两个酸酐基团。
• POSITIVE TYPE RADIATION-SENSITIVE COMPOSITION AND PROCESS FOR PRODUCING PATTERN WITH THE SAME
  申请人：TORAY INDUSTRIES, INC.

  公开号：EP1229390A1

  公开（公告）日：2002-08-07

  The present invention relates to a positive-working radiation-sensitive composition which is characterized in that it contains a compound meeting any of conditions a1) to a3), and b) an acid generator which generates acid by irradiation with radiation; and also to a method for the production of a resist pattern employing same. a1) A compound wherein a carboxyl group is protected by an acid labile group represented by general formula (1) (R1 and R2 are aromatic rings, and R3 represents an alkyl group, a substituted alkyl group, a cycloalkyl group or an aromatic ring. R1 to R3 may be the same or different.) a2) A compound in which an alkali-soluble group is protected by an acid labile group represented by general formula (2) (R4 to R6 are each an alkyl group, a substituted alkyl group, a cycloalkyl group or an aromatic ring, and at least one of R4 to R6 is an aromatic ring with an electron-donating group. R4 to R6 may be the same or different.) a3) A compound in which an alkali-soluble group is protected by an acid labile group a, and either acid labile group a has an alkali-soluble group or acid labile group a has an alkali-soluble group protected by an acid labile group b. With this constitution, it is possible by means of the present invention to obtain a positive-working radiation-sensitive composition of high sensitivity having a resolution which enables sub-quarter micron pattern processing to be carried out.

  本发明涉及一种正向工作的辐射敏感组合物，其特征在于它含有符合 a1) 至 a3) 中任一条件的化合物，以及 b) 一种通过辐射产生酸的酸发生器；本发明还涉及一种使用这种组合物生产抗蚀剂图案的方法。 a1)一种化合物，其中的羧基被通式(1)代表的酸性基团所保护 (R1和R2为芳香环，R3代表烷基、取代烷基、环烷基或芳香环。R1 至 R3 可以相同或不同）。 a2)一种化合物，其中的碱溶性基团被通式（2）所代表的酸性基团所保护 (R4至R6各自为烷基、取代烷基、环烷基或芳香环，且R4至R6中至少有一个为带有电子奉献基团的芳香环。R4 至 R6 可以相同或不同)。 a3)碱溶性基团被酸性基团 a 保护，且酸性基团 a 具有碱溶性基团或酸性基团 a 具有被酸性基团 b 保护的碱溶性基团的化合物。 通过这种结构，本发明可以获得一种高灵敏度的正向工作辐射敏感组合物，其分辨率可以进行四分之一微米以下的图案加工。
• PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED RESIN FILM, AND SEMICONDUCTOR DEVICE
  申请人：Toray Industries, Inc.

  公开号：EP3267254A1

  公开（公告）日：2018-01-10

  Provided is a photosensitive resin composition containing: one or more kinds of alkali-soluble resins selected from a polyimide, a polybenzoxazole, a polyimide precursor, a polybenzoxazole precursor, and a copolymer formed of two or more polymers selected from the preceding substances; and a photosensitizer. The photosensitive resin composition further contains a compound represented by general formula (1). Even when a cured film is fired at low temperature, the photosensitive resin composition exhibits superior adhesion properties with metallic materials, particularly copper, and also exhibits high chemical resistance.

  本发明提供了一种光敏树脂组合物，其中含有：一种或多种选自聚酰亚胺、聚苯并恶唑、聚酰亚胺前体、聚苯并恶唑前体和两种或多种选自前述物质的聚合物形成的共聚物的碱溶性树脂；以及一种光敏剂。光敏树脂组合物还含有通式（1）所代表的化合物。即使在低温下烧制固化薄膜，光敏树脂组合物也能与金属材料，特别是铜，表现出优异的粘合性能，并具有很高的耐化学性。
• HEAT-RESISTANT RESIN COMPOSITION, METHOD FOR MANUFACTURING HEAT-RESISTANT RESIN FILM, METHOD FOR MANUFACTURING INTERLAYER INSULATION FILM OR SURFACE PROTECTIVE FILM, AND METHOD FOR MANUFACTURING ELECTRONIC COMPONENT OR SEMICONDUCTOR COMPONENT
  申请人：Toray Industries, Inc.

  公开号：EP3284771A1

  公开（公告）日：2018-02-21

  The purpose of the present invention is to provide a heat-resistant resin composition having excellent stepped embedding properties on a support substrate. In order to achieve the aforementioned purpose, the present invention is configured as described below. Specifically, the present invention is a heat-resistant resin composition containing: as a resin (A) one or more types of resin selected from the group consisting of a polyimide precursor, and a polybenzoxazole precursor; as an organic solvent (B) an organic solvent having a boiling point of 210°C to 260°C at atmospheric pressure; and as an organic solvent (C) an organic solvent having a boiling point of 100°C to less than 210°C at atmospheric pressure; the content of the organic solvent (B) being 5% by mass to 70% by mass with respect to the entire amount of the organic solvents, and the content of the organic solvent (C) being 30% by mass to 95% by mass with respect to the entire amount of the organic solvents.

  本发明的目的是提供一种耐热树脂组合物，该组合物在支撑基材上具有优异的阶梯嵌入特性。为了实现上述目的，本发明的结构如下所述。具体地说，本发明是一种耐热树脂组合物，其中含有作为树脂（A）从聚酰亚胺前体和聚苯并恶唑前体组成的组中选出的一种或多种树脂； 作为有机溶剂（B）在常压下沸点为 210℃至 260℃的有机溶剂；以及 作为有机溶剂（C）在常压下沸点为 100℃至 210℃以下的有机溶剂；有机溶剂(B)的含量为有机溶剂总量的 5%至 70%，有机溶剂(C)的含量为有机溶剂总量的 30%至 95%。