Acid-labile polymers and monomers for their construction
申请人:Brainard Robert L.
公开号:US08895691B2
公开(公告)日:2014-11-25
Polymers for photoresists and monomers for incorporation into those polymers are disclosed. The polymers comprise at least two components: an acid labile component and a photolytically stable and acid-stable component. The polymers may also contain a third, photoacid generator (PAG) component. The acid-labile component is based on the presence of a readily cleavable oxygen-carbon bond that usually occurs in a sterically hindered ether or ester.