A precursor for the deposition of a thin film by atomic layer deposition is provided. The compound has the formula MxLy where M is a metal and L is an amidrazone-derived ligand or an amidate-derived ligand. A process of forming a thin film using the precursors is also provided.
提供了一种用原子层沉积法沉积薄膜的前体。该化合物的
化学式为MxLy,其中M是
金属,L是一种来自酰胺
脲衍生
配体或酰胺酸衍生
配体的
配体。还提供了一种使用这些前体形成薄膜的过程。